• 제목/요약/키워드: AFM Cantilever

검색결과 94건 처리시간 0.027초

Tribo-Nanolithography를 이용한 액중 나노가공기술 개발 (Nanoscale Fabrication in Aqueous Solution using Tribo-Nanolithography)

  • 박정우;이득우
    • 한국정밀공학회지
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    • 제22권2호
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    • pp.194-201
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    • 2005
  • Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate easily by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin damaged layer rapidly forms in the substrate at the diamond tip-sample junction along scanning path of the tip and simultaneously the area uncovered with the damaged layer is being etched. This study demonstrates how the TNL parameters can affect the formation of damaged layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

Nanoscale Fabrication in Aqueous Solution using Tribo-Nanolithography

  • Park, Jeong-Woo;Lee, Deug-Woo;Kawasegi, Noritaka;Morita, Noboru
    • International Journal of Precision Engineering and Manufacturing
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    • 제7권4호
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    • pp.8-13
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    • 2006
  • Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with a diamond tip, allowing the formation of a mask layer on the silicon substrate by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of the conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin mask layer rapidly forms on the substrate at the diamond tip-sample junction along scanning path of the tip, and simultaneously, the area uncovered with the mask layer is etched. This study demonstrates how the TNL parameters can affect the formation of the mask layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

AFM 시스템을 위한 XYZ 3축 스테이지의 설계 (The design of XYZ 3-axis stage for AFM system)

  • 김동민;김기현;심종엽;권대갑;엄천일
    • 한국결정학회:학술대회논문집
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    • 한국결정학회 2002년도 정기총회 및 추계학술연구발표회
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    • pp.36-36
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    • 2002
  • To Establish of standard technique of length measurent in 2D plane, we develope AFM system. The XY scanner scans the sample only in XY plane, while the Z scanner scans the specimen only in Z-direction. Cantilever tip is controlled to has constant height relative to speciman surface by feedback of PSPD signal. To acquire high accuracy, Z-axis measuring sensor will be added.(COXI or others). In this paper we design XYZ stage suitable for this AEM system. For XY stage, single module parallel-kinnematic flexure stage is used which has high orthogonality and minimum out-of-plane motion. To obtain best performance optimal design is performed. For XY stage, to be robust about parasitic motion optimal design of maximizing Z and tilt stiffness is performed under the constraint of motion range and stage size. And for Z stage, optimal design of maximizing 1st resonant frequency is performed. Because if resonant frequency is get higher, scan speed is improved. So it makes reduce the error by sensor drift. Resultly XYZ stage each have 1st natural frequency of 115㎐, 201㎐, 2.66㎑ and range 109㎛, 110㎛, 12㎛.

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Modelling and Measurements of Normal and Lateral Stiffness for Atomic Force Microscopy

  • Choi, Jinnil
    • Applied Science and Convergence Technology
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    • 제23권5호
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    • pp.240-247
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    • 2014
  • Modelling and measurements of normal and lateral stiffness for atomic force microscopy (AFM) are presented in this work. Important issues, such as element discretisation, stiffness calibration, and deflection angle are explored using the finite element (FE) model. Elements with various dimension ratios are investigated and comparisons with several mathematical models are reported to verify the accuracy of the model. Investigation of the deflection angle of a cantilever is also shown. Moreover, AFM force measurement experiments with conical and colloid probe tips are demonstrated. The relationships between force and displacement, required for stiffness measurement, in normal and lateral directions are acquired for the conical tip and the limitations of the colloid probe tip are highlighted.

Design and Fabrication of a Vacuum Chamber for a Commercial Atomic Force Microscope

  • Park, Sang-Joon;Jeong, Yeon-Uk;Park, Soyeun;Lee, Yong Joong
    • Applied Science and Convergence Technology
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    • 제23권2호
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    • pp.97-102
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    • 2014
  • A vacuum chamber for a commercial atomic force microscope (AFM) is designed and fabricated. Only minimal modifications were made to an existing microscope in an effort to work in a vacuum environment, while most of the available AFM functionalities were kept intact. The optical alignment needed for proper AFM operations including a SLD (superluminescent diode) and a photodiode can be made externally without breaking the vacuum. A vacuum level of $5{\times}10^{-3}$ torr was achieved with a mechanical pump. An enhancement of the quality factor was observed along with a shift in the resonance frequency of a non-contact-mode cantilever in a vacuum. Topographical data of a calibration sample were also obtained in air and in a low vacuum using the non-contact mode and the results were compared.

원자힘 주사현미경 TiO 탐침을 이용한 고온 초전도 단일채널 자속 흐름 트랜지스터의 제작 및 특성 해석 (Fabrication and Characterization of $High-T_c$ Superconducting Single Channel Flux Flow Transistor using the Atomic Force Microscope TiO Cantilever Tip)

  • 고석철;강형곤;임성훈;이종화;이해성;한병성
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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    • pp.101-104
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    • 2004
  • We have fabricated a channel of superconducting flux flow transistor(SFFT) using the voltage-biased atomic force microscope(AFM) TiO tip and performed numerical simulations for the SFFT controlled by the magnetic field with a control current. The critical current density in a channel of the fabricated SFFT was decreased with the applied current by a control line. By comparing the measured with theoretical results, we showed a possibility of fabrication of an SFFT with a nano-channel using AFM anodization process technique.

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나노 힘 측정 및 표준 (Nano Force Metrology and Standards)

  • 김민석;박연규;최재혁;김종호;강대임
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 추계학술대회 논문집
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    • pp.59-62
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    • 2005
  • Small force measurements ranging from 1 pN to $100{\mu}N$, we call it Nano Force, become the questions of common interests of biomechanics, nanomechanics, material researches, and so on. However, unfortunately, quantitative and accurate force measurements have not been taken so far. This is because there ,are no traceable force standards and a calibration scheme. This paper introduces a quantitative force metrology, which provides traceable link to SI (International Systems of Units). We realize SI traceable force ranging from 1 nN to $100{\mu}N$ using an electrostatic balance and disseminate it through transfer standards, which are self-sensing cantilevers that have integrated piezoresistive strain gages. We have been built a prototype electrostatic balance and Nano Force Calibrator (NFC), which is an AFM cantilever calibration system. As a first experiment, we calibrated normal spring constants of commercial AFM cantilevers using NFC. Calibration results show that the spring constants of them are quite differ from each other and nominal values provided by a manufacturer (up to 240% deviation).

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