• 한국건설순환자원학회논문집
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• 제7권3호
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• pp.224-234
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• 2019

토목구조물의 교면은 토목구조물 상부에 방수층이 존재하고 방수층 상부에 아스콘이나 콘크리트로 포장층을 마무리하여 교면의 시공을 완성하고 있다. 그러나 아스팔트계열은 뛰어난 감온성으로 고온에서 용융되는 취약한 특성을 지녔고, 이는 아스콘 포설시 고온으로 인하여 방수재가 용융되어 두께저하로 인한 하자 발생률이 증가하게 된다. 본 연구에서는 교면에 적용되는 MMA(Methyl Methacrylate)의 경질 Type과 연질 Type에 대하여 동시 사용시 배합에 따른 경화상태를 확인하고 각각의 인장강도와 신장률이 관련 품질기준에 대한 성능 만족 여부와 적정 배합비율을 확인해 보고자 한다. 그 결과 MMA 경질 수지 또는 연질 수지를 단독으로 사용하게 될 경우 경질 수지는 인장특성을 연질 수지는 신장특성이 명확하게 나타나기 때문에 수지의 단독 사용으로는 KS F 4932의 인장성능 품질기준을 만족시키지 못하는 것으로 나타났고, 파우더 양이 총 배합량 중 56.25%를 초과하게 될 경우에는 경화 후 표면에 공극이 발생되고 셀프 레벨링이 불가능하여 불균질한 표면을 형성하는 것으로 확인되었다. 또한, 경질 수지: 연질 수지: 파우더 비율을 15g: 85g: 150g으로 설정한 시험편은 인장강도 $1.5N/mm^2$, 신장률 133%가 나타남에 따라 KS F 4932의 인장성능을 만족하는 것으로 확인되었다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2008년도 제39회 하계학술대회
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• pp.1262-1263
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• 2008

Recently film-typed dye sensitized solar cell(DSC) attracts much attention with increasing applications for its flexibility and transparency. The ZnO:Al thin film, which serves mainly as transparent conducting electrode, Aluminium-doped zinc oxide(ZnO:Al) thin film has emerged as one of the most promising transparent conducting films since it is inexpensive, mechanically stable, and highly resistant to deoxidation. In this paper ZnO:Al thin film was deposited on the polyethylene terephthalate(PET) substrate by the capacitively coupled r. f. magnetron sputtering method. The effects of gas pressure and r. f. discharge power on the morphological, electrical and optical properties of ZnO:Al thin film were studied. Especially the variation in substrate thickness after sputtering and surface morphology of the substrate were investigated and clarified. The results showed that the film deposited on the PET substrate at r. f. discharge power of 180 W showed the minimum resistivity of about $1.5{\times}10^{-3}{\Omega}-cm$ and a transmittance of about 93%.

• 조명전기설비학회논문지
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• 제23권1호
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• pp.78-84
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• 2009

본 연구에서는 ZnO:Al 박막의 필름형 염료감응 태양전지의 투명전도막으로의 웅용 가능성을 연구하기 위하여 PET 기판 위에 r. f. 마그네트론 스퍼터링법으로 ZnO:Al 박막을 증착하였으며, ZnO:Al 박막의 전기적 그리고 광학적 특성의 향상을 위하여 기판 바이어스 전압을 인가하였다. 그 결과, 정(+)의 기판 바이어스 전압은 플라즈마 중의 전자를 기판의 스퍼터 원자에 충돌하게 함으로써 박막에 부가적인 에너지를 공급하게 되어 박막의 결정성장 및 전기적 특성을 향상시키고 있음을 알 수 있었다. 그러나 +30[V] 이상의 과도한 기판 바이어스 전압을 인가한 경우, 박막의 전기적 특성은 나빠졌으며, 특히 부(-)의 바이어스 전압을 인가한 경우 결정 성장이 나타나지 알아, 전기적 특성의 향상을 위한 기판 바이어스 전압의 효과가 매우 제한적으로 작용되고 있음을 알 수 있었다. 본 연구에서는 +30(V)의 기판 바이어스 조건하에서 $1.8{\times}10^{-3}[{\Omega}-cm]$의 체적 저항율 및 87.77(%)의 광 투과율을 얻을 수 있었다.

• 한국건축시공학회지
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• 제21권1호
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• pp.87-95
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• 2021

본 연구에서는 현재 건설신기술로 지정된 복합계방수공법 7개사(A~G)를 대상으로 KS F 2622:멤브레인 방수층 성능평가 시험방법 중 현장 적용조건과 유사성이 큰 평가항목을 선정하여 평가한 결과, 모든 시험체가 기본 물성평가에서 KS 기준을 상회하는 성능을 확보했음에도 불구하고, 내피로(균열 거동) 시험을 제외한 방수성(수밀성) 시험, 처짐 저항성 시험, 부풂 저항성 시험에서 점착 도막 계열로 이루어진 공법의 접합부와 수직부 등 취약부위의 현장품질 성능을 확보하기 어려운 것으로 확인하였다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1991년도 하계학술대회 논문집
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• pp.174-177
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• 1991

Fluorine-doped $SnO_2\;(SnO_2:F)$ films were prepared in ordinary atmosphere on borosilicate glass substrates using pyrosol deposition method starting from the solutions composed of $SnCl_4-5H_2O-NH_4F-CH_3OH-H_2O-HCl$ in an attempt to develop transparent conductors for use in amorphous silicon (a-Si) solar cello. The deposition rate of films increased with the increase in the content of $H_2O$, whereas it decreased with increasing the content of $CH_3OH$. When air was used as the carrier gas, the lowest electrical resistivity was obtained from a solution having $CH_3OH/H_2O$ mol ratio of about $2{\sim}3$ in the solution. The use of $N_2$ of the same flow rate as the carrier gab resulted always in the high resistive films, but the resistivity of the films decreased continuously with the increase in the content of $H_2O$. The surface morphology and preferred orientation of films were also affected by the solvent composition and the content of HCl in the solution. The room-temperature resistance of the films were fairly stable after heat-treatments up to $600^{\circ}C$.

• 한국재료학회지
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• 제19권5호
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• pp.245-252
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• 2009

Changes in the surface morphology and light scattering of textured Al doped ZnO thin films on glass substrates prepared by rf magnetron sputtering were investigated. As-deposited ZnO:Al films show a high transmittance of above 80% in the visible range and a low electrical resistivity of $4.5{\times}10^{-4}{\Omega}{\cdot}cm$. The surface morphology of textured ZnO:Al films are closely dependent on the deposition parameters of heater temperature, working pressure, and etching time in the etching process. The optimized surface morphology with a crater shape is obtained at a heater temperature of $350^{\circ}C$, working pressure of 0.5 mtorr, and etching time of 45 seconds. The optical properties of light transmittance, haze, and angular distribution function (ADF) are significantly affected by the resulting surface morphologies of textured films. The film surfaces, having uniformly size-distributed craters, represent good light scattering properties of high haze and ADF values. Compared with commercial Asahi U ($SnO_2$:F) substrates, the suitability of textured ZnO:Al films as front electrode material for amorphous silicon thin film solar cells is also estimated with respect to electrical and optical properties.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2009년도 제40회 하계학술대회
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• pp.1425_1426
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• 2009

In this study, commercially available polyethylene terephthalate(PET), which is widely used as a substrate of flexible electronic devices, was modified by dielectric barrier discharge(DBD) method in an air condition at atmospheric pressure, and aluminium - doped zinc oxide (ZnO:Al) transparent conducting film was deposited on PET substrate by r. f. magnetron sputtering method. Surface analysis and characterization of the plasma-treated PET substrate was carried out using contact angle measurements, X-ray Photoelectron Spectroscopy(XPS) and Atomic Force Microscopy (AFM). Especially the effect of surface state of PET substrate on some important properties of ZnO:Al transparent conducting film such as electrical and morphological properties and deposition rate of the film, was studied experimentally. The results showed that the contact angle of water on PET film was reduced significantly from $62^{\circ}$ to $43^{\circ}$ by DBD surface treatment at 20 min. of treatment time. The plasma treatment also improved the deposition rate and electrical properties. The deposition rate was increased almost linearly with surface treatment time. The lowest electrical resistivity as low as $4.97{\times}10^{-3}[\Omega-cm]$ and the highest deposition rate of 234[${\AA}m$/min] were obtained in ZnO:Al film with surface treatment time of 5min. and 20min., respectively.

• 한국표면공학회지
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• 제42권3호
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• pp.128-132
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• 2009

Transparent conducting thin films of indium tin oxide(ITO) co-sputtered with aluminum-doped zinc oxide(AZO) were deposited on glass substrate by dual magnetron sputtering. It was found that the electrical properties and structural characteristics of the films are significantly changed according to the sputtering power of the AZO target. The IAZTO film prepared with D.C power of ITO at 100 W and R.F power of AZO at 50 W shows an electrical resistivity of $4.6{\times}10^{-4}{\Omega}{\cdot}cm$ and a sheet resistance of $30{\Omega}/{\square}$ (for 150 nm thick). Besides of the improvement of the electrical properties, compared to the ITO films deposited at the same process conditions, the IAZTO films have very smooth surface, which is due to the amorphous nature of the films. However, the electrical conductivity of the IAZTO films was found to be deteriorated along with the crystallization in case of the high temperature deposition (above $310^{\circ}C$). In this work, high quality amorphous transparent conductive oxide layers could be obtained by mixing AZO with ITO, indicating possible use of IAZTO films as the transparent electrodes in OLED and flexible display devices.