• Polymer(Korea)
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• v.33 no.6
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• pp.525-529
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• 2009

In order to manufacture 2-layer flexible copper clad laminate (FCCL) s having the excellent performance high adhesion properties between copper foil and polyimide film are required. Silane coupling agents with specific functional groups as an adhesion promoter are generally used to enhance the adhesion. In our study, we synthesized a novel silane coupling agent for increasing the adhesive property between copper layer and polyimide layer. The surface morphology of rolled copper foil, as a function of the concentrations of the coated silane coupling agent, was fully characterized. As fabricated 2-layer FCCL, we observed that adhesive properties were changed by the surface morphology and we confirmed that the novel silane coupling agent affects adhesive properties in FCCL with two types of poly (amic acid)s.

• Journal of the Korean institute of surface engineering
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• v.47 no.2
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• pp.63-67
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• 2014

As the demand for fine-pitch FPCB (Flexible Printed Circuit Board) increases, so do the number of applications of sputtered FCCL (Flexible Copper Clad Laminate). Furthermore, as the width between the circuit patterns decreases, greater defects are observed in the migration phenomenon. In this study we observed changes in ion migration in real circuit-pattern width using sputtered FCCL. We found that as the applied voltage and residue thickness of the NiCr seeds increase, ion migration occurs faster. If the NiCr seed layer thickens due to a high cathode power and long deposition time while being sputtered, the NiCr will form a residue that quickly becomes a factor for incurring ion migration.

• Polymer(Korea)
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• v.35 no.4
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• pp.302-307
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• 2011

The parameters of silanol formation reaction of organosilane including solvent type, solution concentration, pH and hydrolysis time influence the adhesion property of 2 layer flexible copper clad laminate (FCCL). Especially, the hydrolysis reaction time of silane coupling agent affects the formation of the silanol groups and their self-condensation to generate oilgomeric structure to enhance the surface treatment as an adhesive promoter. In our study, we prepared the binary silane coupling agents to control hydrolysis reaction rate and surface energy after treatment of silane coupling agents for increasing the adhesive property between a copper layer and a polyimide layer. The surface morphology of rolled copper foil, as a function of the contents of the coated binary silane coupling agent, was fully characterized. As fabricated 2-layer FCCL, we observed that adhesive properties were changed by hydrolysis rate and surface energy.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.04a
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• pp.7-8
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• 2007

Ti을 전극으로 한 RF plasma 를 사용한 표면 처리와 200 eV 이하의 저에너지 반응성 이온빔을 사용한 PI 표면 처리에 의해 초기 및 내열성이 우수한 COF 용 FCCL를 제작하였다. 임계 rf power 이상에서 새롭게 $TiO_2$층의 형성이 접착력 증대의 원인이었으며, Ni-Cr-Zn의 삼원계 접착층의 내열성 향상 특성 등을 연구하였다.

• Elastomers and Composites
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• v.43 no.2
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• pp.82-87
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• 2008

In this study, nine kinds of polyimides were synthesized from 1,2,4,5-benzenetetracarboxylic dianhydride (PMDA), 4,4'-(4,4'-isopropylidenediphenoxy)bis(phthalic anhydride) (BPADA), m-pheny lenediamine (m-PDA) and 4,4'-oxydianiline (ODA) by controlling molar ratio of monomers. Synthesized polyimides were used as insulator films for 2-layer Flexible Copper Clad Laminate(FCCL) which were manufactured by the casting method. Glass transition temperature and thermal degradation temperature for 5% weight loss of the polyimide film were improved by increasing contents of m-PDA and PMDA, respectively. Water absorption of polyimide film was reduced by increasing contents of ODA and BPADA which have relatively long structure, respectively. Peel strength of 2-layer FCCL was improved by increasing contents of ODA and BPADA.

• Korean Journal of Materials Research
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• v.17 no.10
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• pp.509-515
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• 2007

In order to fabricate adhesiveless 2-layer flexible copper clad laminate (FCCL) used for COF (chip on film) with high peel strength, polyimide (PI; Kapton-EN, $38\;{\mu}m$) surface was modified by reactive $O_2^+$ and $N_2O^+$ ion beam irradiation. 300 mm-long linear electron-Hall drift ion source was used for ion irradiation with ion current density (J) higher than $0.5\;mA/cm^2$ and energy lower than 200 eV. By vacuum web coating process, PI surface was modified by linear ion source and then 10-20 nm thick Ni-Cr and 200 nm thick Cu film were in-situ sputtered as a tie layer and seed layer, respectively. Above this sputtered layer, another $8-9{\mu}m$ thick Cu layer was grown by electroplating and subsequently acid and base resistance and thermal stability were tested for examining the change of peel strength. Peel strength for the FCCLs treated by both $O_2^+$ and $N_2O^+$ ion irradiation showed similar magnitudes and increased as the thickness of tie layer increased. FCCL with Cu (200 nm)/Ni-Cr (20 nm)/PI structure irradiated with $N_2O^+$ at $1{\times}10^{16}/cm^2$ ion fluence was proved to have a strong peel strength of 0.73 kgf/cm for as-received and 0.34 kgf/cm after thermal test.

• Journal of the Korean institute of surface engineering
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• v.38 no.2
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• pp.49-54
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• 2005

Flexible copper clad laminates (FCCL) fabricated by sputtering has advantages in fine pitch etching and dimensional accuracy than previous casting or laminating type FCCL, But its lower adhesion is inevitable technical challenge to solve for commercializing it. Chromium (Cr) which strongly reacts with O moiety was used as tie-coating layer in order to improve low adhesion between copper (Cu) and polyimide (PI). Sputtering raw polyimide (SRPI) and casting raw polyimide (CRPI) were used as substrates at this research. PI was pretreated by plasma before sputtering, and each sample was varied with RF power and Cr thickness on sputtering. Peel strength of the FCCL on SRPI was higher than that on CRPI. Adhesion had maximum value when 10 nm of Cr was deposited on SRPI by RF power of 50 W. It seems to be by the formation of Cu-Cr-O solid solution at the metal-PI interface.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2005.11a
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• pp.126-126
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• 2005

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.171-171
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• 2013

2층 FCCL (연성회로기판, Flexible Copper Clad Laminate)에 있어서 폴리이미드 필름과 구리의 접착력을 향상 시키기 위해 기존에 사용되고 있는 Ni-Cr대신 박리강도가 높고 에칭성도 매우 뛰어난 Ni-Mo-Nb 박막을 Roll-to roll 스퍼터 장비를 이용하여 개발하였다. 새롭게 개발된 Ni-Mo-Nb 박막은 기존 연구되어진 Ni-Cr 물질 대비 고온 박리강도 약 1.5~2.0배, 에칭성 8배 이상의 매우 우수한 특성을 보였다. Ni-Mo-Nb 접착층의 두께가 7~40 nm로 증가함에 따라 상온 박리강도가 향상 되는 것을 확인하였다. Ni-Mo-Nb 박막을 증착 하기 전 폴리이미드 기판표면을 RF 플라즈마 전처리 하였을 때 0.67 kg f/cm의 우수한 상온 박리강도를 나타내었으며 FCCL 샘플을 $150^{\circ}C$에서 168시간동안 열처리 한 후 접착력을 측정하였을 때도 0.54 kg f/cm의 높은 고온 박리강도를 보였다. FCCL의 박리강도, 표면 거칠기, 원소들의 화학적 결합, 박막의 미세구조를 peel test, atomic force microscopy, X-ray photoelectron spectroscopy, transmission electron microscopy를 이용하여 폴리이미드 기판 플라즈마 전처리 효과를 확인하였다. 그 결과 플라즈마 전처리를 한 폴리이미드 기판의 경우 처리하지 않은 기판보다 상온과 고온에서 더 우수한 접착력을 가지는 것을 확인 할 수 있었는데 이것은 폴리이미드 기판의 표면 거칠기 증가에 의한 mechanical interlocking effect가 아닌 전처리를 통한 폴리이미드 표면 개질로 C-0, C-N와 같은 chemical functional group이 증가했기 때문인 것으로 확인되었다.

• Korean Journal of Materials Research
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• v.20 no.10
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• pp.555-558
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• 2010

This study examined the effect of current density on the surface morphology and physical properties of copper plated on a polyimide (PI) film. The morphology, crystal structure, and electric characteristics of the electrodeposited copper foil were examined by scanning electron microscopy, X-ray diffraction, and a four-point probe, respectively. The surface roughness, crystal growth orientation and resistivity was controlled using current density. Large particles were observed on the surface of the copper layer electroplated onto a current density of 25 mA/$cm^2$. However, a uniform surface and lower resistivity were obtained with a current density of 10 mA/$cm^2$. One of the important properties of FCCL is the flexibility of the copper foil. High flexibility of FCCL was obtained at a low current density rather than a high current density. Moreover, a reasonable current density is 20 mA/$cm^2$ considering the productivity and mechanical properties of copper foil.