• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2001년도 춘계학술대회 논문집
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• pp.221-225
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• 2001

Recently, high accuracy and high precision are required in various industrial fields that are composed of semiconductor manufacturing apparatus and ultra precision positioning apparatus and information system and so on. The positioning technology is a very important one among them. This technology has been rapidly developed, its field needs for positioning accuracy to high as submicron. It is expected that accuracy with 10 nm in precision working and accuracy with 1 nm in ultra precision working are reached at the beginning of 2000s. Recently, to accomplish this positioning technology, many researches are concerned about it and make efforts it. This paper contain design technology of ultra precision 2-axis(X-Y Delta) stage for materialize to positioning accuracy with submicron, where, Delta stage is design as optimum against load and disturbance. And computer simulation is performed for stability and dynamic characteristic of Delta stage.