A Study on Secondary Defects in Silicon after 2-step Annealing of the High Energy $^{75}AS^+$ Ion Implanted Silicon
(고에너지비소 이온 주입후 2단계 열처리시 2차결함에 대한 연구)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.11 no.10
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- pp.796-803
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- 1998