• Title/Summary/Keyword: 핵생성 속도

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A Comparative Analysis on characteristics and Manufacture of Methane/Natural Gas Hydrates (메탄/천연가스 하이드레이트의 제조 및 특성 비교 분석)

  • Lee Young-Chul;Cho Byoung-Hak;Baek Young-Soon
    • Journal of the Korean Institute of Gas
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    • v.7 no.3 s.20
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    • pp.32-43
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    • 2003
  • As this paper is observed the phase equilibrium diagram of mono- (methane) and multi-component(natural gas) hydrates, and the hydrate growth behavior is analysed and compared by the experiments during the reaction. The difference of mono and multi-component hydrates is an induction delay time and a plateau region. And the concentration of component of gases is changed during the reaction in multi-component hydrates and the concentration of components is changed during the decomposition of hydrate according to each decomposing rates of gases. At 6 MPa, 276.65 K and 600 rpm, the induction delay time of multi-component hydrate formation is observed shorter than that of mono-component hydrate formation because the hydrate nuclei of gases except methane form faster than those of methane. And the plateau region of mono-component hydrate is observed distinctly at 0.055 mole of $CH_4$/mole of water and that of multi-component hydrate is observed at 0.04 mole of $CH_4$/mole of water.

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A Study on the Sol-Gel Reaction Kinetics of Sodium Silicate Solution (규산(硅酸)나트륨 수용액(水溶液)의 솔-젤 반응속도론적(反應速度論的) 고찰(考察))

  • Kim, Chul-Joo;Yoon, Ho-Sung;Jang, Hee-Dong
    • Resources Recycling
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    • v.17 no.6
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    • pp.34-42
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    • 2008
  • The properties of sodium silicate solution were surveyed by using the yellow silicomolybdic method, and the formation of silica sol from sodium silicate solution and the growth of silica sol were investigated in this study. The $SiO_2$ content of 2 wt% in sodium silicate solution was proper to oxidize sodium silicate with sulfuric acid. After the removal of sodium ions in sodium silicate solution, the pH of silicate solution had to be controlled above 9 for the stabilization of silicate solution. The condensation between silicic acid species and silica nuclei surfaces has been studied at $20{\sim}80^{\circ}C$ and pH 10 in silicate solutions with silica nuclei. The reaction falls into two kinetics regimes, limited at high silicic acid species concentration by polymerization, but at lower concentration by a process whereby deposited silicic acid species condenses further to silica. The overall condensation is first-order in silicic acid species concentration, proceeded toward to pseudo equilibrium concentration, $C_x$, rather than the solubility of amorphous silica. The heat of solution of amorphous silica was 3.34 kcal/mol and exhibits an Arrhenius temperature dependence with an apparent activation energy of 3.16 kcal/mol in the range of $20{\sim}80^{\circ}C$.

Effects of Microstructure on the Creep Properties of the Lead-free Sn-based Solders (미세조직이 Sn계 무연솔더의 크리프 특성에 미치는 영향)

  • Yoo, Jin;Lee, Kyu-O;Joo, Dae-Kwon
    • Journal of the Microelectronics and Packaging Society
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    • v.10 no.3
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    • pp.29-35
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    • 2003
  • The Sn-based lead-free solders with varying microstructure were prepared by changing the cooling rate from the melt. Bulky as-cast SnAg, SnAgCu, and SnCu, alloys were cold rolled and thermally stabilized before the creep tests so that there would be very small amount of microstructural change during creep (TS), and thin specimens were water quenched from the melt (WQ) to simulate microstructures of the as-reflowed solders in flip chips. Cooling rates of the WQ specimens were 140∼150 K/sec, and the resultant $\beta-Sn$ globule size was 5∼10 times smaller than that of the TS specimens. Subsequent creep tests showed that the minimum strain rate of TS specimens was about $10_2$ times higher than that of the WQ specimens. Fractographic analyses showed that creep rupture of the TS-SnAgCu specimens occurred by the nucleation of voids on the $Ag_3Sn$ Sn or $Cu_6Sn_5$ particles in the matrix, their subsequent growth by the power-law creep, and inter-linkage of microcracks to form macrocracks which led to the fast failure. On the other hand, no creep voids were found in the WQ specimens due to the mode III shear rupture coming from the thin specimens geometry.

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Formation and Growth of Epitaxial $CoSi_2$ Layer by Reactive Chemical Vapor Deposition (반응성 화학기상증착법을 이용한 에피택셜 $CoSi_2$ 박막의 형성 및 성장에 관한 연구)

  • Lee, Hwa-Seong;Lee, Hui-Seung;An, Byeong-Tae
    • Korean Journal of Materials Research
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    • v.10 no.11
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    • pp.738-741
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    • 2000
  • Univorm epitaxial $CoSi_2$layers have been grown in situ on a (100) Si substrate at temperatures near$ 600^{\circ}C$ by reactive chemical vapor deposition of cyclopentadienyl dicarbonyl cobalt, (Co(η(sup)5-C(sub)5H(sub)5) ($CO_2$). The growth kinetics of an epitaxial $CoSi_2$layer on al Si(100) substrate was investigated at temperatures ranging from 575 to $650^{\circ}C$. In initial deposition stage, plate-like discrete $CoSi_2$spikes were nucleated along the <111> directions in (100) Si substrate with a twinned structure. The discrete $CoSi_2$plates with both {111} and (100) planes grew into an epitaxial layer with a flat interface on (100) Si. For epitaxial $CoSi_2$growth on (100) Si, the activation energy of the parabolic growth was found to be 2.82 eV. The growth rate seems to be controlled by the diffusion of Co through the $CoSi_2$layer.

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The Deposition of $SnO_2$ Films by Spray Pyrolysis (분무열분해법에 의한 $SnO_2$ 박막의 증착)

  • Kim, Tae-Heui
    • Solar Energy
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    • v.15 no.2
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    • pp.91-99
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    • 1995
  • The influence of deposition parameters on the deposition of $SnO_2$ thin films by spray pyrolysis has been studied. In the case of spray solution with tile concentration of 0.01M, at low deposition temperature the deposition was controlled by surface reaction and portion controlled by mass transfer is increased with increasing deposition temperature to $400^{\circ}C$. Above $400^{\circ}C$, the deposition is controlled by mass transfer at low spray pressure, and by surface reaction at high spray pressure. As the concentration of spray solution increased the deposition rate increased, and in this experiment the deposition depends on the Rideal-Eley mechanism. The deposition rate increased with increasing substrate temperature up to $400^{\circ}C$ and then decreased due to homogeneous nucleation. The thickness of the deposit increased with increasing spray duration, and the adhesion between substrate and deposit was formed physically.

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Effects of Surface Treatment of Cathode Materials on the Electrodeposition Behavior of Fe-Ni Alloy (표면처리와 전극 재료가 철-니켈 합금 도금에 미치는 영향)

  • Kang, Na Young;Lee, Jae Ho
    • Journal of the Microelectronics and Packaging Society
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    • v.29 no.4
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    • pp.71-75
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    • 2022
  • In this research, Fe-Ni alloy films were electrodeposited on stainless steel (SS304 and SS430) and Ti plates to investigate the effects of surface conditions of cathode on deposits. The Ti plates were electropolished in 3 M H2SO4-methanol electrolytes at various conditions before electrodeposition, and unpolished Ti and the optimized specimen, polished at 10 V for 8 min, were used as cathode. The anomalous codeposition, the phenomenon which more active Fe is reduced preferentially, occurred on all substrate, however, there were differences in composition of all deposits. As the results of potential monitoring during electrodeposition, it was confirmed that the larger overpotential was applied to the deposition cell when using Ti cathode, leading to high Fe content of deposits from unpolished Ti due to increase in nucleation of Fe. Also, it was founded that the polished Ti can reduced deposition overpotential.

실리콘 박막 증착을 위한 열필라멘트 화학 기상 증착 공정 중 발생하는 나노입자 특성에 관한 연구

  • Choe, Hu-Mi;Hong, Ju-Seop;Kim, Dong-Bin;Yu, Seung-Wan;Kim, Chan-Su;Hwang, Nong-Mun;Kim, Tae-Seong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.304-304
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    • 2011
  • 열필라멘트 화학 기상 증착 공정(HWCVD, hot wire chemical deposition)은 낮은 기판 온도에서 다결정 실리콘 박막을 빠른 속도로 증착할 수 있는 방법이다. 이는 후처리가 없어도 전기적 특성이 우수한 박막을 저온에서 얻을 수 있기 때문에 녹는점이 낮은 기판에 증착을 할 수 있으며 공정비용 절감 효과가 있다. 이러한 박막 증착 공정 중 기상 핵생성에 의해 나노 입자가 생성되며, 새로운 관점에서는 그 농도와 크기가 박막 성장에 중요한 변수로 작용한다. 따라서 공정조건의 변화에 따라 생성되는 나노 입자의 크기 분포를 실시간으로 분석하여 박막 형성의 최적 조건을 찾는 연구가 필요하다. 하지만 이러한 입자 발생 특성에 관한 연구는 기존에 밝혀진 반응 메커니즘으로 인해 수치해석적 연구는 체계적으로 진행되었으나 실험적 연구의 경우 적합한 측정장비의 부재로 인해 제한이 있었다. 따라서 본 연구에서는 저압에서 실시간으로 나노입자 분포를 측정할 수 있는 PBMS (particle beam mass spectrometer)를 이용하여 열필라멘트 화학 기상 증착 공정 중 발생하는 입자의 존재를 확인하고 특성을 분석하였다. 실리콘 나노 입자의 측정은 PBMS 장비의 전단 부분을 HWCVD 배기 라인에 연결하여 진행하였으며 반응기 내 샘플링 위치, 필라멘트 온도, 챔버 압력, 작동기체의 비율을 변수로 하여 진행하였다. 그 결과 실리콘 나노 입자는 양 또는 음의 극성을 가진 하전된 상태임을 확인 하였고, 측정 조건에 따라 일부 단일 극성으로 존재하였다. 한편, 필라멘트 온도가 증가할수록 하전된 나노입자의 최빈값은 감소하였다. 또한 반응 가스인 SiH4 농도가 증가할수록 최빈값은 농도에 비례하여 증가하였다. 이런 결과는 기존 HWCVD 실험에서 투과 전자 현미경(TEM)을 이용하여 분석한 실리콘 나노 입자의 크기 분포 결과와 경향이 일치함을 확인하였다. 본 연구를 통하여 확인된 하전된 나노 입자의 존재를 실험적으로 확인하였으며 추후 지속적 연구에 의해 이러한 하전된 나노 입자가 박막 형성에 기여 하는 것을 규명하고 박막 형성 조건을 최적화하는데 중요한 역할을 할 것을 기대할 수 있다.

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Solid phase crystallization of LPCVD amorphous Si films using $AlCl_3$ and $NiCl_2$ atmosphere ($AlCl_3$$NiCl_2$ 화합물 분위기를 이용한 LPCVD 비정질 실리콘 박막의 고상결정화)

  • 엄지혜;안병태
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.61-61
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    • 2003
  • 다결정 실리콘 박막은 박막 트랜지스터와 실리콘 태양전지등에 응용되며, 비정질 실리콘을 재결정화 하여 얻어지는 다결정 실리콘 박막이 주로 이용되고 있다. 비정질 실리콘 박막을 금속 원소와 접촉시킨 상태에서 열처리할 경우 결정화 온도가 낮아지고 결정화에 필요한 열처리 시간이 짧아지게 된다. 금속을 실리콘 박막 표면에 가하는 방법은 진공증착법등으로 비정질 실리콘 박막 위에 금속원소 층을 형성하는 방법이 주로 이용되었다. 본 연구에서는 AlCl$_3$와 NiCl$_2$ 금속화합물 분위기에서 LPCVD 비정질 실리콘 박막을 열처리하여 결정화 거동을 관찰하였다. 금속화합물과 결정화할 비정질 실리콘 박막을 각각 다른 온도로 가열해 줄 수 있는 노를 이용하여 열처리를 시행하였다. AlCl$_3$와 NiCl$_2$ 분말을 혼합하여 소스로 이용한 경우 48$0^{\circ}C$ 5시간 열처리로 결정화가 완료되었으며, 박막 전체에 걸친 균일도와 재현성이 우수하였다. AlCl$_3$와 NiCl$_2$를 이용한 결정화 초기 상태에는 박막 전면에 걸쳐 등근 형태의 결정립이 균일한 핵 생성으로 나타났다. 이와 같은 결과는 Al과 Ni이 고상결정화에 동시에 작용하면서 나타난 것으로, Al이 가해진 비정질 실리콘으로 인해 결정화 속도가 빨라지고 결함이 작은 결정립을 얻을 수 있었으며, Ni로 인해 결정화의 균일성과 재현성을 높일 수 있었다.

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Depolymerization of waste Poy(butylene terephthalate) by saponification (비누화반응에 의한 폐 Poly(butylene terephthalate)의 해중합)

  • Yoo, Ji-Hwan;Na, Sang-Kwan;Hong, Wan-Hae;Kim, Jung-Gyu
    • Elastomers and Composites
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    • v.37 no.2
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    • pp.124-133
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    • 2002
  • Waste PBT powder was depolymerized by saponification under the mild temperature conditions($80{\sim}110^{\circ}C$) and atmospheric pressure. In depolymerization of PBT, sodium hydroxide was more effective than potassium hydroxide. The depolymerization increased with increasing reaction temperature and decreasing particle size. The reaction kinetics of depolymerization could be expressed by the shrinking unreacted core model without product layer, in which the surface reaction was a rate determining step. The activation energy was 98.1 KJ/mol. The recovery ratio of the TPA obtained from the depolymerized PBT particles of 85.1 and $105{\mu}m$ for 6 hours was about 95%.

A Review on the Chemistry of Soil Organic Matter - Progress in the Study on the Chemical Structure of Humic Substances - (토양(土壤) 유기물(有機物)의 생성(生成)과 성상(性狀) "부식물(腐植物)의 화학구조(化學構造) 연구(硏究)의 진전(進展)에 대하여")

  • Lim, Sun-Uk
    • Korean Journal of Soil Science and Fertilizer
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    • v.11 no.3
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    • pp.127-144
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    • 1979
  • Recent trend in the studies on the forming processes, chemical characteristics and chemical structure of humic substances with some discussions are reviewed and some arguments for the elucidation of the chemical structure of humic substances are summarized.

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