• Title/Summary/Keyword: 표면 프로파일

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Estimation of Surface Profile Using Reflected Laser Beam Pattern (레이저 빔 반사 패턴을 이용한 표면 프로파일 추정)

  • 서영호;김화영;안중환
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2002.05a
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    • pp.263-266
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    • 2002
  • An optical method for surface roughness estimation based on statistical analysis of the light intensity of a scattered laser beam pattern. The method is very simple but has a disadvantage that no more information than the averaged roughness is estimated. In this study a new try was conducted to derive more advanced surface information from the details of the light intensity distribution. Some periodic ripples among the light intensity distribution being assumed to relate with scratch left on the machined surface, a corresponding surface profile is estimated from the ripples using FFT and IFFT algorithm. IFFT technique is used to extract some dominant signal components among the intensity distribution. Compared to the measured profiles by a stylus type surf-tester, the profiles obtained through the proposed method are probably acceptable in a sense of the profile shape. Calibration of the amplitude needs more works in the future.

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Modeling for Evolution of a 3-dimensional Structure on Semiconductor Substrate (반도체 기판 위의 3차원 구조에 대한 형상 진화 모델링 연구)

  • Jung, Hyun-Su;Won, Tae-Young
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.37 no.12
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    • pp.24-28
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    • 2000
  • This paper reports a new calculation method of three dimensional deposeition rate by level set method. To model an advancement of the surface efficiently, we have developed a new iteration method to re-initialize the level set function. For calculating etching and deposition rate by direct flow, we have developed a visibility test module and a refraction and re-sputtering model. Sputter deposition rate with shadow effect and surface refraction is calculated. We report that difference of profiles in cases that sticking coefficient are 1.0 and 0.3. We report that the difference of the deposition rate on bottom of the hole is caused by a difference of visible angle by the shadowing effect.

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Elastic and plastic behaviors of materials during the nanoindentation testing (나노인덴테이션 시험시 재료의 탄성.소성 변형거동)

  • 김지수;윤존도;김봉섭;고철호;이홍림;양현윤;조상봉
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.03a
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    • pp.244-244
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    • 2003
  • 나노인덴테이션은 시편에 압자를 침투시켜 재료의 기계적 특성을 파악할 수 있는 경도시험법이다. 압입범위를 나노미터범위로 조절할 수 있어 기존에 접근할 수 없었던 극 미소부분에로 응용이 넓어지고 있다. 경도시험시 재료의 탄성 및 소성 작용에 의해 재료는 변형되고, 표면변화 관찰을 통해 표면아래 부분에서 이루어지고 있는 거동을 예측할 수 있다. 이러한 관점에서 나노인덴테이션 시험시에도 발생하는 파일업과 싱크인 현상에서 재료가 나노미터 범위에서 어떠한 양상으로 변형을 하는지를 고찰하는 것은 의미가 있을 것이다. 본 연구에서 파일업과 싱크인의 양상을 파악하고 그 양을 정량화하기 위하여 가공경화양에 따른 표면변화와 압입하중 변화에 따른 표면변화를 관찰하였다. 어닐링한 봉상 알루미늄을 압축변형을 0%, 5%, 20%, 40%, 50% 로 변형시켜 가공경화를 일으켰고, 표면은 전해연마하여 나노압입시험이 가능하도록 하였다. 각각의 시편을 나노인덴테이션 압입하중을 변화시켜 재료에서 하중 변화에 따라 나타나는 표면변화를 관찰하였고, 위의 각 조건에서 파일업양을 정량화 하였다. 연구결과에 대해 ANSYS 유한요소분석 프로그램을 사용하여 재료의 변형양상을 시뮬레이션 하였고, 실제 실험데이터와 비교 분석하였다.

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Position Estimation of a Missile Using Three High-Resolution Range Profiles (3개의 고 분해능 거리 프로파일을 이용한 유도탄의 위치 추정)

  • Yang, Jae-Won;Ryu, Chung-Ho;Lee, Dong-Ju
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.29 no.7
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    • pp.532-539
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    • 2018
  • A position estimation technique is presented for a missile using high-resolution range profiles obtained by three wideband radars. Radar measures a target range using a reflected signal from the surface of a missile. However, it is difficult to obtain the range between the radar and the origin of the missile. For this reason, the interior angle between the moving missile and tracking radar is calculated, and a compensated range between surface of the missile and its origin is added to the tracking range of the radar. Therefore, position estimation of a missile can be achieved by using three total ranges from each radar to the origin of the missile. To verify the position estimation of the missile, electromagnetic numerical analysis software was used to prove the compensated range according to the flight position. Moreover, a wideband radar operating at 500-MHz bandwidth was applied, and its range profile was used for the position estimation of a missile.

Testing the Relationship between Person-Organizational Value Fit and Performance (개인-조직가치 부합수준과 성과관계 검증)

  • Park, Yang-Kyu;Yeo, Sung-Chil
    • The Korean Journal of Applied Statistics
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    • v.24 no.2
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    • pp.411-424
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    • 2011
  • The studies of congruence in organizational research have explored the concepts such as person-job fit person-organization fit, or person-environment fit. The relevant studies dealt with the fit level as an important influencing factor on the performance. In particular, researchers have agreed that employees can be motivated by the high level fit of person-organization. However, few research developing an alternative methodological approach has been done. For the purpose mentioned above the statistics like D, |D| or $D^2$ and the Q values such as Q(the correlation between two sets of interval measures) or $Q_r$(the correlation between two rankings) have been conventionally adopted in spite of numerous methodological problems. In general, these traditional indices such as difference scores, or Q values, are nondirectional and add an extra weight to differences of lager magnitude. Therefore, Edwards (1993) introduced the polynomial regression and the response surface analysis to overcome flaws with conventional approaches. However, the method-ological approaches did not reflect the profile characteristics of person-organizational value fit and wouldn't be a proper solution for the fit level of person-organization value maximizing performance. Hence, this paper investigates alternative methodological approaches, the multivariate polynomial regression and the multiple response surface analysis, to avoid the problems issued from conventional ways.

PID controller design for profile of the RTP system (RTP시스템의 프로파일작성을 위한 PID제어기 설계)

  • Hong, Sung-Hee;Choi, Soo-Young;Park, Ki-Heon
    • Proceedings of the KIEE Conference
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    • 2000.07d
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    • pp.2548-2550
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    • 2000
  • RTP(Rapid Thermal Processing)은 IC제조 공정과 관련된 열처리 과정에 사용되는 단일 웨이퍼프로세스 기술이다. 반도체 웨이퍼를 고속 열처리할 때 웨이퍼별로 작은 반응실에서 가열, 가공, 냉각된다. 현재 사용되는 반도체 열처리장비는 고온로(furnace)에의해 대부분 이루어지지만, 시간이 많이 걸려서 주문형반도체 생산과 같은 다양한 종류의 웨이퍼를 소량 생산하는데는 부적절하다. 이에 매우 적은 시간이 소요되는 RTP장비가 많이 연구되고 있다. 그러나 RTP는 예기치 못한 몇 가지의 문제점을 일으킨다. 그중 하나는 웨이퍼 표면에 분포된 온도의 불 균일성이다. 이러한 불 균일성은 웨이퍼의 표면에 심각한 왜곡(distortion)을 일으켜 좋지 못한 결과를 가져오게 한다. 이번 논문의 목적은 RTP시스템을 수학적으로 모델링하고, 이를 이용하여 멀티 램프 시스템의 입력값을 조절하여 이미 배치된 램프에 대한 최적의 온도 균일도에 알맞은 각 램프입력을 구하여 램프 입력 프로파일을 만들고 또한 이를 이용하여 외란에 대한 PID 제어기 설계를 목표로 한다.

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Characterization of TiN Layered Substrate using Leaky Rayleigh Surface Wave (누설 레일리 표면파를 이용한 TiN 코팅 부재의 특성평가)

  • Kwon, Sung-Duk;Kim, Hak-Joon;Song, Sung-Jin
    • Journal of the Korean Society for Nondestructive Testing
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    • v.26 no.1
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    • pp.7-11
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    • 2006
  • Since ceramic layers coated on machinery components inevitably experience the changes in their properties it is necessary to evaluate the characteristics of ceramic coating layers nondestructively for a reliable use of coated components and 4heir remaining life prediction. To address such a need, in the present study, an ultrasonic backward radiation technique is applied to investigate the characteristics of leaky Rayleigh surface waves propagating through the very thin TiN ceramic layers coated on AISI 1045 steel or austenitic 304 steel substrate with three different conditions of surface roughness, coating layer thickness and wear condition. In the experiments performed in the present work, the peak angle and the peak amplitude of ultrasonic backward radiation profile varied sensitively according to three specimen preparation renditions. in fact, this result demonstrates a high possibility of the ultrasonic backward radiation as an effective tool for the nondestructive characterization of the resting layers even in such a thin regime.

Development of microscopic surface profile estimation algorithm through reflected laser beam analysis (레이저 반사광 분석을 통한 미세 표면 프로파일 추정 알고리즘의 개발)

  • Seo Young-Ho;Ahn Jung-Hwan;Kim Hwa-Young;Kim Sun-Ho
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.11 s.176
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    • pp.64-71
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    • 2005
  • In order to measure surface roughness profile, stylus type equipments are commonly used, but the stylus keeps contact with surface and damages specimens by its tip pressure. Therefore, optics based measurement systems are developed, and light phase interferometer, which is based on light interference phenomenon, is the most noticeable research. However, light interference based measurements require translation mechanisms of nano-meter order in order to generate phase differences or multiple focusing, thus the systems cannot satisfy the industrial need of on-the-machine and in-process measurement to achieve factory automation and productive enhancement. In this research, we focused light reflectance phenomenon rather than the light interference, because reflectance based method do not need translation mechanisms. However, the method cannot direct]y measure surface roughness profile, because reflected light consists of several components and thus it cannot supply surface height information with its original form. In order to overcome the demerit, we newly proposed an image processing based algorithm, which can separate reflected light components and conduct parameterization and reconstruction process with respect to surface height information, and then confirmed the reliability of proposed algorithm by experiment.

A study on boron and phosphrous doping profile by RTA using 1MeV high energy ion implantaiton (1MeV 고에너지로 붕소(boron)와 인(phosphorus)을 이온주입 시급속 열처리에 따른 도핑 프로파일)

  • 강희원;전현성;노병규;조소행;김종규;김종순;오환술
    • Proceedings of the IEEK Conference
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    • 1998.06a
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    • pp.331-334
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    • 1998
  • p형 실리콘 기판위에 100.angs.의 초기 산화막을 성장시킨 후 붕소(B)와 인(P)을 1MeV 이온주입 에너지로 4.dec. tilting하여 붕소의 도즈량은 1*10/녀ㅔ 13/[cm/sup -2/]까지, 인은 1*10/sup 13/[cm/sup -2]로부터 1*10/sup 14/[cm/sup -2/] 까지 변화시키며 이온 주입하였다. 이온주입 후 RTA 로서 열처리 하였으며, 열처리 시간은 10초에서 40초까지,열처리 온도를 1000.deg.C에서 1100.deg.C까지 변화하였다. 이후 기파낸의 불순물의 프로파일 및 미세 결함의 분포를 분석하기 위하여, SIMS, SRP, XTEM 분석을 실시하였고, 이를 monte-carlo 모ㅓ델로서 시뮬레이션하여 비교하였다. SIMS 분석 결과 열처리 온도와 시간이 증가할수록 접합깊이가 증가하였고, 프로파일이 넓어짐을 볼수 있다. SRP 측정에서 붕소는 주해거리 (Rp)값은 1.8.mu.m~1.9.mu.m, 인의 경우는 1.1.mu.m~1.2.mu.m의 주행거리 (Rp) 값이 나타났다. XTEM 분석결과 붕소의 경우 열처리에 전후에도 결함을 볼수 없었고, 인의 경우 열처리 이후에 실리콘 결정내부에 있던 산소(O)와 인(P)우너자의 pinning효과에 의해 전위다이폴을 형성하여 표면근처로 성장함을 볼수 있었다.

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