• Title/Summary/Keyword: 표면거칠기방향비

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Properties of $RuO_2$ Thin Films for Bottom Electrode in Ferroelectric Memory by Using the RF Sputtering (RF Sputtering 법으로 제작한 강유전체 메모리의 하부전극용$RuO_2$ 박막의 특성에 관한 연구)

  • 강성준;정양희
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.4 no.5
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    • pp.1127-1134
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    • 2000
  • $RuO_2$ thin films are prepared by RP magnetron reactive sputtering and their characteristics of crystalliBation,microstructure, surface roughness and resistivity are studied with various O2/(Ar+O2)ratios and substrate temperatures. As O2/(Ar+O2) ratio decreases and substrate temperature increases, the preferred growing plane of$RuO_2$ thin films are changed from (110) to (101) plane. With increase of the 021(Ar+O2) ratio from 2075 to 50%, the surface roughness and the resistivity of $RuO_2$ thin films increase from 2.38nm to 7.81nm, and from $103.6 \mu\Omega-cm\; to \; 227 \mu\Omega-cm$, respectively, but the deposition rate decreases from 47nm/min to 17nm/min. On the other hand, as the substrate temperature increases from room temperature to$500^{\circ}C$, resistivity decreases from $210.5 \mu\Omega-cm\; to \; 93.7\mu\Omega-cm$. $RuO_2$ thin film deposited at $300^{\circ}C$ shows a excellent surface roughness of 2.38 m. As the annealing temperature increases in the range between $400^{\circ}C$ and $650^{\circ}C$, the resistivity decreases because of the improvement of crystallinity. We find that RuO$_2$ thin film deposited at 20% of 02/(Ar+O2) ratio and $300^{\circ}C$ of substrate temperature shows excellent combination of surface smoothness and low resistivity so that it is well qualified for bottom electrode for ferroelectric thin films.

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A Study on the Failure Behavior of Reinforced Clay (보강점토의 파괴거동에 관한 연구)

  • 유한규
    • Geotechnical Engineering
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    • v.13 no.1
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    • pp.159-168
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    • 1997
  • In order to investigate the effect of parameters such as orientation and surface roughness of a reinforcing material as well as the water content of the clay matrix on the stress-strain and failure behavior of reinforced clay, uniaxial compression tests were performed on clay samples reinforced with a steel inclusion Test results showed that the increase or decrease in strength of reinforced clay samples was found to depend on the orientation of a steel inclusion as well as water content of clay samples. The possible weakening mechanism induced by reinforcement in clay samples was related to the development of cracks along the tips of interface between steel inclusion and clay matrix. A theoretical interpretation of failure behavior of reinforced clay was made by using fracture mechanics theory, and the experimental results were compared with the theoretical predictions. The predicted crack propagation direction obtained from fracture criteria for a material containing a closed crack with friction agreed reasonably well with the measured values obtained from tests.

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Study on Pullout Behavior of Pipe Anchor (파이프형 앵커의 인발거동에 대한 연구)

  • Bae, Wooseok;Lee, Bongjik;Kwon, Youngcheul;Lee, Jundae
    • Journal of the Korean GEO-environmental Society
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    • v.9 no.1
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    • pp.5-10
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    • 2008
  • In this study, laboratory model test was performed to estimate pullout behavior of pipe type anchor with surface roughness, embedment and diameter. The design of buried pipe anchors in areas of vertical ground movement is governed, in part, by magnitude of the forces imposed on the pipe and displacements at which they are developed. In this paper, uplift resistance and displacement characteristics of pipe anchors caused by ground condition and embedment ratio, surface roughness, pipe diameter through the analysis of pipe anchor model test were compared and analyzed. The test results of the buried pipe showed that as the relative density increases, ultimate uplift resistance increase in 20%. When pipe anchor is failed with the relative density of the ground, the change of surface roughness, it was shown that the deformation increases as the ratio of penetration increases from 2 to 8 in five times approximately. And most anchor-based theories overestimate the breakout factor.

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A Study on the Grinding Characteristics of the Quartz(II) (Quartz의 연삭 특성에 관한 연구 (II))

  • Lim, J. G.;Ha, S. B.;Kim, S. H.;Choi, H.;lee, J. C.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2000.11a
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    • pp.875-879
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    • 2000
  • In the previous report1), the grinding characteristics of quartz were investigated. In this paper, the grinding mechanisms of brittle materials including ceramics and quartz are modeled and a new parameter SDR(Surface roughness Direction Ratio) is proposed to characterize the grinding mechanisms of such materials. A set of experiments were performed to verify the effectiveness of the suggested parameter. The experimental results indicate that the plastic deformation is the dominant material removal mode at the grinding conditions which show the higher value of SDR. In the case of quartz, the material was removed by brittle fracture in a lower value of SDR and by plastic deformation in a higher value of it. SDR is not affected by wheel mesh size when brittle fracture occured. But in the plastic deformation case, SDR value increases with wheel mesh size.

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Preparation of CeO$_2$ Thin Films as an Insulation Layer and Electrical Properties of Pt/$SrBi_2$$Ta_2$$O_9$/$CeO_24/Si MFISFET (절연층인 CeO$_2$박막의 제조 및 Pt/$SrBi_2$$Ta_2$$O_9$/$CeO_24/Si MFISFET 구조의 전기적 특성)

  • Park, Sang-Sik
    • Korean Journal of Materials Research
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    • v.10 no.12
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    • pp.807-811
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    • 2000
  • CeO$_2$ and SrBi$_2$Ta$_2$O$_{9}$ (SBT) thin films for MFISFET (Metal-ferroelectric-insulator-semiconductor-field effect transistor) were deposited by r.f. sputtering and pulsed laser ablation method, respectively. The effects of sputtering gas ratio(Ar:O$_2$) during deposition for CeO$_2$ films were investigated. The CeO$_2$ thin films deposited on Si(100) substrate at $600^{\circ}C$ exhibited (200) preferred orientation. The preferred orientation, Brain size and surface roughness of films decreased with increasing oxygen to argon gas ratio. The films deposited under the condition of Ar:O$_2$= 1 : 1 showed the best C- V characteristics. The leakage current of films showed the order of 10$^{-7}$ ~10$^{-8}$ A at 100kV/cm. The SBT thin films on CeO$_2$/Si substrate showed dense microstructure of polycrystalline phase. From the C-V characteristics of MFIS structure with SBT film annealed at 80$0^{\circ}C$, the memory window width was 0.9V at 5V The leakage current density of Pt/SBT/CeO$_2$/Si structure annealed at 80$0^{\circ}C$ was 4$\times$10$^{-7}$ /$\textrm{cm}^2$ at 5V.

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자장 강화된 유도결합형 플라즈마를 이용한 TFT-LCD용 Al-Nd 박막의 식각 특성 개선에 관한 연구

  • 한혜리;이영준;오경희;홍문표;염근영
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.195-195
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    • 2000
  • TFT-LCD의 제조공정은 박막층의 식각 공정에 대해 기존의 습식 공정을 대치하는 건식식각이 선호되고 있다. 건식 식각 공정은 반도체 공저에 응용되면서 소자의 최소 선폰(CD)이 감소함에 따라 유도결합셩 프라즈마를 비롯한 고밀도 플라즈마 이용한 플라즈마 장비 사용이 증가하는 추세이다. 여기에 평판디스플레이의 공정을 위해서는 대면적과 사각형 기판에 대한 균일도를 보장할 수 있는 고밀도의 균일한 플라즈마 유지가 중요하다. 본 실험에서는 자장강화된 유도결합형 플라즈마의 플라즈마 밀도 및 균일도를 살펴보고 TFT-LCD에 gate 전극으로 사용되는 Al-Nd 박막의 식각을 통하여 식각균일도와 식각속도 및 식각 선택도 등의 건식 식각 특성을 보고자 한다. 영구자석 및 전자석의 설치는 사각형의 유도결합형 플라즈마는 소형 영구자석을 배열하여 부착하였으며, 외부에는 chamber와 같이 사각형태의 전자석을 500mm$\times$500mm의 크기를 갖는 z축 방향의 Helmholtz형으로 제작하였다. 더. 영구자석 배열에 대해서는 자석간의 거리와 세기 변화를 조합하여 magnetic cusping의 변화를 주었으며 전자석의 세기는 전류값을 기준으로 변화시켜 보았다. 실험을 통하여 플라즈마 균일도를 5% 이하로 개선하고 이러한 균일도를 유지하며 플라즈마 밀도를 높일 수 있는 조건을 찾을 수 있었다. 이러한 적합화된 조건에서 저장강화된 유도결합형 프라즈마를 Al-Nd 박막 식각에 응용한 결과, Al-Nd의 식각속도 및 식각 선택도는 유도결합형 프라즈마에 비해 크게 증가하였으며, 식각균일도가 개선되는 것을 관찰하였다. 또한 electrostatic probe(Hiden, Analytical)를 이용하여 Al-Nd 식각에 사용된 반응성 식각가스에 대한 저장강화된 유도결합형 플라즈마의 특성 분석을 수행하였다.c recoil detection, Rutherford backscattering spectroscopy, X-ray diffraction, secondary electron microscopy, atomic force microscoy, $\alpha$-step, Raman scattering spectroscopu, Fourier transform infrared spectroscopy 및 micro hardness tester를 이용하여 기판 bias 전압이 DLC 박막의 특성에 미치는 영향을 조사하였다. 분석결과 본 연구에서 제작된 DLC 박막은 탄소와 수소만으로 구성되어 있으며, 비정질 상태임을 알 수 있었다. 기판 bias 전압의 증가에 따라 박막의 두께가 감소됨을 알 수 있었고, -150V에서는 박막이 거의 만들어지지 않았으며, -200V에서는 기판 표면이 식각되었다. 이것은 기판 bias 전압과 ECR 플라즈마에 의한 이온충돌 효과 때문으로 판단되며, 150V 이하에서는 증착되는 양보다 re-sputtering 되는 양이 더 많을 것으로 생각된다. 기판 bias 전압을 증가시킬수록 플라즈마에 의한 이온충돌 현상이 두드러져 탄소와 결합하고 있던 수소원자들이 떨어져 나가는 탈수소화 (dehydrogenation) 현상을 확인할 수 있었으며, 이것은 C-H 결합에너지가 C-C 결합이나 C=C 결합보다 약하여 수소 원자가 비교적 해리가 잘되므로 이러한 현상이 일어난다고 판단된다. 결합이 끊어진 탄소 원자들은 다른 탄소원자들과 결합하여 3차원적 cross-link를 형성시켜 나가면서 내부 압축응력을 증가시키는 것으로 알려져 있으며, hardness 시험 결과로 이것을 확인할 수 있었다. 그리고 표면거칠기는 기판 bias 전압을 증가시킬수록 더 smooth 해짐을 확인하였다.인하였다.을 알 수 있

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