• Title/Summary/Keyword: 패턴 리페어

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A Study on Micro-Electrode Pattern of Repair Process Using Electrohydrodynamic Printing System (전기수력학 프린팅 기술을 이용한 미세전극 패턴의 리페어 공정 적용에 관한 연구)

  • Yang, Young-Jin;Kim, Soo-Wan;Kim, Hyun-Bum;Yang, Hyung-Chan;Lim, Jong-Hwan;Choi, Kyung-Hyun
    • Clean Technology
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    • v.22 no.4
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    • pp.232-240
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    • 2016
  • Recently, various research studies have been conducted and many are in progress for the suitable alternative materials for ITO based touch screen panel (TSP) due to limitations in size and flexibility. Various researches from all over the world have been attempted to fabricate the fine electrode less than $5{\mu}m$ for the rapid developing of display technology. Research is also being carried out in metal mesh methods using the existing technologies and alternative materials at commercial level. However, by using the existing technologies certain discrepancies are observed like low transparency and low yield which also results in the distortion of patterns. For repairing the damaged pattern, the conventional laser CVD technique has also been used but there are some challenges observed in CVD technique like achieving a stable fine electrode of $10{\mu}m$ or less and avoiding the formation of satellite drops. To overcome these issues, a new printing process named Electrohydrodynamic (EHD) printing, has been introduced by which $5{\mu}m$ fine patterns can be printed in one step. This EHDA printing technique has been applied to print very fine electrodes of $5{\mu}m$ or less by using conductive inks of various viscosities. This study also presents the optimized process parameters for printing $5{\mu}m$ fine electrode patterns during experiments by controlling the applied voltage and supply flow rate. The $5{\mu}m$ repair electrodes were fabricated for repairing $50{\mu}m$ shorted electrode samples.

A Study of Laser Repair for Thin Film Pattern (박막 패턴의 레이저 리페어 연구)

  • 강형식;홍성준;최종윤;홍순국;전태옥
    • Laser Solutions
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    • v.1 no.1
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    • pp.39-44
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    • 1998
  • Laser ablation system for microscopic defect in thin film pattern was developed in this study. For the varification of this study, several laser ablation tests were accomplished. The ablated shape of thin film and the surface of base glass were analyzed by use of microscopic tools and EPMA. After some tests of thin film, the specification of laser and optical unit(max. laser energy is 25mJ, wavelength is 532nm, Q-switched Nd-YAG laser, frequency is 20Hz, Auto-focus unit is LD type.)

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