• Journal of Ocean Engineering and Technology
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• v.11 no.2
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• pp.28-38
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• 1997

The corrosion fatigue test was conducted in air to investigate the corrosion fatigue strength of SM 30 C steel by which was corroded in the under sea and surface in the conditions of 3.0% NaCl salt solution. The fatigue tests were carried out on a rotary bending testing machine of cantilever type. The corrosion effect of the sea surface conditionwas served more than that of the under sea condition which was due ti the periodic contact of air thus accelerate the corrosion. The difference of the fatgue strength between sea surface and under sea conditions decreased with increase of stree level and corroded period. Inthe case of the solid shaft and thickness 2mm of hollow shaft, the difference of corrosion fatigue strength decreased as stress level and corrosion periodic increasing. Onthe contrary in the case of thickness 1mm of hollow sgaft, the difference of it increased as stress level, corrosionn periooodic increasing and also the condition of corrosion chaanged. The main factors affecting the degradation of fatigue strength due to corrosion were the reduction of sectional area and the increase of surface roughness. The interference phenomenon increase with stress level got higher.

• Korean Journal of Optics and Photonics
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• v.35 no.4
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• pp.175-183
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• 2024

Research into optical signal processing using photonic integrated circuits (PICs) has been actively pursued in various fields, including optical communication, optical sensors, and quantum optics. Among the materials used in PIC fabrication, polymers have attracted significant interest due to their unique characteristics. To fabricate polymer-based PICs, establishing an accurate manufacturing process for the cross-sectional structure of an optical waveguide is crucial. For stable device performance and high yield in mass production, a process with high reproducibility and a wide tolerance for variation is necessary. This study proposes an efficient method for fabricating polymer optical-waveguide devices by introducing the atomic layer deposition (ALD) process. Compared to conventional photoresist or metal-film deposition methods, the ALD process enables more precise fabrication of the optical waveguide's core structure. Polyimide optical waveguides with a core size of 1.8 × 1.6 ㎛² are fabricated using the ALD process, and their propagation losses are measured. Additionally, a multimode interference (MMI) optical-waveguide power-splitter device is fabricated and characterized. Throughout the fabrication, no cracking issues are observed in the etching-mask layer, the vertical profiles of the waveguide patterns are excellent, and the propagation loss is below 1.5 dB/cm. These results confirm that the ALD process is a suitable method for the mass production of high-quality polymer photonic devices.