• Title/Summary/Keyword: 콘젯

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Experimental study on CIS thin film deposition via electrostatic spray technique (정전기 스프레이 기술을 이용한 CIS 박막코팅에 관한 실험적 연구)

  • Yoon, Hyun;Yoon, Sukgoo;Kim, Hoyoung
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.11a
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    • pp.37.2-37.2
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    • 2010
  • Electrostatic spray deposition is an innovative coating technique that produces fine, uniform, self-dispersive (due to the Coulombic repulsion), and highly wettable, atomized drops. Copper-indium salts are dissolved in an alcohol-based solvent, which is then electrostatically sprayed onto a moderately heated, molybdenum-coated substrate. Solvent flowrates range from 0.02 to 5 ml/hr under applied voltages of 1 to 20 kV yielding drop sizes around a few hundred nanometers. By comparing the scanning electron miscrscope images of coated samples, the substrate temperature, applied voltage, solvent flowrate, and nozzle-substrate distance are demonstrated to be the primary parameters controlling coating quality. Also, the most stable electrostatic spray mode that reliably produces uniform and fine drops is the cone-jet mode with a Taylor cone issuing from the nozzle.

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A Study of Micro Stencil Printing based on Solution Atomization Process (용액 미립화공정 기반의 마이크로 스텐실 프린팅에 관한 연구)

  • Dang, Hyun Woo;Kim, Hyung Chan;Ko, Jeong Beom;Yang, Young Jin;Yang, Bong Su;Choi, Kyung Hyun;Doh, Yang Hoi
    • Journal of the Korean Society for Precision Engineering
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    • v.31 no.6
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    • pp.483-489
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    • 2014
  • In this study, experiments were conducted for micro pattern printing to combine solution atomization process and stencil printing based on electrospray deposition. The stencil mask fabricated by etching the photosensitive glass placed below 0.3 mm distance to substrate has 100 um line width. The process parameters of electrospray deposition system for the atomization of the solution are applied voltage and supply flow rate of the solution. Meniscus angle of cone-jet was optimized by varying the supply flow rate from 0.3 ml/hr to 0.7 ml/hr. Voltage condition was verified having symmetric cone-jet angle and no pulsation at 8.5 kV applied voltage. In addition, a number of micro patterns are printed using a single 1 step process by solution atomization process. Variable line width of approximate 100 um was confirmed by changing conditions of solution atomization regardless of the pattern size of stencil mask.