• Journal of the Korean Society of Manufacturing Process Engineers
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• v.10 no.4
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• pp.96-101
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• 2011

The thin films of TiN have been used extensively as wear-resistant materials, for instance, such as tools of high-speed cutting, metal mold forming etc. In these days, because the thin films capable of being used more severe conditions are needed, the technologies of arc ion plating are tried to improve its characteristics. The purpose of this study is to investigate the characteristics of thin films of (Ti,Cr)N compared with those of TiN. The method of arc ion plating, which is known as showing good tight-adherence and productivity, was used. After manufacturing thin films of ($Ti_{1-x}Cr_{x}$)N (x=0~1) with change of Cr in (Ti,Cr) target, atomic concentration, structure, size of crystallite, residual stress and surface roughness of thin films on substrate were investigated. As the results, it was confirmed that Cr atomic concentrations of thin films were proportionally changed with Cr atomic concentrations of target, and thin films of ($Ti_{1-x}Cr_{x}$)N (x=0~1) showed NaCl type and CrN existed as solid solution to TiN.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.1 no.1
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• pp.37-42
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• 2000

Copper thin films have been prepared by a metal organic chemical vapor deposition (MOCVD) technology on polyimide and TiN substrates. The Cu-MOCVD technology has advantages of the high deposition rate and the good step coverage compared with the conventional physical vapor deposition (PVD) technology in several industrial applications. The Cu films have been deposited with varying the experimental conditions of substrate temperatures and copper source vapor pressures. The films were annealed in a vacuum condition after the deposition, and the annealing effect on the electrical properties of the films was measured. The crystallinity and the microstructures of the films were observed by scanning electron microscopy (SEM), and the electrical resistivity was measured by 4-point probe. In the case of the Cu deposition on TiN substrate, the best electrical property of the films was measured for the samples prepared at 18$0^{\circ}C$. Very high deposition rate of the Cu film up to 250 nm/min was obtained on the polyimide substrate when the mixture of liquid and vapour precursor was used.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.8 no.3
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• pp.432-436
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• 2007

We have studied on the tribological characteristics of Plasma Vapour Deposition(PVD) coating method in Automotive Structural Materials. Coating materials were deposited by the Titanium carbide(TiC) and Titanium nitride(TiN). An experimental process was established to determine the tribological characteristics of friction and wear behaviour with the variation of applied load, temperature and the time with the Falex friction and wear test machine. It was improved that when the surface modification of hard coatings(TiC, TiN) was deposited steel, the tribological characteristics become better. It is argued that it is improved because of excellence of the anti-wear, the extreme pressure properties and tile heat stability.

• Journal of the Korean Society of Mechanical Technology
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• v.13 no.3
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• pp.31-37
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• 2011

The purpose of this study is to investigate cutting characteristics and wear behavior in SCM440 steel with different cutting tools, CBN(Cubic Boron Nitride) and coated CBN. During the test coated CBN tool especially with TiAlN showed better wear resistance behavior than orginal CBN tools. In the interrupted cutting condition, axial groove affected tool surface with impact force during the turning operation. For advantageous turning parameter in the interrupted process it is recommendable that lower speed. Also surface roughness showed better behavior in the coated CBN tool conditions than normal CBN conditions. Mainly this is caused by reduced friction between material and tool surface with coated layer.