• 한국신재생에너지학회:학술대회논문집
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• 2010.11a
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• pp.37.2-37.2
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• 2010

Electrostatic spray deposition is an innovative coating technique that produces fine, uniform, self-dispersive (due to the Coulombic repulsion), and highly wettable, atomized drops. Copper-indium salts are dissolved in an alcohol-based solvent, which is then electrostatically sprayed onto a moderately heated, molybdenum-coated substrate. Solvent flowrates range from 0.02 to 5 ml/hr under applied voltages of 1 to 20 kV yielding drop sizes around a few hundred nanometers. By comparing the scanning electron miscrscope images of coated samples, the substrate temperature, applied voltage, solvent flowrate, and nozzle-substrate distance are demonstrated to be the primary parameters controlling coating quality. Also, the most stable electrostatic spray mode that reliably produces uniform and fine drops is the cone-jet mode with a Taylor cone issuing from the nozzle.

• Journal of the Korean Society for Precision Engineering
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• v.30 no.6
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• pp.567-572
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• 2013

In many electro-devices, the vacuum process is used as the manufacturing process. However, the vacuum process has a problem, it is difficult to apply to a continuous process such as a R2R(roll to roll) printing process. In this paper, we propose an ESD (electro static deposition) printing process has been used to apply an organic solar cell of thin film forming. ESD is a method of liquid atomization by electrical forces, an electrostatic atomizer sprays micro-drops from the solution injected into the capillary with electrostatic force generated by electric potential of about several tens kV. The organic solar cell based on a P3HT/PCBM active layer and a PEDOT:PSS electron blocking layer prepared from ESD method shows solar-to-electrical conversion efficiency of 1.42% at AM 1.5G 1sun light illumination, while 1.86% efficiency is observed when the ESD deposition of P3HT/PCBM is performed on a spin-coated PEDOT:PSS layer.

• 한국신재생에너지학회:학술대회논문집
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• 2010.11a
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• pp.41.1-41.1
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• 2010

전기수력학적 분무를 이용한 액적 미립화 기술은 나노사이즈의 액적 형성, 쿨롱 반발력에 의한 균일한 액적 형성, 그리고 향상된 액적 타겟팅을 가능하게 한다. 따라서 이를 이용하여 매우 균일한 박막 코팅이 가능하다. 이러한 점에 힘입어 현재 진공 공정으로 제작되고 있는 CIGS태양전지의 광흡수층을 비진공 공정중 하나인 전기수력학적 미립화를 이용하여 실험하였다. Ethanol-based 의 CIGS나노 입자를 포함하는 콜로이드 상태의 전구체를 이용하여 적절히 가열된 몰리브덴 배면 전극위에 적용하였다. 미립화한 액적은 접지된 몰리브덴 층에 부착되는 즉시 증발하여 CIGS입자를 남긴다. 여기서 가장 중요하게 다루어야 할 조건은 기판의 온도, 인가 전압, 전구체의 유량이다. 분사 모드는 Cone-jet을 적용하였으며 5~15kV의 인가 전압에서 1ml/hr내외의 유량을 공급하여 3분 이내에 적절한 광흡수층 두께인 1마이크론 내외에 도달할 수 있다. 이와같은 조건으로 형성된 박막층에 관한 SEM image를 통해 다른 비진공 코팅 방식과 비교하였다.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.16 no.3
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• pp.116-120
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• 2006

We have investigated plasma spray coated $Al_2O_3$ layers on Al-60 series substrates for development of wafer electrostatic chuck in semiconductor dry etching system. Samples were prepared without/with cooling bar on backside of samples, at various distances, and with different powder feed rates. There were many cracks and pores in the $Al_2O_3$ layers coated on Al-60 series substrates without cooling bar on the backside of samples. But the cracks and pores were almost disappeared in the $Al_2O_3$ layers on Al-60 series substrates coated with cooling bar on the back side of samples, 15 g/min. powder feed rate and various 60, 70, 80 mm working distances. Then the surface morphology was not changed with various working distances of 60, 70, 80 mm. When the powder feed rate was changed from 15 g/min to 20 g/min, the crack did not appear, but few pores appeared. Also the $Al_2O_3$ layer was coated with many small splats compared with $Al_2O_3$ layer coated with 15 g/min powder feed rate. The deposited rate of $Al_2O_3$ layer was higher when the process was done without cooling bar on the back side of sample than that with cooling bar on the back side of sample.