• Journal of the Korean Vacuum Society
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• v.12 no.1
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• pp.35-39
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• 2003

Using RF plasma enhanced chemical vapor deposition, amorphous carbon films were grown in pure methane plasma. Field electron emission of these films were examined at a function of deposition temperature. It was found that the electron emission current of the sample prepared at deposition temperature above $600^{\circ}C$ was considerably improved. The film grown at deposition temperature of $800^{\circ}C$ had the best threshold field of 8 V/$\mu\textrm{m}$ in this experiment. According to the results of Raman spectroscopy. growth of graphite crystallites was promoted with higher deposition temperatures. Moreover the surface morphology was abruptly changed at deposition temperature above $600^{\circ}C$. We discuss the field electron emission characteristics of amorphous carbon films with regard to the structural feature and surface morphology.

• Journal of Korea Society of Industrial Information Systems
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• v.11 no.4
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• pp.66-71
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• 2006

Carbon nanofibers have synthesized a low temperature using DC Ar plasma and Fe-Phthalocyanine, and a characteristic difference of the synthesized CNF according to the location of the substrate was investigated. The carbon nanofibers had about 100nm diameter and up to $10{\mu}m$ length. These were grown in random orientation. There are two shapes in the CNFs, screw and straight line shapes. Furthermore, we found the selective growth of nanofibers on the scratched substrates. The density of CNFs synthesized on the position (a) were higher than that synthesized on the position (b) [See the Fig. 2]. Also, the length of CNFs was different. In the shape, CNFs with screw and straight line shape were synthesized in the position (a), but. only CNFs with straight line shape were synthesized in the position (b). The difference have an important effect on the field emission characteristics.

• Proceedings of the Korean Vacuum Society Conference
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• 2002.02a
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• pp.153-153
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• 2002

• Proceedings of the Korean Vacuum Society Conference
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• 2001.07a
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• pp.48-48
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• 2001

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07b
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• pp.935-938
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• 2004

In this work, carbon nanofibers have synthesized a low temperature using DC Ar Plasma and Fe-Phthalocyanine, and a characteristic difference of the synthesized CNF according to the location of the substrate was investigated. the density of CNFs synthesized on the position (a) were higher than that synthesized on the position (b) [See the Fig. 1]. Also, the length of CNFs was different. In the shape, CNFs with screw and straight line shape were synthesized in the position (a), but only CNFs with straight line shape were synthesized in the position (b). The difference have an important effect on the field emission characteristics.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.11a
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• pp.519-523
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• 2000

Using plasma-enhanced chemical vapor deposition (PECVD), carbon thin film as electron field emitter were fabricated. These carbon thin film were deposited on Si(100) substrate at several RF power. These film were estimated by raman spectroscopy, scanning electron microscopy, and field emission. The field electron emission property of these carbon thin film was estimated by a diode technique. As the result, we observed that the field emission properties of these films were promoted by higher RF power. These results are explained as change of surface morphology and structural properties of carbon thin film