• Title/Summary/Keyword: 자외선 레이저

Search Result 74, Processing Time 0.022 seconds

Rapid Fabrication of Micro-nano Structured Thin Film for Water Droplet Separation using 355nm UV Laser Ablation (355 nm UV 레이저 어블레이션을 이용한 마이크로-나노 구조의 액적 분리용 박막 필터 쾌속 제작)

  • Shin, Bo-Sung
    • Journal of the Korean Society for Precision Engineering
    • /
    • v.29 no.7
    • /
    • pp.799-804
    • /
    • 2012
  • Recently micro-nano structures has widely been reported to improve the performance of waterproof, heat isolation, sound and light absorption in various fields of electric devices such as mobiles, battery, display and solar panels. A lot of micro-sized holes on the surface of thin film provide excellent sound, or heat, or light transmission efficiency more than solid film and simultaneously nano-sized protrusions around micro hole increase the hydrophobicity of the surface of thin film because of lotus leaf effects as generally known previously. In this paper new rapid fabrication process with 355 nm UV laser ablation was proposed to get micro-nano structures on the surface of thin film, which have only been observed at higher laser fluence. Developed thin micro-nano structured film was also investigated the hydrophobic property by measuring the contact angle and demonstrated the possibility to apply to water droplet separation.

Mask Patterning for Two-Step Metallization Processes of a Solar Cell and Its Impact on Solar Cell Efficiency (태양전지 2 단계 전극형성 공정을 위한 마스크 패턴공정 및 효율에 대한 영향성 연구)

  • Lee, Chang-Joon;Shin, Dong-Youn
    • Transactions of the Korean Society of Mechanical Engineers B
    • /
    • v.36 no.11
    • /
    • pp.1135-1140
    • /
    • 2012
  • Two-step metallization processes have been proposed to achieve high-efficiency silicon solar cells, where the front-side grids are formed by silver plating after the formation of a nickel seed layer with a mask. Because the conventional mask patterning process is performed by an expensive selective printing method using either UV resist or phase change ink, however, the combination of a simple coating and laser-selective ablation processes is proposed in this study as an alternative means. As a masking material, the solar cell wafer was coated with either inexpensive wax having a low melting temperature or a fluorocarbon solution, and then, an electrode image was patterned by selectively removing the masking material using the laser. It was found that the fluorocarbon coating was not only superior to the wax coating in terms of pattern uniformity but it also increased the efficiency of the solar cell by 0.16%, as confirmed by statistical f and t tests.

Laser absorption spectroscopy of ternary gas mixture of He-Ne-Xe in External Electrode Fluorescent Lamp (EEFL) (레이저 흡수 분광법을 이용한 He-Ne-Xe 상종가스의 외부전곡 램프의 $1s_4$ 공명준위와 $1s_5$ 준안정준위의 제논 원자 밀도에 대한 연구)

  • Jeong, S.H.;Oh, P.Y.;Lee, J.H.;Cho, G.S.;Choi, E.H.
    • Journal of the Korean Vacuum Society
    • /
    • v.15 no.6
    • /
    • pp.576-580
    • /
    • 2006
  • Mercury-free lamp, external electrode fluorescent lamp (EEFL) which includes the xenon gas, is now going on the research for the replacement of mercury lamp. The densities of excited xenon atom in the $1s_4$ resonance state and the $1s_5$ metastable state are investigated in the EEFL by a laser absorption spectroscopy under various gas pressures. We have measured the absorption signals for both $1s_4$ resonance and the $1s_5$ metastable state in the EEFL by varying the discharge currents for a given pressure. This basic absorption characteristic is very important for improvement of the VUV luminous efficiency of the EEFL as well as plasma display panel.

Laser-induced plasma emission spectra of halogens in the helium gas flow and pulsed jet (헬륨 가스 플로우와 가스 펄스 젯에서 할로겐족 원소들의 레이저유도 플라즈마 방출 스펙트럼)

  • Lee, Yonghoon;Choi, Daewoong;Gong, Yongdeuk;Nam, Sang-Ho;Nah, Changwoon
    • Analytical Science and Technology
    • /
    • v.26 no.4
    • /
    • pp.235-244
    • /
    • 2013
  • Detection of halogens using laser-induced breakdown spectroscopy (LIBS) in open air is very difficult since their strong atomic emission lines are located in VUV region. In NIR region, there are other emission lines of halogens through electronic transitions between excited states. However, these lines undergo Stark broadening severely. We report the observation of the emission lines of halogens in laser-induced plasma (LIP) spectra in NIR region using a helium gas flow. Particularly, the emission lines of iodine at 804.374 and 905.833 nm from LIPs have been observed for the first time. In the helium ambient gas, Stark broadening of the emission lines and background continuum emission could be suppressed significantly. Variations of the line intensity, plasma temperature, and electron density with the helium flow rate was investigated. Detection of chlorine and bromine in flame retardant of rubbers was demonstrated using this method. Finally, we suggest a pulsed helium gas jet as a practical and ecomonical helium gas source for the LIBS analysis of halogens in open air.

Analysis of discharge characteristics of KrF laser system with UV preionization (자외선 예비전리 KrF 레이저의 방전특성 해석)

  • Choi, Boo-Yeon;Lee, Choo-Hie
    • Proceedings of the KIEE Conference
    • /
    • 1989.07a
    • /
    • pp.642-646
    • /
    • 1989
  • We have developed analysis program of discharge chracteristics of KrF laser system with charge transfer type, that studied about deposited energy, nonlinear discharge, and electron number density in the laser tube. With this program, voltagr, current, and deposited energy was calculated 27 KV,32.6 KA,200 MW at total pressure 2 atm and charging voltage 33 KV, respectively. At this condition, circuit parameters are L1=150nH, R1=$0.3{\Omega}$, L2=15nH, R2= $0.3{\Omega}$. In addition, nonlinear discharge resistance and electron number density was calculated ${\infty}{\sim}0.17{\Omega}.1{\times}10^{16}cm^{-3}$, respectively.

  • PDF

Development of A New Fourier Transform Lithography Method in Nano Meter Scale (새로운 나노미터급 프리어 변환 리소그래피법 개발)

  • Kim Chang Kyo;Hong Chinsoo;Lee Eui Sik;Park Sung Hoon
    • Proceedings of the KAIS Fall Conference
    • /
    • 2005.05a
    • /
    • pp.125-127
    • /
    • 2005
  • 나노미터 크기의 임의형상 패턴을 형성하기 위해서 새로운 프리어 변환 리소그래피법을 개발하였다. 나노미터급 리소그래피에서 자외선과 엑스레이 같은 전자기파가 나노미터 크기로 형상을 새긴 마스크 위에 조사되면 회절현상이 발생하여 불명확한 패턴을 얻게 된다. 극자외선을 사용하지 않고도 상대적으로 긴 파장의 레이저빔을 특수하게 제작된 마스크를 통해 볼록렌즈에 조사할 경우에 프리어 평면이라 알려진 평면위에 나노미터 크기의 패턴을 형성할 수 있다는 것을 증명하였다. 이 방법은 매우 단순한 장치로 구성할 수 있다는 장점을 가질 수 있다.

  • PDF

과학기술위성 2호 운영개념

  • Lee, Seung-Hun;Keum, Jung-Hoon;Park, Jong-Oh;Sim, Eun-Sup
    • Aerospace Engineering and Technology
    • /
    • v.3 no.1
    • /
    • pp.79-85
    • /
    • 2004
  • In this study, the operations concept of STSAT-2 which will be launched by KSLV-1, the first Korean Space Launch Vehicle, from Naro is explained. The major tasks of STSAT-2 is acquiring Lyman-alpha images of Sun by LIST(Lyman-alpha Imaging Solar Telescope) payload and the exact position of the satellite by calculating distance between STSAT-2 and SLR ground stations using SLR(Satellite Laser Ranging) payload. Also spacecraft technology verification is performed.

  • PDF

New lithography technology to fabricate arbitrary shapes of patterns in nanometer scale (나노미터 크기의 임의 형상을 제작하기 위한 새로운 리소그래피 기술)

  • 홍진수;김창교
    • Journal of the Korea Academia-Industrial cooperation Society
    • /
    • v.5 no.3
    • /
    • pp.197-203
    • /
    • 2004
  • New lithography techniques are employed for the patterning of arbitrary shapes in nanometer scale. When, in the photolithography, the electromagnetic waves such as UV and X-ray are incident on the mask patterned in nanometer scale, the diffraction effect is unavoidable and degrades images of the mask imprinted on wafer. Only a convex lens is well-known Fourier transformer. It is possible to make the mask Fourier-transformed with the convex lens, even though the size of pattern on the mask is very large compared to the wavelength of electromagnetic wave. If the mask, modified according to new technique described in this paper, was placed at the front of the lens and was illuminated with laser beam, the nanometer-size patterns are only formed on the plane called Fourier transform plane. The new method presented here is quite simple setup and comparable with present and next generation lithographies such as UV/EUV photolithograpy and electron projection lithography when compared in attainable minimum linewidth. In this paper, we showed our theoretical research work in the field of Fourier optics, . In the near future, we are going to verify this theoretical work by experiments.

  • PDF

Development of micro-stereolithography system for the fabrication of three-dimensional micro-structures (3 차원 형상의 미소제품 제작을 위한 마이크로 광 조형시스템의 개발)

  • 이인환;조윤형;조동우;이응숙
    • Journal of the Korean Society for Precision Engineering
    • /
    • v.21 no.2
    • /
    • pp.186-194
    • /
    • 2004
  • Micro-stereolithography is a newly proposed technology as a means that can fabricate a 3D micro-structure of free form. It makes a 3D micro-structure by dividing the shape into many slices of relevant thickness along horizontal surfaces, hardening each layer of slice with a focused laser beam, and stacking them up to a desired shape. In this technology, differently from the conventional stereolithography, scale effect is dominant. To realize micro-stereolithography technology, we developed the micro-stereolithography apparatus which is composed of an Ar+ laser, x-y-z stages. controllers. optical devices and scan path generation software. Related processes were developed, too. Using the system, a number of micro-structures were successfully fabricated. Some of these samples are shown for prove this system. Laser scan path generation algorithm and software considering photopolymer solidification phenomena as well as given 3D model were developed. Sample fabrication of developed software shows relatively high dimensional accuracy compared to the uncompensated result.

Development of Plasma Monitoring System for Laser Welding Quality Analysis (레이저 용접품질 해석용 플라즈마 감시장치 개발)

  • 권장우;권오상;장영건;이경돈;홍승홍
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
    • /
    • 1999.05a
    • /
    • pp.425-431
    • /
    • 1999
  • We develope plasma monitoring system which detect plasma signals and store them for Laser welding quality evaluation and analysis using photo detector. The most fundamental and important aspects in such a system are signal restoration fidelity, noise immunity and noise cancelation capability. In this paper, we propose implementation method using distribute processing structure and hybrid digital communication for high noise cancelation capability, immunity and signal fidelity which are poorly presented in other researches. Lab experimental results and welding experimental results show a effectiveness of proposed method and plasma data is stored with 256 kbps without any communication error. we are implementing various welding defect recognition algorithm in this system.

  • PDF