• Title/Summary/Keyword: 자외선 경화

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Photo-DSC Studies of UV-Curable Hybrid Coating Systems (자외선 경화형 하이브리드 코팅의 광열분석적 연구)

  • Hong, J.W.;Lee, H.W.
    • Applied Chemistry for Engineering
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    • v.5 no.5
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    • pp.857-861
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    • 1994
  • UV curable hybrid systems have been investigated in the urethane acrylate based formulations where potentially irritant acrylate monomers have been substituted by vinyl ethers. Generally, among the systems studied, coating properties of hybrid system are superior to those of free radical hut inferior to those of cationic systems. When the content of acrylic oligomer is above 70%, however, hybrid system could render an excellent combination of coating and curing properties which outperforms both cationic and free radical systems. Photo-DSC has been used to follow the progress of crosslinking of various coating systems. Results imply that the critical factors in determining the curing rates of coating formulations are different depending upon the formulation characteristics. In the same type of hybrid formulations, the monomer/oligomer ratio rather than photoinitiator efficiency is the critical factor determining the curing rate of the systems.

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Thermal and UV Curing of Vacuum Deposited Film of Acetylene Substituted Fluorenes (아세틸렌기가 치환된 플루오렌 증착박막의 열 및 자외선 경화)

  • 정상현;김정수;강영구;이창진
    • Polymer(Korea)
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    • v.25 no.3
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    • pp.327-333
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    • 2001
  • Acetylene substituted fluorenes such as 2-ethynylfluorene and 2,7-diethynyl-fluorene were synthesized and thin films were prepared by the vacuum deposition. Curing of these fluorene derivatives could be achieved by heat treatment and UV irradiation. The curing temperature of 2-ethynylfluorene and 2,7-diethynylfluorene were found to be 231 and $198^{\circ}C$, respectively. The cured poly(2-ethynylfluorene) and poly(2,7-diethynylfluorene) started to decompose at 280 and $ 385^{\circ}C$, respectively. Fluorescent characteristics of the cured films were similar to those of monomers, but fluorescent efficiency of the film was decreased about 3 to 10 fold.

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Synthesis and Comparison of EB- and UV-curable Monomers for Anti-fogging Coatings (전자선 및 자외선 경화형 방무코팅용 모노머의 합성 및 물성비교)

  • Cho, Jung-Dae;Lee, Jae-Sung;Kim, Yang-Bae;Hong, Jin-who
    • Applied Chemistry for Engineering
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    • v.16 no.3
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    • pp.449-455
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    • 2005
  • Electron beam (EB) and ultraviolet (UV) curable monomers (AF-1 with mono functionality and AF-2 with tetra functionality) containing hydroxy and acrylate group for anti-fogging coating were synthesized and applied to EB and UV-curable coating systems. The synthesized reactive AF-1 and AF-2 monomers were first formulated into UV-curable system and the optimization of film properties for anti-fogging coating was investigated. The 5:17.5 ratio for AF-1 and AF-2 was found to be the best optimized formulation for anti-fogging coating without destroying the other essential properties such as hardness, solvent resistance, and adhesion. The optimized formulation was applied to the EB-curable system, and EB and UV-curable systems were compared. The results demonstrated that both EB and UV-cured films coated on PC sheet showed excellent anti-fogging properties; however, the EB-cured film exhibited better hardness, adhesion, and water repellent properties than the UV-cured film.

Curing and Surface Properties of UV-curable Coating Containing Wax (왁스를 함유한 자외선 경화형 코팅제의 경화 및 표면 물성)

  • Han, A-Ram;Kim, Jong-Gu;Hong, Jin-Who;Kim, Hyun-Kyoung
    • Journal of Adhesion and Interface
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    • v.13 no.1
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    • pp.38-44
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    • 2012
  • Surface properties and curing behavior of UV-initiated photopolymerization with and without wax have been investigated by pendulum hardness, pencil hardness, gloss, photo-differential scanning calorimetry (photo-DSC) and SEM. In addition, the influence of wax type (paraffin wax, PE wax) on the various properties of UV cured films was studied. The results showed that the wax type was the significant factor affecting gloss and surface hardness of UV cured films. Specially, the photo-DSC results showed that ${\Delta}H$ for the UV cured films containing paraffin wax was higher than the corresponding values for the formulation without wax and with PE wax. The observed results clearly demonstrate that the photopolymerization of UV curing with paraffin wax in an air atmosphere is less inhibited by the oxygen compared to UV curing without wax and with PE wax.

Improvement of Brightness in UV Curing Type Prism Sheet by Using Aromatic Groups (방향족 도입에 의한 자외선 경화형 프리즘시트의 휘도 개전)

  • Kim, Dong-Ryoul;Kim, Hyung-Il
    • Polymer(Korea)
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    • v.33 no.5
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    • pp.413-419
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    • 2009
  • As the refractive index of the prism layer becomes higher, the optical performance of the prism sheet gets better and the efficiency of the LCD backlight unit is improved. In order to increase the refractive index of the prism layer, the ultraviolet curing type resins were prepared by mixing high refractive index materials containing aromatic groups and the multi-functional reactive diluents. By using 9,9-bis [4-(2-acryloyloxyethoxy)phenyl] fluorene, the refractive index of the prism layer was increased up to 1.58 and the brightness of the backlight unit was improved. Since the light source used in the backlight unit caused the yellowing in the prism sheet and deteriorated the brightness accordingly, the hindered amine light stabilizer was used to improve the yellowing resistance successfully.

Thermoplastic-nanoimprint lithography 를 위한 유연한 고분자 몰드의 제작

  • Kim, Gang-In;Han, Gang-Su;Lee, Heon
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2010.05a
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    • pp.24.2-24.2
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    • 2010
  • 고분자 몰드를 이용한 nanoimprint lithography (NIL)는 고분자소재의 유연성과 투명성으로 인하여, 유기전자소자나 유연한 디스플레이소자 등 다양한 응용이 가능하다. 하지만, 고분자소재는 일반적으로 열저항성과 내구성이 낮아서, 고분자 몰드를 이용한 패턴형성 시, 자외선 경화방식이 주로 사용된다. 만약 복제가 쉽고, 가격이 저렴하며, 열저항성과 내구성이 강한 고분자 몰드를 제작한다면, thermoplastic-NIL 기술에 적용할 수가 있기 때문에, 고온을 요구하는 소자의 패턴형성 공정에 사용 가능하다. 본 연구에서는 이러한 고분자 몰드 제작을 위하여, 열저항성과 내구성이 강한 polyimide 필름과 polyurethane acrylate (PUA)를 기반으로 제작된 resin을 이용하였다. 먼저 Polyimide 필름 위에 자외선 노광을 사용하여, PUA resin 을 경화시킴으로써 패턴을 형성하였다. 이렇게 만들어진 몰드를 thermoplastic-NIL기술에 적용함으로써, Si 기판 위에 sub-마이크로 급 패턴을 형성하였다. 또한, 제작된 고분자 몰드를 사용하여 반복적인 NIL 공정을 수행함으로써 몰드의 내구성을 확인하였으며, 곡면 기판 위에 NIL을 함으로써 몰드의 유연성을 확인 할 수 있었다.

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A Study on the Preparation and Application of UV-curing Anti-Static Agent (자외선 경화형 대전방지제의 합성 및 응용연구)

  • Kim Jin-Hyang;Ha Jin-Wook
    • Proceedings of the KAIS Fall Conference
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    • 2004.06a
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    • pp.264-266
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    • 2004
  • 본 연구에서는 4차 암모늄염의 대전방지 현상을 알아보기 위하여 아크릴기가 있는 2-(dimethyl amino)ethyl methacrylate(DMA)를 알킬화 시켜 대전방지제를 합성하고, 자외선 경화 반응을 통해 대전방지 기능이 지속적으로 유지되게 하였다. 여기에서 얻어진 대전방지제를 PMMA 판에 코팅하여 코팅 도막의 전기저항의 변화를 관찰한 결과, 대전방지제의 함량이 20part 이상으로 높아질 때 표면저항 값이 낮아지는 현상을 볼 수 있었다. 또한 대전방지제의 함량이 10part인 경우, 상대습도가 $20\%$ 증가할 때 저항 값은 $10^2{\Omega}/cm^2$까지 감소하는 결과를 볼 수 있었다.

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