• Title/Summary/Keyword: 자외선 강도

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STARSPOT MODEL OF RS CVn TYPE BINARY SZ PSC (RS CVn형 쌍성 SZ Psc의 흑점 모델)

  • 강영운
    • Journal of Astronomy and Space Sciences
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    • v.17 no.2
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    • pp.189-198
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    • 2000
  • The emission lines of the ultraviolet region and the light curves of the optical region have been analyzed to investigate the distorted light curves of SZ Psc. The Mg II emission lines of the IUE spectra confirmed that the chromospheric activity of SZ Psc occurs on the K1 IV star. The distorted light curves in the optical region have been analyzed by the spot model where the spots are on the K1 IV star as the result of the chromospheric activity. The complete photometric solution could be deduced for SZ Psc by the good fitness with the spot model.

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The Photoluminance Properties of Blue Phosphor with Chemical Composition in BaO-MgO-$Al_2O_3$ System (BaO-MgO-$Al_2O_3$계에서 조성변화에 따른 청색 형광체의 발광특성)

  • Park, Sang-Hyun;Kong, Myung-Sun;Lee, Rhim-Youl
    • Korean Journal of Materials Research
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    • v.8 no.6
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    • pp.520-525
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    • 1998
  • The optical properties with chemical composition change in BaO- MgO-$AI_2O_3$, system activated by divalent Eu ion were investigated under 254nm ultraviolet(UV) and 147nm vacuum ultraviolet(VUV). These phosphors emitted a blue light at a dominant wavelength of $\lambda$=445nm under UV and VUV irradiations. It was found that the brightness of $BaMgAI_{14}O_{23}$ phosphor increased with Eu concentration up to 10% under UV but it showed a maximum emitting intensity at 5% Eu for VUV. The emitting intensity of blue color of $BaMgAl_{10}O_{l7}$ phosphor was higher than that of $BaMgAI_{14}O_{23}$for both excitation. A further improvement in brightness was obtained for $Ba_{o.9}Ca_{0.1}MaAl_{14}O_{23}$ and $Ba_{0.9}Sr_{0.1}MgAl_{10}O_{17}$ phosphor synthesized by the substition of $Ba^{+2}$ ion with O.lmole of $Ca^{+2}$ or $Sr^{+2}$ ions in $BaMgAl_{IO}O_{17}$: Eu phosphor.

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Photoalteration in Biodegradability and Chemical Compositions of Algae- derived Dissolved Organic Matter (자외선에 의한 조류기원 용존유기물의 생분해도 및 화학조성변환.)

  • Imai, Akio;Matsushige, Kazuo;Nagai, Takashi;Kim, Yong-Hwan;Kim, Bom-Chul;Choi, Kwang-Soon
    • Korean Journal of Ecology and Environment
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    • v.36 no.3 s.104
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    • pp.235-241
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    • 2003
  • The effect of ultraviolet (UV) radiation on the characteristics of algae-derived dissolved organic matter (DOM) was examined by comparing the biodegradability and DOM fraction distribution of algal DOM before and after UV exposure. Algal DOM from two axenic cultures of Microcystis aeruginosa and Oscillatoria agardhii were irradiated for 24 h at a UV intensity of 42 W/$m^2$. A complete degradation of algal DOM during the UV exposure did not occur, remaining at constant concentrations of dissolved organic carbon(DOC). After UV exposure, however, microbial degradations were reduced by 17% in M. aeruginosa and 53% in O. agardhii, respectively, and decomposition rates also were two times lower in UV exposed algal DOM. In addition, the chemical compositions of algal DOM altered substantially after UV radiation exposure. The proportions of hydrophilic bases (HiB; protein-like DOM) decreased considerably in both algal DOM sources after UV exposure (16.8% and 20.0% of DOM, respectively), whereas those of hydrophilic acids (HiA; carboxylic acids-like DOM) increased as much as the decrease of the HiB fraction. Capillary ion electrophoresis (CE) analysis showed that several carboxylic acids increased significantly after UV exposure, further confirming an increase in HiA fractions. The results of this study clearly indicate that algal DOM can be changed in its chemical composition as well as biodegradability without complete degradation by UV radiation.

Side Polished Fiber Optic UV Sensor Using Evanescent Coupling of Photo-Functional Polymer (광기능성 폴리머의 소산장 결합을 이용한 측면연마 광섬유형 자외선 센서)

  • Kim, Sang-Woo;Seo, Gyoo-Won;Yoon, Jong-Kuk;Jang, Su-Won;Yu, Yun-Sik;Lee, Seung-Ha;Kang, Shin-Won
    • Journal of Sensor Science and Technology
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    • v.11 no.6
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    • pp.335-341
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    • 2002
  • In this paper, we investigated a novel UV sensor using evanescent field coupling between the side polished fiber and photo-functional polymer waveguide. It was found that resonant wavelength shifts occur due to variation in the refractive index of polymer planar waveguide for its photo-functional properties on exposed UV. Spiroxazine (photochromic dye) was used as the planar waveguide. The resonant wavelength responses were exhibited at 1.44 nm/mW, 1.64 nm/mW, and 1.78 nm/mW when UV irradiations were exposed for 20 seconds, 30 seconds, and 40 seconds, respectively. The recovery time of sensor was independent of UV exposure power and 90% recovery time was 100 seconds.

Mechanism of Orientation of Liquid Crystal Molecules for Polarized UV-exposed Polyimide Alignment Layers (폴리애미드 배향막의 편광 자외선 조사에 따른 액정 배향 메카니즘)

  • 김일형;김욱수;하기룡
    • Polymer(Korea)
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    • v.26 no.2
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    • pp.209-217
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    • 2002
  • We studied the mechanism of orientation of polyimide molecules which were irradiated by polarized UU (PUV) using polarized Fourier transform infrared (FT-IR) spectroscopy and ultraviolet (UV) spectroscopy, According to the measured UV spectra, we found PI films mainly absorb UV light less than 350 nm wavelength, therefore, UV light less than 360 nm induces photochemical reaction of PI. PUV irradiation of PI films caused decrease of all peak intensities in the FT-IR spectra. except the newly formed broad peak at $3244 cm^{-1}$, due to degradation of the PI molecules. The remaining PI molecules after photo-degradation showed predominantly perpendicular molecular orientation to the irradiated PUV polarization direction, due to the preferential degradation of PI molecules parallel to irradiated PUV polarization direction. However the rubbing of PI films induced reorientation of the PI molecules parallel to the rubbing direction. We also investigated the alignment of the liquid crystal by rubbing or PUV irradiation. Liquid crystals align perpendicular to the PUV polarization direction and parallel to the rubbing direction.

A Study on the UV-cut Properties of Cotton Fabrics Treated with UV-absorber (자외선 흡수제 처리 면직물의 소비성능 개선(제1보) - 자외선 차단성능에 관한 연구 -)

  • 강미정;권영아
    • Journal of the Korean Society of Clothing and Textiles
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    • v.25 no.5
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    • pp.925-932
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    • 2001
  • The influence of ultraviolet(UV)-ray in sun light on human skin has been noted. Textiles can provide protection against harmful UV-radiation. Normally UV-absorbing finishes are used to get better protection. The purpose of this study is to evaluate the UV-cut properties of cotton fabrics treated with UV-absorber. 2,2-dihydroxy-4,4-dimethoxbenzophenone, as UV-absorber was applied to 100% cotton fabric. Reagents added in finishing solution were Triton X-100, polyethylene glycol 400, and $MgCl_2{\cdot}6H_2O$, and C.I. Direct Red 81. Both untreated and treated cotton fabrics were exposed to a xenon arc lamp for 20 and 80 hours. UV absorption spectra of finishing solutions and UV transmission spectra of fabrics were measured by the UV/VIS spectrophotometer. The results of this study can be summarized as follows. The results of this study can be summarized as follows. Absorption and the related transmission spectra were modified in a controlled way with UV-absorber. Absorption effect of UV-absorber was improved by adding Triton X-100, PEG 400, and $MgCl_2{\cdot}6H_2O$ in finishing solution. The UV absorption of finishing solution was in the following order: U/D/T/P/M>D/T/P/M> D/T> D/P, D>U/T/P/M>U/T>T/P/M>T. The UV transmittance of cotton fabrics was remarkably decreased by the application of UV-absorber and additives. The UV-cut properties were most improved by the application of U/D/T/P/M.

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Resistance to Weathering with Materials for Fisheries Facilities 2. Photodegradation of Plastic Materials for Floatation Unit (수산 시설용 재료의 내후성에 관한 연구 2. 부력재용 플라스틱 재료의 내후성)

  • 김태호
    • Journal of the Korean Society of Fisheries and Ocean Technology
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    • v.37 no.2
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    • pp.140-146
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    • 2001
  • In order to analyze the photodegradation of plastic materials for floats or frames of fisheries facilities, weathering experiment on 3 kinds of plastic materials like high density PE of Korea(KHDPE) and Norway(NHDPE) and high strength PVC(Hi-PVC) was carried out during 900 hours exposure by using xenon light source of weather-Ometer. The results obtained are as follows; With increasing of ultraviolet radiation(UVR) time, a remarkable losses in the mechanical properties of each specimen were observed except for the remaining strain of HDPE materials. As NHDPE lost almost 15% of its initial tensile stress during a 900 hours exposure followed by KHDPE 12% and Hi-PVC 6%. In addition, the remaining tensile stress RS(kg/$mm^2$) decreases almost linearly with the lapse of exposure time to light Y(Year) and the empirical equations of each specimen computed as follows; KHDPE : RS=2.6769-0.0003Y($r^2$=0.63) Hi-PVC : RS=5.3470-0.0003Y($r^2$=0.91) NHDPE : RS=2.4929-0.0004Y($r^2$=0.97) It was observed by scanning electron microscope that all specimens with UVR time had started to decompose and had bubbled areas and small holes.

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Mutation and Selection of Agrobacterium tumefaciens Arginine Auxotroph by UV Irradiation (자외선 조사(照射)에 의한 Agrobacterium tumefaciens Arginine 요구주(要求株)의 유도와 선발)

  • Lee, Yearn;Park, Ro-Dong;Kim, Kwang-Sik
    • Applied Biological Chemistry
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    • v.28 no.2
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    • pp.92-97
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    • 1985
  • UV irradiation method was applied to Agrobacterium tumefaciens A 136 to obtain arginine auxotrophic mutant which is applicable as a host of Ti-plasmid. When the bacterial growth was measured at 600 nm, it showed the exponential phase between 7 and 16 hours after 2% inoculation (v/v) in TY medium and the generation time of 4.8 hours. Survival rate of $1{\sim}0.1%$ was reserved when irradiated at the intensity of $800\;{\mu}w/cm^2$ for $30{\sim}50sec$. Fifteen mutants were selected among 5,000 colonies after UV irradiation. Two of them were identified as arginine auxotrophs, three of them as asparagine auxotrophs, ana the other not as arginine, asparagine, glycine nor cysteine auxotrophs.

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Photocatalytic Oxidation of Arsenite Using Goethite and UV LED (침철석과 자외선 LED를 이용한 아비산염의 광촉매 산화)

  • Jeon, Ji-Hun;Kim, Seong-Hee;Lee, Sang-Woo;Kim, Soon-Oh
    • Journal of Korean Society of Environmental Engineers
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    • v.39 no.1
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    • pp.9-18
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    • 2017
  • Arsenic (As) has been considered as the most toxic one among various hazardous materials and As contamination can be caused naturally and anthropogenically. Major forms of arsenic in groundwater are arsenite [(As(III)] and/or arsenate [(As(V)], depending on redox condition: arsenite and arsenate are predominant in reduced and oxidized environments, respectively. Because arsenite is much more toxic and mobile than arsenate, there have been a number of studies on the reduction of its toxicity through oxidation of As(III) to As(V). This study was initiated to develop photocatalytic oxidation process for treatment of groundwater contaminated with arsenite. The performance of two types of light sources (UV lamp and UV LED) was compared and the feasibility of goethite as a photocatalyst was evaluated. The highest removal efficiency of the process was achieved at a goethite dose of 0.05 g/L. Based on the comparison of oxidation efficiencies of arsenite between two light sources, the apparent performance of UV LED was inferior to that of UV lamp. However, when the results were appraised on the basis of their emitting UV irradiation, the higher performance was achieved by UV LED than by UV lamp. This study demonstrates that environmentally friendly process of goethite-catalytic photo-oxidation without any addition of foreign catalyst is feasible for the reduction of arsenite in groundwater containing naturally-occurring goethite. In addition, this study confirms that UV LED can be used in the photo-oxidation of arsenite as an alternative light source of UV lamp to remedy the drawbacks of UV lamp, such as long stabilization time, high electrical power consumption, short lifespan, and high heat output requiring large cooling facilities.

Photoprotective Effects of Silybum marianum Extract (흰무늬엉겅퀴 열매 추출물의 자외선에 대한 피부 보호 효과)

  • Kim, Daehyun;Bae, Woo Ri;Kim, Yun-Sun;Shin, Dong-won;Park, Sun-Gyoo;Kang, Nae-Gyu
    • Journal of the Society of Cosmetic Scientists of Korea
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    • v.45 no.2
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    • pp.209-216
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    • 2019
  • Ultraviolet rays (UV) cause photoaging by inducing skin photodamages such as erythema and sunburn. Silymarin is a mixture of antioxidant polyphenols extracted from Silybum marianum fruit (S. m), which is known as milk thistle. It is known to protect skin tissues from UV treatment and antioxidant effects. In this study, we aimed to identify the photoprotective effects of S. m extract, which has silymarin in the epidermis layer of the skin. We found that the extract can function as a UV filter, so it can reduce DNA damage by UV treatment. Especially, we found that, in the stratum corneum, the extract can suppress the protein carbonylarion and DNA damages caused by suberythemal dose of UV treatment which does not induce erythema in the skin. UV treatment also increased protein carbonylation levels in the stratum corneum by oxidation, but it was prevented by applying the extract. The extract can absorb UV with minimal phototoxicity. Together, our study suggests that S. m extract can be used as a photo-protective ingredient to avoid photoaging of the skin.