• Title/Summary/Keyword: 자기 조립 단분자층

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Ising Model of Alkanethiol and Its Application to Simulation of a Self-Assembled Monolayer (알칸싸이올 이징 모형의 자기 조립 단분자층 시뮬레이션 응용)

  • Byun, Kisang;Song, Sung Min;Jang, Joonkyung
    • Journal of the Korean Chemical Society
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    • v.64 no.6
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    • pp.345-349
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    • 2020
  • In the self-assembled monolayer (SAM) of alkanethiol formed on a gold surface, some molecules fail to chemisorb with their terminal alkyl groups physisorbed. The previous molecular dynamics (MD) simulation showed that these defects can be cured by thermal annealing. Herein, we present a simple Ising model of alkanethiol. The Monte Carlo simulation based on the present model reproduced the essential features of the annealing of SAM observed in the MD simulation.

Applications of Self-assembled Monolayer Technologies in MEMS Fabrication (MEMS 공정에서의 자기 조립 단분자층 기술 응용)

  • Woo-Jin Lee;Seung-Min Lee;Seung-Kyun Kang
    • Journal of the Microelectronics and Packaging Society
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    • v.30 no.2
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    • pp.13-20
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    • 2023
  • The process of microelectromechanical system (MEMS) fabrication involves surface treatment to impart functionality to the device. Such surface treatment method is the self-assembled monolayer (SAM) technique, which modifies and functionalizes the surface of MEMS components with organic molecule monolayer, possessing a precisely controllable strength that depends on immersion time and solution concentration. These monolayers spontaneously adsorb on polymeric substrates or metal/ceramic components offering high precision at the nanoscale and modifying surface properties. SAM technology has been utilized in various fields, such as tribological property control, mass-production lithography, and ultrasensitive organic/biomolecular sensor applications. This paper provides an overview of the development and application of SAM technology in various fields.

고성능 유기박막트랜지스터의 개발에 필요한 고품질 자기조립단분자막의 패턴 제작

  • Choe, Sang-Il;Kim, Seong-Su
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.111-111
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    • 2011
  • 유기박막트랜지스터는 각 박막계면의 접촉성에 따라 그 성능이 좌우 된다는 것은 널리 알려진 사실이다. 이 때문에 계면간의 접촉성 및 결함을 최소화 하고 효율적인 패턴 형성을 위해 자기조립단분자막의 이용이 최근에 많이 시도되고 있다. 고품질 자기조립단분자막의 제작을 위해 RCA 세척을 통해 웨이퍼 표면에 OH기를 도입 보다 완벽한 단분자막의 형성을 촉진 하였으며 패턴제작은수분이엄격이조절된환경에서 alkyilsilane과 aminosilane 자기조립단분자막을 각각 ${\mu}CP$과 용액공정을 통해 시도되었다. 이 과정에서 물리적 흡착이나 OH기 부족으로 생성된 결함을 보안하기 위하여 SC1용액을 사용 단순 물리흡착된 자기조립단분자 물질의 제거와 다시 OH기 도입 용액공정을 통해 자기조립단분자막 형성을 반복적으로 실시하였다. 그 결과 자기조립단분자막의 결함이 최소화 되었고 자기조립단분자막의 질에 따라 유기전극재료 증착 시 선택적인 성장 과 형성된 유기전극재료 층의 형상이 다르게 관찰 되었다. 이런 반복적인 용액공정을 통해 결함이 최소화된 고품질 자기조립단분자막은 박막계면 간 옴성접촉을 형성하여 유기박막트랜지스터 제작 시 성능 향상이 기대되어진다.

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Electrochemical Rectification at Electrode Chemically Modified with Redox Active Agents at Monolayer (산화환원 화학 종이 단 분자 층으로 화학 흡착된 전극에서의 전기화학적 정류)

  • Lee, Chi-Woo J.;Yoon, Jung-Hyun;Oh, Mi-Kyung
    • Journal of the Korean Electrochemical Society
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    • v.10 no.1
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    • pp.43-47
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    • 2007
  • Electrochemical rectification at electrode chemically modified with redox active agents isolated at monolayer level was considered. Formulation of the rising part of linear sweep voltammogram at steady and rotating disc electrode was introduced.

Surface Characteristics of Silicon Substrates Coated with Octadecyltrichlorosilane (옥타데실트리클로로실란 코팅에 의한 실리콘 표면 특성 변화)

  • 유희재;김수경;김진홍;강호종
    • Polymer(Korea)
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    • v.27 no.6
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    • pp.555-561
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    • 2003
  • The self-assembled monolayer coating of octadecyltrichlorosilane (OTS) on the silicon based MEMS was investigated and surface characteristics were considered as a function of coating conditions and reagent composition. The sulfuric peroxide mixture (SPM) solution was used to form -OH group which caused the hydrophilic characteristic on silicon surftce. Highest hydrophilicity was obtained by SPM solution with 85% acid content at room temperature. OTS was applied on the silicon surface by means of self-assembled monolayers (SAMs) coating. It was found that sol-gel reaction was took place between -OH group on the silicon surface and -Cl group in OTS. As a result, the contact angle increased due to the increase of hydrophobicity by Si-O bonding of SAMs. Sol-gel reaction could be controlled by coating conditions as well as reagent composition in OTS coating solution.