• Composites Research
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• v.34 no.1
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• pp.51-56
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• 2021

This paper studied the possibility of manufacturing bulk graphite using coal tar, a precursor of coal tar pitch, as a binder and impregnant. Carbonization was conducted after mixing and molding with natural graphite as a filler and coal tar as a binder. Impregnation-recarbonization was performed five times after carbonization. Coal tar used as impregnant. Measuring density, porosity, compressive strength, and anisotropy ratio was conducted. The maximum density of bulk graphite specimen was 1.76 g/㎤ and the minimum porosity was 15.6% which could be controlled by process control. The highest compressive strength was 20.3 MPa. Then the maximum anisotropic ratio of bulk was shown 0.34 through XRD analysis. Therefore, it was confirmed that it was possible to manufacture artificial graphite in a bulk form by using coal tar as a binder and an impregnant.

• Journal of the Korean Vacuum Society
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• v.18 no.2
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• pp.141-146
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• 2009

PLZT ferroelectric thin films were deposited on Pt/Ti/$SiO_2$/Si substrate with $TiO_2$ buffer layer in between by rf magnetron sputtering method. In order to investigate the effect of Ar/$O_2$ partial pressure ratio on the ferroelectric properties of PLZT thin films, PLZT thin films were deposited at various Ar/$O_2$ partial pressure ratio ; 27/1.5 seem, 23/5.5 seem, 21/7.5 seem and 19/9.5 seem. The crystallinities of PLZT thin films were analyzed by XRD. The surface morphology was observed using FE-SEM. The P-E hysteresis loops, the remanent polarization characteristics and the leakage current characteristics were obtained using a Precision LC. The crystallinity and elaborateness of PLZT thin films were decreased as increasing the oxygen partial pressure ratio. And preferred orientation of PLZT thin films changed from (110) plane to (111) plane. The oxygen partial pressure ratio affects the thin film surface morphology and the ferroelectric properties.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.20 no.3
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• pp.113-116
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• 2010

We report on the growth and characteristics of the structural and optical properties of InGaN nano-structures doped with antimony (Sb) as a catalyst. The use of catalyst has been explored to modify the growth and defect generation during strained layer heteroepitaxial growth. We performed the growth of the InGaN nano-structures on c-sapphire substrates using mixed-source hydride vapor phase epitaxy (HVPE). The characteristic of samples was measured by scanning electron microscope (SEM) and photoluminescence (PL). The aligning direction of c-axis of the InGaN nano-structures was changed from vertical to parallel or inclined to the surface of substrates when the Sb was added as a catalyst. The indium composition was estimated about 3.2% in both cases of with or without the addition of Sb in the InxGal-xN structures. From the results of InGaN nano-structures formed with the addition of Sb, we can expect the performance of optical devices would be more improved by reduced piezo-electric field if we use the InGaN nano-structures of which c-axes are aligned parallel to the substrates as an active layer.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.43 no.2 s.344
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• pp.8-12
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• 2006

We have fabricated ZnO thin film on $Pt/TiO-2/SiO_2/Si$ substrate by the sol-gel method and have investigated the effect of annealing temperature on the structural morphology and optical properties of ZnO thin films. The ZnO thin film annealed at $600^{\circ}C$ exhibits the highest c-axis orientation and its FWHM of X-ray peak is $0.4360^{\circ}C$. In the results of surface morphology investigation of ZnO thin film by using Am it is observed that ZnO thin film annealed at $600^{\circ}C$ exhibits the largest UV (ultraviolet) exciton emission at around 378nm and the smallest visible emission at around 510nm among these of ZnO thin films annealed at various temperatures. It is deduced that the ZnO thim film annealed at $600^{\circ}C$ is formed most stoichiometrically since the visible emission at around 510nm comes from oxygen vacancy or impurities.

• Journal of the Korean Ceramic Society
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• v.41 no.10 s.269
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• pp.742-748
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• 2004

Isopropanol of low boiling point was used as a solvent to prepare Al-doped ZnO(AZO) thin films. A homogeneous and stable sol was made from Zn acetate a solute whose mole concentration was 0.7mol/$\iota$ and Al chloride as a dopant. Al-doped ZnO thin films were prepared by sol-gel method as a function of post-heating temperature from 500 to $700^{\circ}C$ and the optical and electrical properties were investigated. The c-axis orientation along (002) plane was enhanced with the increasing of post-heating temperature and the surface morphology of the films showed a homogeneous and nano-sized microstructure. The optical transmittance of the films post-heated below $650^{\circ}C$ was over $86\%$, but decreased at $700^{\circ}C$. The electrical resistivity of the thin films decreased from 73 to 22 $\Omega$-cm as the post-heating temperature increased up to $650^{\circ}C$, but increased greatly to 580 $\Omega$-cm at $700^{\circ}C$. XPS analysis indicated that the deterioration of electrical and optical properties was attributed to the precipitation of $Al_2O_3$ phase on the surface of AZO thin film. This result suggests that the optimum post-heating temperature to improve electrical and optical properties is $600^{\circ}C$.

• Applied Chemistry for Engineering
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• v.9 no.2
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• pp.193-199
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• 1998

The mixtures of ultra-high molecular weight polythylene (UHMWPE), high density polyethylene (HDPE), process oil (mineral oil) and potassium hexatitanate whisker were melted and mixed at $150^{\circ}C$ for 30min, and prepared by compression molding to the specimen of separator of about $200{\mu}m$ thickness at the same temperature and 5000 psi. Thereafter the pores were formed by extracting process oil with organic solvents. In this study, the range of PR (the ratio polymer to process oil) was varied from 0.1 to 0.5 because the specimen turned into rubbery phase at which PR was below 0.1 whereas it changed into gel phase at which PR was above 0.5. When the specimen was treated with nonpolar organic solvents, process oil was extracted nearly 98%. Tensile strength was $31kg/cm^2$ at PR = 0.426, and resistance of specimen was $37m{\Omega}/cm^2$ at PR = 0.186, and $53m{\Omega}/cm^2$ at PR = 0.426. The $N_2$ adsorption-desorption isotherm showed a hysteresis representing regions of capillary condensation, and the surface area at PR = 0.186 was relatively large as $130cm^2/g$. Potassium hexatitanate whisker was randomly dispersed in between PE layers. It might be that the whisker is intercalated through the PE thin layers oriented by compression.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.20 no.6
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• pp.254-261
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• 2010

Polycrystalline silicon (pc-Si) films are fabricated and characterized for application to pc-Si thin film solar cells as a seed layer. The amorphous silicon films are crystallized by the aluminum-induced layer exchange (ALILE) process with a structure of glass/Al/$Al_2O_3$/a-Si using various thicknesses of $Al_2O_3$ layers. In order to investigate the effects of the oxide layer on the crystallization of the amorphous silicon films, such as the crystalline film detects and the crystal grain size, the $Al_2O_3$ layer thickness arc varied from native oxide to 50 nm. As the results, the defects of the poly crystalline films are increased with the increase of $Al_2O_3$ layer thickness, whereas the grain size and crystallinity are decreased. In this experiments, obtained the average pc-Si sub-grain size was about $10\;{\mu}m$ at relatively thin $Al_2O_3$ layer thickness (${\leq}$ 16 nm). The preferential orientation of pc-Si sub-grain was <111>.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.47 no.1
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• pp.6-13
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• 2010

In this study, Ga-doped ZnO (GZO) thin films have been fabricated on Eagle 2000 glass substrates at various substrate temperatures $100{\sim}400^{\circ}C$ and thin film thickness by RF magnetron sputtering in order to investigate the structural, electrical, and optical properties of the GZO thin films. It is observed that all the thin films exhibit c-axis orientation and a (002) diffraction peak only. The GZO thin films, which were deposited at $T=300^{\circ}C$ and 400 nm, shows the highest (002) orientation, and the full width at half maximum (FWHM) of the (002) diffraction peak is $0.4^{\circ}$. AFM analysis shows that the formation of relatively smooth thin films are obtained. The lowest resistivity ($8.01{\times}10^{-4}\;{\Omega}cm$) and the highest carrier concentration ($3.59{\times}10^{20}\;cm^{-3}$) are obtained in the GZO thin films deposited at $T=300^{\circ}C$ and 400 nm. The optical transmittance in the visible region is approximately 80 %, regardless of process conditions. The optical band-gap shows the slight blue-shift with increase in doping which can be explained by the Burstein-Moss effect.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.7 no.6
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• pp.1313-1318
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• 2006

The mechanism fur the surface film formation was studied by in situ Atomic Force Microscopy (AFM) observation of a highly oriented pyrolytic graphite (HOPG) basal plane surface during cyclic voltammetry at a slow scan-rate of 0.5 mV $s^{-1}$ in 1 moi $dm^{-3}$ (M) $LiPF_6$ dissolved in a mixture of ethylene carbonate (EC) and diethyl carbonate (DEC). Decomposition of the electrolyte solution began at a potential around 2.15 V vs. $Li^+$/Li on step edges. In the potential range 0.95-0.8 V vs. $Li^+$/Li, flat areas (hill-like structures) and large swelling appeared on the surface. It is considered that these two features were formed by the intercalation of solvated lithium ions and their decomposition beneath the surface, respectively. At potentials more negative than 0.80 V vs. $Li^+$/Li, particle-like precipitates appeared on the basal plane surface. After the first cycle, the thickness of the precipitate layer was 30 nm. The precipitates were considered to be decomposition of the lithium salt ($LiPF_6$) and solvent molecules (EC and DEC), and to have an important role in suppressing further solvent decomposition on the basal plane.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.199-199
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• 2013

최근 단파장 광전 소자와 고출력 고주파 전자 소자에 대한 수요 때문에 넓은 밴드갭 에너지를 갖는 반도체에 관심이 많다. 이중에서, ZnO는 우수한 화학 및 역학적 안정성, 수소 플라즈마 내구성과 저가 제조의 장점 때문에 광전자 소자 개발 분야에 적합한 산화물 투명 전극으로 관심을 끌고 있다. 불순물이 도핑되지 않은 ZnO는 본질적으로 산소 빈자리 (vacancy)와 아연 격자틈새 (interstitial)와 같은 자체의 결함으로 말미암아 n형의 극성을 갖기 때문에, 반도체 소자로 응용하기 위해서는 도핑 운반자의 농도와 전도성을 제어하는 것이 필요하다. 본 연구에서는 박막 제조시 제어성, 안정성과 용이하게 성장이 가능한 졸겔 (sol-gel) 방법을 사용하여 사파이어와 석영 기판 위에 Cu가 도핑된 ZnO 박막을 성장시켰으며, 그것의 구조, 표면 형상, 평균 투과율, 광학 밴드갭 에너지를 계산하였다. 특히, Cu의 몰 비를 0, 0.01, 0.03, 0.05, 0.07, 0.1 mol로 변화시키면서 ZnO:Cu 박막을 성장시켰다. ZnO:Cu 졸은 zinc acetate dihydrate, 2-methoxyethanol (용매), momoethanolamine (MEA, 안정제)을 사용하여 제조하였다. 상온에서 2-methoxyethanol과 MEA가 혼합된 용액에 zinc acetate dihydrate (Zn)을 용해시켰다. 이때 MEA와 Zn의 몰 비는 1로 유지하였다. 이 용액을 $60^{\circ}C$ 가열판 (hot plate)에서 24 h 동안 자석으로 휘젓으며 혼합하여 맑고 균일한 용액을 얻었다. 이 용액을 3000 rpm 속도로 회전하는 스핀 코터기의 상부에 장착된 사파이어와 석영 기판 위에 주사기 (syringe)를 사용하여 한 방울 떨어뜨려 30 s 동안 스핀한 다음에, 용매를 증발시키고 유기물 찌꺼기를 제거하기 위하여 $300^{\circ}C$에서 10분 동안 건조시킨다. 기판 위에 코팅하는 작업에서 부터 건조 작업까지를 10회 반복한 다음에, 1 h 동안 전기로에 장입하여 석영 기판 위에 증착된 시료는 $550^{\circ}C$에서, 사파이어 기판은 $700^{\circ}C$에서 열처리를 수행하였다. Cu의 몰 비 0, 0.01, 0.03, 0.05, 0.07, 1로 성장된 ZnO:Cu 박막에 대한 x선 회절 분석의 결과에 의하면, 모든 ZnO:Cu 박막의 경우에 관측된 34.3o의 피크는 ZnO (002) 면에서 발생된 회절 패턴을 나타낸다. 이것은 JCPDS #80-0075에 제시된 회절상과 일치하였으며, ZnO:Cu 박막이 기판에 수직인 c-축을 따라 우선 배향됨을 나타낸다. 사파이어 기판 위에 증착된 박막의 경우에, Cu의 몰 비가 점점 증가함에 따라(002)면 회절 피크의 세기는 전반적으로 증가하여 0.07 mol에서 최대를 나타내었으나, 석영 기판 위에 증착된 박막의 경우에는 0.05 mol에서 최대를 보였다. 외선-가시광 분광계를 사용하여 서로 다른 Cu의 몰 비로 성장된 ZnO:Cu 박막에서 광학 흡수율 (absorbance) 스펙트럼을 측정하였으며, 이 데이터를 사용하여 평균 투과율을 계산한 결과, 투과율은 Cu의 몰 비에 따라 현저한 차이를 나타내었다. Cu의 몰 비가 0.07 mol일 때 평균 투과율은 80%로 가장 높았으며, 0.03 mol에서는 30%로 최소이었다. 광학밴드갭 에너지는 Tauc 모델을 사용하여 계산하였고, 결정 입자의 형상과 크기와의 상관 관계를 조사하였다.