Comparison of Dry Etching of AlGaAs/GaAs in High Density Inductively Coupled BCl3BCl3 based Plasmas
(BCl3BCl3 에 기초한 고밀도 유도결합 플라즈마에 의한 AlGaAs/GaAs 건식식각 비교)
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- Proceedings of the Materials Research Society of Korea Conference
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- 2003.03a
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- pp.63-63
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- 2003