• Title/Summary/Keyword: 이광자 흡수 광중합

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3D Micro-fabrication with Two-Photon Absorption Photopolymerization (이광자흡수 광중합현상에서 3차원 미세구조의 제작)

  • 강보영;우정원;이광섭;이범구
    • Proceedings of the Optical Society of Korea Conference
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    • 2003.07a
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    • pp.162-163
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    • 2003
  • 이광자흡수는 Χ$^{(3)}$ 의 허수부로 표현되는 3차 비선형 흡수 효과로, 이광자 흡수확률은 입사빛 세기의 제곱에 비례한다. 특수한 단량체 분자들은 이광자흡수를 통해 빛을 흡수하여 중합과정의 에너지원으로 사용한다. 이 때 에너지의 threshold가 있으므로 초점 부근에서만 반응이 일어나게 되어, 이광자흡수를 통한 광중합과정은 회절효율 한계를 벗어난 미세구조 제작에 응용된다. 또 긴 파장의 빛을 이용하므로 입사 빛이 시료에 깊이 침투하여 3차원 구조제작, 3차원 data 저장 등의 분야에서 높은 응용성을 지닌다. (중략)

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Fabrication of Sub-100 nm Embossing Patterns using Weakly-Polymerized Region via Long-Exposure Technique (LET) in Two-Photon Polymerization (긴 레이저 조사방식에 의한 저밀도 이광자 광중합 영역을 이용한 Sub-100nm 정밀도의 엠보싱 패턴제작)

  • Park, Sang-Hu;Lim, Tae-Woo;Yang, Dong-Yol
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.1 s.190
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    • pp.64-70
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    • 2007
  • A long-exposing technique (LET) has been conducted to create nanoscale patterns applicable to diverse micro-devices using two-photon polymerization (TPP). By the weakly-polymerized region via the LET, double-layered embossing patterns can be fabricated simply in a single step. The LET makes possible a voxel and its surrounding to be fully grown into more than 500 nm in lateral size and weakly-polymerized region (WPR), respectively. In the WPR. interconnecting ribs between voxels are generated, and they lead to the creation of double-layered dot patterns. Moreover, by controlling the distance between voxels, various shapes of interconnecting rib can be fabricated when the LET is applied. Various embossing patterns were fabricated to evaluate the usefulness of the proposed technique as a novel nanopatterning technique in TPP.

Fabrication of Three-Dimensional Micro-Shell Structures Using Two-Photon Polymerization (이광자 흡수 광중합에 의한 3차원 마이크로 쉘 구조물 제작)

  • Park Sang Hu;Lim Tae Woo;Yang Dong-Yol
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.29 no.7 s.238
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    • pp.998-1004
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    • 2005
  • A nano-stereolithography (NSL) process has been developed for fabrication of 3D shell structures which can be applied to various nano/micro-fluidic devices. By the process, a complicated 3D shell structure on a scale of several microns can be fabricated using lamination of layers with a resolution of 150 nm in size, so it does not require the use of my sacrificial layer or any supporting structure. A layer was fabricated by means of solidifying liquid-state monomers using two-photon absorption (TPA) induced using a femtosecond laser processing. When the polymerization process is finished, unsolidified liquid state resins can be removed easily by dropping several droplets of ethanol fur developing the fabricated structure. Through this work, some 3D shell structures, which can be applied to various applications such as nano/micro-fluidic devices and MEMS system, were fabricated using the developed process.

Fabrication of Microstructures Using Double Contour Scanning (DCS) Method by Two-Photon Polymerization (이광자 광중합의 윤곽선 스캐닝법에 의한 마이크로 입체형상 제작)

  • Park Sang Hu;Lim Tae Woo;Lee Sang Ho;Yang Dong-Yol;Kong Hong Jin;Lee Kwang-Sup
    • Polymer(Korea)
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    • v.29 no.2
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    • pp.146-150
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    • 2005
  • A nano-stereolithouaphy (NSL) apparatus has been developed for fabrication of microstructures with the resolution of 150 nanometers. In the NSL process, a complicated 3D structure can be fabricated by building layer by layer, so it does not require any sacrificial layer or any supporting structure. A laminated layer was fabricated by means of solidifying liquid-state monomers using two-photon absorption (TPA) which was induced by a femtosecond laser. When the fabrication of a 3D laminated structure was finished, unsolidified liquid-stage resins were removed to develop the fabricated structure by dropping several droplets of solvent, then the polymerized structure was only left on the glass substrate. A microstructure is fabricated by vector scanning method to save the fabrication time. The shell thickness of a structure is very thin within 200 nm, when it is fabricated by a single contour scanning (SCS) path. So, a fabricated structure can be deformed easily in the developing process. In this work, a double contour scanning (DCS) method was proposed to reinforce the strength of a shell typed structure, and a microcup was fabricated to show the usefulness of the developed NSL system and the DCS method.

Investigation into direct fabrication of nano-patterns using nano-stereolithography (NSL) process (나노 스테레오리소그래피 공정을 이용한 무(無)마스크 나노 패턴제작에 관한 연구)

  • Park Sang Hu;Lim Tae-Woo;Yang Dong-Yol
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.3 s.180
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    • pp.156-162
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    • 2006
  • Direct fabrication of nano patterns has been studied employing a nano-stereolithography (NSL) process. The needs of nano patterning techniques have been intensively increased for diverse applications for nano/micro-devices; micro-fluidic channels, micro-molds. and other novel micro-objects. For fabrication of high-aspect-ratio (HAR) patterns, a thick spin coating of SU-8 process is generally used in the conventional photolithography, however, additional processes such as pre- and post-baking processes and expansive precise photomasks are inevitably required. In this work, direct fabrication of HAR patterns with a high spatial resolution is tried employing two-photon polymerization in the NSL process. The precision and aspect ratio of patterns can be controlled using process parameters of laser power, exposure time, and numerical aperture of objective lens. It is also feasible to control the aspect ratio of patterns by truncation amounts of patterns, and a layer-by-layer piling up technique is attempted to achieve HAR patterns. Through the fabrication of several patterns using the NSL process, the possibility of effective patterning technique fer various N/MEMS applications has been demonstrated.

Sub-regional Slicing Method (SSM) to Fabricate 3D Microstructure Effectively in Nano-Stereolithography Process (극미세 3차원 형상제작의 효율성 향상을 위한 영역분할 단면법에 관한 연구)

  • Park S.H.;Lim T.W.;Yang D.Y.;Yi S.Y.;Kong H.J.;Lee K.S.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.264-267
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    • 2005
  • A subregional slicing method (SSM) is proposed to increase the nanofabrication efficiency of a nano-stereolithography (NSL) process based on two-photon polymerization (TPP). The NSL process can be used to fabricate 3D microstructures via the accumulation of layers of uniform thickness; hence, the precision of the final 3D microstructure depends on the layer thickness. The use of a uniform layer thickness means that, to fabricate a precise microstructure, a large number of thin slices is inevitably required. leading to long processing times. In the SSM proposed here, however, the 3D microstructure is divided into several subregions on the basis of the geometric slope, and then each of these subregions is uniformly sliced with a layer thickness determined by the geometric slope characteristics of each subregion. Subregions with gentle slopes are sliced with thin layer thicknesses, whereas subregions with steep slopes are sliced with thick layer thicknesses. Here, we describe the procedure of the SSM based on TPP, and discuss the fabrication efficiency of the method through the fabrication of a 3D microstructure.

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