• Title/Summary/Keyword: 액정증발

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Study on the Gelling Formation and Anti-gelling Properties of Liquid Detergent Based on Sodium Lauryl Ethoxy Sulfate (SLES) (소듐 라우릴 에톡시 설페이트(SLES) 베이스 액체세정제의 겔링성 및 겔링방지 특성에 대한 연구)

  • Chi, Gyeong-Yup
    • Applied Chemistry for Engineering
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    • v.29 no.5
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    • pp.620-625
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    • 2018
  • Liquid detergent based on sodium lauryl ethoxy sulfate (SLES) as main ingredient sometimes met gelling film on the surface when it is opened in the air. It was assumed because of the change of phase diagram of micelle by concentration change of surfactant, major ingredient of detergent when the water of detergent is evaporated. SLES showed strong hexagonal liquid crystal (LC) in 30~60 wt%, and lamellar LC over 60 wt%. In this research surface gelling formation of liquid detergent which is based on SLES as main ingredient was because of water evaporation. As water of detergent was evaporated, concentration of surfactant became higher. It was checked that surface gelling was LC of mixed surfactant system. Conclusionally we applied alpha olefin sulfonate (AOS) having good solubility, Sodium secondary alkane sulfonate (SAS) preventing hexagonal LC and hydrotrope sodium xylene sulfonate (SXS) and PEG1500 in order to prevent gelling film in SLES based liquid detergent. Like this, improved formula 4 and 5 can prevent the formation of gelling film on the surface of liquid detergent when it is opened in the air.

A Prediction of DI Diesel engine Performance using the Multizone Model (Multizone 모델을 이용한 직접분사식 디젤엔진 성능 예측에 관한 연구)

  • ;Liu Shenghua
    • Transactions of the Korean Society of Automotive Engineers
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    • v.8 no.1
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    • pp.40-47
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    • 2000
  • A model for the prediction of combustion and exhaust emissions of DI diesel engine has been formulated and developed. This model is a quasi-dimensional phenomenological one and is based on multi-zone combustion modelling concept. This model is developed based on the concept of Hiroyasu's multizone combustion models. It takes nozzle injection (spray) parameters, induction swirl into consideration and the models of zone velocity, air entrainment, fuel droplet evaporation and mixture combustion are upgraded. Various parameters, such as cylinder pressure, heat release rate, Nox and soot emission, and these parameters in the zone are simulated. The results are compared with the experimental ones, too.

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Recovery of phosphoric acid from the waste acids in semiconductor manufacturing process (반도체 제조공정에서 발생하는 혼산폐액으로부터 고순도 인산 회수)

  • Park, Sung-Kook;Roh, Yu-Mi;Lee, Sang-Gil;Kim, Ju-Yup;Shin, Chang-Hoon;Ahn, Jae-Woo
    • Proceedings of the Korean Institute of Resources Recycling Conference
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    • 2006.05a
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    • pp.90-94
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    • 2006
  • The waste solution discharged from the LCD manufacturing process contains acids like nitric, acetic and phosphoric acid and metal ions such as Al, Mo and other impurities. It is important to removal of impurities to tess than 1ppm in phosphoric acid to reuse as an etchant because the residual impurities even in sub-ppm concentration in semiconductor materials play a major role on the electronic properties. In this study, we have been clearly established that a mixed system of solvent extraction, diffusion dialysis and ion-exchange technique, which made individually the most of characteristics is developed to commercialize in an efficient system for recovering the high-purity phosphoric acid. By applying vacuum evaporation, the yield of the process are almost 99% removal of nitric acid and acetic acid was achieved. And by applying the solvent extraction method with tri-octyl phosphate(TOP) as an extractant, the removal of acetic and nitric acid from the acid mixture was achieved effectively at the ratio O/A=1/3 with four stages and the stripping of nitric acid from organic phase is attained at a ration of O/A=1 with six stages by distilled water. About 97% and 76% removal of Al and Mo were achieved by diffusion dialysis. Essentially complete less than 1ppm removal of Al, Mo by using ion exchange ion resin and purification of the phosphoric acid was obtain.

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Recovery of high-purity phosphoric acid from the waste acids in semiconductor manufacturing process (반도체(半導體) 제조공정(製造工程)에서 발생하는 혼산폐액(混酸廢液)으로부터 고순도(高純度) 인산회수(燐酸回收))

  • Park, Sung-Kook;Roh, Yu-Mi;Lee, Sang-Gil;Kim, Ju-Yup;Shin, Chang-Hoon;Kim, Jun-Young;Ahn, Jae-Woo
    • Resources Recycling
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    • v.15 no.5 s.73
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    • pp.26-32
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    • 2006
  • The waste solution discharged from the LCD manufacturing process contains acids like nitric, acetic and phosphoric acid and metal ions such as Al, Mo and other impurities. It is important to remove impurities less than 1 ppm in phosphoric acid to reuse as an etchant because the residual impurities even in sub-ppm concentration in semiconductor materials play a major role on the electronic properties. In this study, a mixed system of solvent extraction, diffusion dialysis and ion-exchange was developed to commercialize in an efficient system fur recovering the high-purity phosphoric acid. By vacuum evaporation, almost 99% of nitric and acetic acid was removed. And by solvent extraction method with tri-octyl phosphate (TOP) as an extractant, the removal of acetic and nitric acid from the acid mixture was achieved effectively at the ratio A/O=1/3 with 4th stage of extraction stage. About 97.5% of Al and 36.7% of Mo were removed by diffusion dialysis. Essentially almost complete removal of metal ions and purification of high-purity phosphoric acid could be obtained by using ion exchange.

Effect of Film Processing Conditions on the Dimensional Stability of Triacetyl Cellulose Film (필름 가공조건이 트리아세틸 셀룰로오스 필름의 치수안정성에 미치는 영향)

  • Kim, Hyo-Gap;Kim, Hong-Suk;Kim, Han-Sung;Cho, Jin-Sik;Kim, Yong-Won;Kang, Ho-Jong
    • Polymer(Korea)
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    • v.34 no.2
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    • pp.133-136
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    • 2010
  • Effect of solution film processing conditions on the dimensional stability of TAC film which is used as protection film of liquid crystal display (LCD) has been studied under hot and humid environmental condition (65 $^{\circ}C$, 90%). In addition, the mechanical and optical property changes due to the dimensional instability were also investigated. It was found that the fast solvent evaporation due to the increasing of methylene chloride content in solvent mixtures and decreasing dope concentration caused the lowering of dimensional stability under hot and humid condition. This dimensional stability change also affected the mechanical and optical properties of TAC films as well.