• Journal of the Korean institute of surface engineering
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• v.26 no.5
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• pp.271-279
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• 1993

Experiments on electorchemical etching of aluminum foils with high cubic textures were carried out in this study. Etching behaviours and pit shapes with respect to various conditions of eletrochemical etching were in-vestigated. When HCl and NaCl solutions were used as electrolytes, the highest capacitanes were observed in solutions of 1MHCl and 5M NaCl. It was foundd that capacitance was improved by addition of H2SO4 to HCl so-lution which is considered to be due to the suppression of oxide film formation on the aluminum surface. The homogeneous distribution of each pits obtained in the HCl solution, while the degree of weight loss was lowest in the Nacl solution. The best etching properties in 1M HCl solution were obtained at the etching condi-tions of 0.15 A/$\textrm{cm}^2$, 150sec and$ 90^{\circ}C$.

• Journal of Korean Society for Quality Management
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• v.23 no.4
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• pp.128-147
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• 1995

An accelerated life testing(ALT) for aluminum electrolytic capacitors is conducted and analyzed. A testing equipment, which consists of part fixtures, relay board, controller, video bridge and microcomputer, is made for the ALT. Load factors are temperature with four levels and voltage with three levels. Base on 'optimized 4:2:1 plan', 2,000 electrolytic capacitors are allocated at 12 experimental conditions(; 4 levels of temperature ${\times}3$ levels of voltage), and the ALT is conducted. From the experimental results, an acceleration model is derived and acceleration factors are estimated. A discussion on the experimental results is included.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.11a
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• pp.320-320
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• 2015

표면개질이란 재료 본연의 특성만으로 원하는 성능과 기능을 발휘할 수 없을 때 기재 표면에 열에너지, 응력 등을 부가하여 새로운 표면층을 형성하는 방법이다. 특히 양극산화 기술을 이용해 형성된 피막은 경도 및 내마모성 등 기계적 성질이 우수하고, 공정조건 등을 변화시켜 피막 두께와 형상 조절이 용이하여 센서, 필터, 광학용 박막 그리고 전해콘덴서 등에도 주로 사용되고 있다. 본 연구에서는 5083 알루미늄 합금을 이용해 해양환경에서 우수한 내구성을 보유할 수 있는 최적의 양극산화 공정시간을 선정하고자 캐비테이션 실험을 실시하였다. 실험 결과, 공정시간 40분에서 안정적인 산화피막 생성과 함께 탁월한 내캐비테이션 특성을 나타냈다.

• Journal of the Korean institute of surface engineering
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• v.30 no.1
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• pp.44-56
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• 1997

Influence of electrochemical etching conditions on capacitance gain of aluminium electrolytic on capacitor foil has been investigated by etching cubic textured high purity aluminum foil in dilute hydrochloric acid. Uniformly distributed etch pit tunnels on aluminum surface have been obtained by pretreatment aluminium foil in 10% NaOH solution for 5 minutes followed by electrochemical etching. Electrostatic capacitance of etched aluminium foil anodized to high voltage increased with the increase of current density, total charge, temperature and concentration of electrolyte up to maximum CV-value and then deceased. Election optical observation of the etched foil revealed that the density of etch of etch pits increased with the increase of current density and concentration of electrolyte. this increase of etch pit density enlarged of the increase of capacitance. However, abnormal high current density and high electrolyte concentration induced the local dissolution of the foil surface which resulted the decrease of foil capacitance.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2003.04a
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• pp.7-7
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• 2003

90년대 중반부터 이동통신제품과 인터넷의 대중화에 의한 노트북 PC등 휴대용 멀티미디어제품의 수요 급증은 전자 제품의 소형화 및 복합화를 유도하였으며, 이러한 제품의 추세에 대응하기 위하여 세라믹 부품은 벌크 단품에서 적층형으로 급속하게 바뀌고 있다. 이러한 정보기기의 좀 더 낳은 생산성과 효율을 얻기 위해 소형화, 경량화 및 고기능화의 요구에 대응되는 공정으로서 부품의 표면실장기술이 80년대에 실용화되었고, 이에 따른 칩 부품의 수요도 급격히 증가하고 있다. 대표적인 칩부품중의 하나인 MLCC(Multi Layer Ceramic Capacotor)는 전자제품의 소형경량화 및 대량생산과 더불어 필수적이 수소동자로써 지금까지 그 성장세는 휴대폰과 컴퓨터생산의 빠른 증가에 EK라 매년 약 15% 정도로 증가하고 있으며, 앞으로 그 수요는 더욱더 등가 할 것이다. EH한 고용량 영역까지 용량대를 확장함으로써, 탄탈 및 알루미늄 전해콘덴서의 영역까지도 확대 형성될 것으로 예상되고 있다. 본 강연에서는 MLCC의 제조기술 동향과 시장에 대한 전망에 대해 소개함으로써, 하루가 다르게 발전하고 있는 전자산업의 고용량화, 초소형화, 특수품, 복합화 등의 적층부품 전반의 현황 및 발전방향 파악하는데 조금이라도 도움이 되고자 한다.

• Korean Journal of Materials Research
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• v.11 no.4
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• pp.329-334
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• 2001

Microstructures of barrier-type oxide layers on aluminum was studied by XRD, TEM and RBS. Fer formation of oxide layer. aluminum was anodized in a boric acid solution. The thickness of the oxide film subjected to applied voltage increased linearly at ratio of 1.54nm/V. For oxide layer anodized at 300V, amorphous structure of oxide layer was not transformed after heat treatment at 50$0^{\circ}C$ , while for oxide layers anodized at higher voltages the amorphous structure crystallized into a ${\gamma}$-alumina without any heat treatment. It was also found that the amorphous structure of oxide layer formed at 100V transformed into crystalline structure by electron irradiation. The structure was identified as ${\gamma}$-alumina.