• Title/Summary/Keyword: 실리콘 옥사이드

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Schottky Barrier Tunnel Transistor with PtSi Source/Drain on p-type Silicon On Insulator substrate

  • O, Jun-Seok;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.146-146
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    • 2010
  • 일반적인 MOSFET (Metal-Oxide-Semiconductor-Field-Effect-Transistor)은 소스와 드레인의 형성을 위해서 불순물을 주입하고 고온의 열처리 과정을 거치게 된다. 이러한 고온의 열처리 과정 때문에 녹는점이 낮은 메탈게이트와 게이트 절연막으로의 high-k 물질의 사용에 제한을 받게된다. 이와 같은 문제점을 보완하기 위해서 소스와 드레인 영역에 불순물 주입공정 대신에 금속접합을 이용한 Schottky Barrier Tunnel Transistor (SBTT)가 제안되었다. SBTT는 $500^{\circ}C$ 이하의 저온에서 불순물 도핑없이 소스와 드레인의 형성이 가능하며 실리콘에 비해서 수십~수백배 낮은 면저항을 가지며, 단채널 효과를 효율적으로 제어할 수 있는 장점이 있다. 또한 고온공정에 치명적인 단점을 가지고 있는 high-k 물질의 적용 또한 가능케한다. 본 연구에서는 p-type SOI (Silicon-On-Insulator) 기판을 이용하여 Pt-silicide 소스와 드레인을 형성하고 전기적인 특성을 분석하였다. 또한 본 연구에서는 기존의 sidewall을 사용하지 않는 새로운 구조를 적용하여 메탈게이트의 사용을 최적화하였고 게이트 절연막으로써 실리콘 옥사이드를 스퍼터링을 이용하여 증착하였기 때문에 저온공정을 성공적으로 수행할 수 있었다. 이러한 게이트 절연막은 열적으로 형성시키지 않고도 70 mv/dec 대의 우수한 subthreshold swing 특성을 보이는 것을 확인하였고, $10^8$정도의 높은 on/off current ratio를 갖는 것을 확인하였다.

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Effect of Electrolyte Additive on the Electrochemical Characteristics of Lithium Vanadium Oxide Anode (전해질 첨가제가 리튬 바나듐 옥사이드 전극의 성능에 미치는 영향)

  • Lee, Je-Nam
    • Journal of the Korean Electrochemical Society
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    • v.21 no.3
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    • pp.55-60
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    • 2018
  • The demand for LIBs with higher energy densities has increased continuously because the emergence of wider and more challenging applications including HEV and EV has became imperative. However, in the case of anode material, graphite is insufficient to meet this need. To meet such demand, several type of negative electrode materials like silicon, tin, SiO, and transition metal oxide have been investigated for the advanced lithium secondary batteries. Recently, lithium vanadium oxide, which has a layered structure, is assumed as one of the promising anode material as alternative of graphite. This material shows a high volumetric capacity, which is 1.5 times higher than that of graphite. However, relative low electrical conductivity and particle fracture, which results in the electrolyte decomposition and loss of electric contact between electrode, induce rapid capacity decay. In this report, we investigated the effect of electrolyte additive on the electrochemical characteristics of lithium vanadium oxide.

Titanium dioxide by spray deposition for buried contact silicon solar cells fabrication (전극함몰형 실리콘 태양전지의 제작시 스프레이 방법에 의한 타이타늄 옥사이드층의 적용에 관한 연구)

  • A.U. Ebong;S.H. Lee
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.6 no.2
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    • pp.263-274
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    • 1996
  • Titanium dioxide ($TiO_{2}$) film has been widely used as anti-reflection coating for solar cells but not as masking oxide for metallisation and diffusion of impurities. In this paper we have investigated the properties of $TiO_{2}$ for possible incorporation into solar cell processing sequence. Thus the use of a spray deposition system to form the $TiO_{2}$ film and the characterisation of this film to ascertain its suitability to solar cell processing. The spray-on $TiO_{2}$ film was found to be resistant to all the chemicals used in conjunction with solar cell processing. The high temperature anealing (in oxygen ambient) of the spray-on $TiO_{2}$ film resulted in an increased refractive index, which indicated the growth of an underlying thin film of $SiO_{2}$ film for the passivation of silicon surface which would reduce the recombination activities of the fabricated device. Most importantly, the successful incorporation of the $TiO{2}$ film will lead to the reduction of the many high temperature processing steps of solar cell to only one.

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A Study On MOSFET Hump Characteristics with STI Structures (STI 구조에서 발생하는 MOSFET Hump 특성에 관한 연구)

  • 이용희;정상범;이천희
    • Proceedings of the Korean Information Science Society Conference
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    • 1998.10c
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    • pp.674-676
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    • 1998
  • 소자가 sub-quarter um급으로 축소됨에 따라 STI(Shallow Trench Isolation) 기술은 고 집적도의 ULSI 구현에 있어서 중요한 격리 방법으로 많이 사용되고 있다. 현재의 STI 기술은 주로 실리콘 기판을 식각 후 절연물질로 빈 공백이 없이 채우는 (void-free gap filling) 방법 [1,2]과 절연물질을 다시 표면 근처까지 CMP(Chemical Mechnical Polishing)로 etchback하여 평탄화를 하는 방법이 주요한 기술이 되고 있다. 또한 STI 구조로된 격리구조에서 만들어진 MOSFET의 전기적인 특성은 트랜치 격리의 상부 부분의 형태와 gap-filling 물질에 따라 큰 영향을 받게된다. 따라서 본 논문에서는 STI 구조로 만들어진 격리 구조에서 MOSFET의 hump 특성에 관해 연구하였다. 그 결과 hump는 STI 모서리에서 필드 옥사이드의 recess에 의한 모서리 부분에서의 전계 집중과 boron의 segration에 기인한 농도 감소로 인해 hump가 발생하는 것으로 나타났다.

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Passive matrix of p-type SWCNTs and PEI-doped n-type SWCNTs

  • Yun, Jang-Yeol;Park, Jae-Hyeon;Ha, Jeong-Suk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.73-73
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    • 2010
  • 본 연구에서는 성장된 p-형의 단일벽 탄소 나노튜브 (SWCNT)와 폴리머 코팅으로 n-형 특성을 보이는 SWCNT의 접합으로 pn-접합 소자 어레이를 만들고 특성을 분석한 결과에 대해 발표하고자 한다. Y-cut quartz 기판에 0.1 nm 두께의 철 촉매 패턴을 만들고 화학기상증착법으로 잘 정렬된 SWCNT를 성장시킨 후, 열 박리 테이프 (thermal tape)을 이용하여 정렬된 나노선을 실리콘 옥사이드 기판에 전이한다. 전기적(electrical breakdown)으로 금속성의 나노선을 제거하고 p-형의 나노선 배열을 얻을 수 있다. 이 나노선에 국소적으로 폴리머 (polyethyleneimine: PEI) 코팅을 하여 n-형 특성을 갖는 나노선 패턴을 만들 수 있다. 이를 이용하여 만든 소자는 p-형과 n-형이 하나의 나노선 안에 부분적으로 존재하므로 연결부위의 접촉에 관한 문제가 전혀 없으며 소자를 만들기도 유용하다. 이렇게 준비된 p-형 나노선과 n-형 나노선의 접합에서 정류특성을 관찰하였다. 이러한 passive matrix 소자는 터치패드나 유기발광다이오드와 같은 다양한 소자에 응용 가능하다.

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Characteristics of Crystalline Silicon Solar Cells with Double Layer Antireflection Coating by PECVD (결정질 실리콘 태양전지의 이중 반사방지막 특성에 대한 연구)

  • Kim, Jin-Kuk;Park, Je-Jun;Hong, Ji-Hwa;Kim, Nam-Soo;Kang, Gi-Hwan;Yu, Gwon-Jong;Song, Hee-Eun
    • 한국태양에너지학회:학술대회논문집
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    • 2012.03a
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    • pp.243-247
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    • 2012
  • The paper focuses on an anti-reflection (AR) coating deposited by PECVD in silicon solar cell fabrication. AR coating is effective to reduce the reflection of the light on the silicon wafer surface and then increase substantially the solar cell conversion efficiency. In this work, we carried out experiments to optimize double AR coating layer with silicon nitride and silicon oxide for the silicon solar cells. The p-type mono crystalline silicon wafers with $156{\times}156mm^2$ area, 0.5-3 ${\Omega}{\cdot}cm$ resistivity, and $200{\mu}m$ thickness were used. All wafers were textured in KOH solution, doped with $POCl_3$ and removed PSG before ARC process. The optimized thickness of each ARC layer was calculated by theoretical equation. For the double layer of AR coating, silicon nitride layer was deposited first using $SiH_4$ and $NH_3$, and then silicon oxide using $SiH_4$ and $N_2O$. As a result, reflectance of $SiO_2/SiN_x$ layer was lower than single $SiN_x$ and then it resulted in increase of short-circuit current and conversion efficiency. It indicates that the double AR coating layer is necessary to obtain the high efficiency solar cell with PECVD already used in commercial line.

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Effect of Substrate Temperature and Growth Duration on Palladium Oxide Nanostructures (팔라듐 옥사이드 나노구조물의 성장에서 기판 온도와 성장 시간의 효과)

  • Kim, Jong-Il;Kim, Ki-Chul
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.20 no.4
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    • pp.458-463
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    • 2019
  • Palladium (Pd) is widely used as a catalyst and noxious gas sensing materials. Especially, various researches of Pd based hydrogen gas sensor have been studied due to the noble property, Pd can be adsorbed hydrogen up to 900 times its own volume. In this study, palladium oxide (PdO) nanostructures were grown on Si substrate ($SiO_2(300nm)/Si$) for 3 to 5 hours at $230^{\circ}C{\sim}440^{\circ}C$ using thermal chemical vapor deposition system. Pd powder (source material) was vaporized at $950^{\circ}C$ and high purity Ar gas (carrier gas) was flown with the 200 sccm. The surface morphology of as-grown PdO nanostructures were characterized by field-emission scanning electron microscopy(FE-SEM). The crystallographic properties were confirmed by Raman spectroscopy. As the results, the as-grown nanostructures exhibit PdO phase. The nano-cube structures of PdO were synthesized at specific substrate temperatures and specific growth duration. Especially, PdO nano-cube structrures were uniformly grown at $370^{\circ}C$ for growth duration of 5 hours. The PdO nano-cube structures are attributed to vapor-liquid-solid process. The nano-cube structures of PdO on graphene nanosheet can be applied to fabricate of high sensitivity hydrogen gas sensor.

Surface energy modification of SiOxCyHz film using low temperature PECVD by controlling the plasma process for HMDS precursor with hydrogen gas (수소 기체와 HMDS 프리커서의 저온 PECVD공정을 통한 실리콘옥사이드 박막의 표면에너지 개질)

  • Lee, Jun-Seok;Jin, Su-Bong;Choe, Yun-Seok;Choe, In-Sik;Han, Jeon-Geon
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2012.11a
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    • pp.165-166
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    • 2012
  • 표면의 젖음성은 어플리케이션의 매우 중요한 점으로, 이것은 표면에너지와 표면의 조도에 의해 결정된다. 표면의 젖음성을 낮추기 위하여 저온 PECVD 공정을 통해 초소수성 박막을 만들었다. $SiO_xC_yH_z$ 필름을 만들기 위하여 RF power을 사용하였고, HMDS (hexamethyl-disilazane) precursor과 함께 수소 기체를 통해 증착하였다. 이 실험에서는 수소와 RF power를 변수로 진행하였고, 이것은 소수성 박막의 표면에너지를 변화시켰다. 필름을 합성한 후 contact angle measurement 및 AFM을 사용해 표면에너지와 표면조도를 관찰하였다. 또한 필름의 화학적 결합을 알기 위해 FT-IR을 이용하였다. 여기에서 표면의 에너지는 표면의 조도와 화학적 결합상태에 의해서 영향을 받았음을 알 수 있었다.

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A Study on the Vanadium Oxide Thin Films as Cathode for Lithium Ion Battery Deposited by RF Magnetron Sputtering (RF 마그네트론 스퍼터링으로 증착된 리튬 이온 이차전지 양극용 바나듐 옥사이드 박막에 관한 연구)

  • Jang, Ki-June;Kim, Ki-Chul
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.20 no.6
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    • pp.80-85
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    • 2019
  • Vanadium dioxide is a well-known metal-insulator phase transition material. Lots of researches of vanadium redox flow batteries have been researched as large scale energy storage system. In this study, vanadium oxide($VO_x$) thin films were applied to cathode for lithium ion battery. The $VO_x$ thin films were deposited on Si substrate($SiO_2$ layer of 300 nm thickness was formed on Si wafer via thermal oxidation process), quartz substrate by RF magnetron sputter system for 60 minutes at $500^{\circ}C$ with different RF powers. The surface morphology of as-deposited $VO_x$ thin films was characterized by field-emission scanning electron microscopy. The crystallographic property was confirmed by Raman spectroscopy. The optical properties were characterized by UV-visible spectrophotometer. The coin cell lithium-ion battery of CR2032 was fabricated with cathode material of $VO_x$ thin films on Cu foil. Electrochemical property of the coin cell was investigated by electrochemical analyzer. As the results, as increased of RF power, grain size of as-deposited $VO_x$ thin films was increased. As-deposited thin films exhibit $VO_2$ phase with RF power of 200 W above. The transmittance of as-deposited $VO_x$ films exhibits different values for different crystalline phase. The cyclic performance of $VO_x$ films exhibits higher values for large surface area and mixed crystalline phase.

Real-time monitoring for blending uniformity of trimebutine CR tablets using near-infrared and Raman spectroscopy (근적외분광분석법과 라만분광분석법을 이용한 트리메부틴말레인산 서방정의 혼합 과정 모니터링)

  • Woo, Young-Ah
    • Analytical Science and Technology
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    • v.24 no.6
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    • pp.519-526
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    • 2011
  • Chemometrics using near-infrared (NIR) and Raman spectroscopy have found significant uses in a variety quantitative and qualitative analyses of pharmaceutical products in complex matrixes. Most of the pharmaceutical can be measured directly with little or no sample preparation using these spectroscopic methods. During pharmaceutical manufacturing process, analytical techniques with no or less sample preparation are very critical to confirm the quality. This study showed NIR and Raman spectroscopy with principal component analysis (PCA) was very effective for the blending processing control. It is of utmost importance to evaluate critical parameters related to quality of products during pharmaceutical processing. The blending is confirmed by off-line determination of active pharmaceutical ingredient (API) by a conventional method such as high performance liquid chromatography (HPLC) and UV spectroscopy. These analytical methods are time-consuming and ineffective for real time control. This study showed the possibility for the determination of blend uniformity end-point of CR tablets with the use of both NIR and Raman spectroscopy. The samples were acquired from six positions during blending processing with U-type blender from 0 to 30 min. Using both collected NIR and Raman spectral data, principal component analysis (PCA) was used to follow the uniformity of blending and finally determine the end-point. The variation of homogeneity of six samples during blending was clearly found and blend uniformity end-point was successfully confirmed in the domains of principal component (PC) scores.