• Journal of the Korean Magnetics Society
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• v.24 no.6
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• pp.165-170
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• 2014

We analyzed the ferromagnetic and spin wave resonance signals measured in amorphous CoFeB thin films with different thickness. The ferromagnetic resonance field ($H_{FMR}$) was not depend on the thickness of CoFeB films, but the spin wave resonance field ($H_{SWR}$) was well fitted with the theoretical prediction depending on the thickness. The uniaxial anisotropy field of $H_k$ = 37 Oe was obtained from the angular dependent $H_{FMR}$ in CoFeB films. The $H_{SWR}$ showed same angular behaviors with $H_{FMR}$, however, the amplitude of spin wave resonance signals showed 5.7 times higher than that of ferromagnetic resonance signals in CoFeB film with t = 100 nm. The higher signals were due to the two reasons; one was the small damping for the spin wave propagation without degradation, the other was uniform magnetization for the ideal standing wave modes.

• Journal of the Korean Magnetics Society
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• v.10 no.2
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• pp.86-92
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• 2000

The spin wave absorption spectra are obtained by a simultaneous solution of the Maxwell equation and the Gilbert equation considering the boundary condition of electromagnetic wave and magnetization in the film surfaces. The physical parameters that influence the absorption energy are thickness, exchange stiffness constant, surface magnetic anisotropy, magnetization. damping factor, electric resistivity of the thin film. We investigated how these parameters affect the resonance field, the linewidth and the intensity of the spin wave spectrum.

• Journal of the Korean Magnetics Society
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• v.5 no.6
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• pp.968-973
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• 1995

In order to investigate the annealing effect for RF magnetron sputtered $Ni_{83}Fe_{17}$ thin films, we have studied the spin wave rehaviors by FMR after annealing the samples at $135^{\circ}C,\;225^{\circ}C$ in air and at $160^{\circ}C,\;220^{\circ}C,\;330^{\circ}C,\;390^{\circ}C\;and\;420^{\circ}C$ in argon gas for one hour respectively. In FMR spectra for the films annealed in argon gas and the assputtered film at perpendicular resonance, only odd numrer spin waves are observed. But even numrer spin waves are observed for the film annealed in air at $225^{\circ}C$ recause of the large difference retween both surface magnetic anisotropy. In the case of the sample annealed at $420^{\circ}C$ in argon gas, the spin waves are shifted toward high field, can due to the increase of saturation magnetization during annealing. The spacings retween the spin wave resonance fields are narrowed rapidly, this is thought that the magnetic homogeneity increased in the film after annealing at high temperature.

• Proceedings of the Korean Magnestics Society Conference
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• 2015.05a
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• pp.106-107
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• 2015

• Proceedings of the Korean Magnestics Society Conference
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• 2015.11a
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• pp.88-89
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• 2015

• Proceedings of the Korean Magnestics Society Conference
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• 1997.11a
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• pp.66-67
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• 1997

• Journal of the Korean Magnetics Society
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• v.4 no.2
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• pp.100-105
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• 1994

Ni-Fe thin films are deposited on the corning glass substrate by means of RF magnetron sputtering system In order to investigate the dependence of the prorerties of Ni-Fe thin films on the film thickness, ferromagnetic reson¬ance spectrum has been examined. The effective magnetization $M_{eff}$ is constant for all samples, while the exchange stiffness constant A increases with the film thickness. A tendency that spectroscopic splitting factor g increases with the sample thickness, we expect that the increase of the contribution of the orbital motion to the magnetic moment as a reason for it.

• Journal of the Korean Magnetics Society
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• v.7 no.1
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• pp.38-43
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• 1997

For amorphous $Co_{1-x}Ti_x$(X=0.13, 0.16, 0.21 at.%) thin films deposited by DC magnetron sputtering method ferromagnetic resonance experiments have been used to investigate the dependence of surface magnetic properties according to annealing temperature (150~225 $^{\circ}C$). Spin wave resonance spectra for all annealing temperatures consist of several volume modes and one(or two) surface mode. It is suggested that both surfaces of the film have a perpendicular hard axis to the film plane(negative surface anisotropy). Also, the surface anisotropy $K_{s2}$ at substrate film interface is varied slowly from -0.11 to -0.25 erg/ $\textrm{cm}^2$ and the surface anisotropy $K_{s1}$ at film-air interface is varied from 0.16 to -0.53 erg/ $\textrm{cm}^2$ with increasing annealing temperature. We conjecture that the variation of surface anisotropy $K_{s1}$ is due to the increase of Co concentration resulted from Ti oxidation for low temperature annealing(150~200 $^{\circ}C$) and the diffusion of Co atoms near the film surfaces for high temperature annealing(225~250 $^{\circ}C$).

• Journal of the Korean Magnetics Society
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• v.24 no.2
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• pp.60-65
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• 2014

We obtained resonance field ($H_{res}$) and linewidth (${\Delta}H_{PP}$) from measured ferromagnetic resonance signal in the functions of polar angle (${\Theta}_H$) in Ni thin film of 240 nm thickness fabricated by electrodeposition method. The angular dependence of $H_{res}$ was well fitted with the calculated ones. We confirmed that the g-factor and effective demagnetization field were 2.18 and 445 emu/cc by the theoretical analysis of the resonance field, respectively. The angular dependence of ${\Delta}H_{PP}$ showed very large values at in-plane direction (${\Theta}_H=90^{\circ}$), which could not explained by the homogenous linewidth due to the Gilbert damping and inhomogeneous linewidth due to the angular variations and magnetization variations by the surface layer. Therefore, we considered the spin wave scattering (two magnon scattering) process in order to analyze the measured inhomogeneous linewidth, which was appeared in thicker film than the critical thickness of 50 nm. The defect medicated spin wave scattering played a key role in the electrodoposited Ni thin film of 240 nm thickness.

• Journal of the Korean Magnetics Society
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• v.7 no.3
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• pp.129-133
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• 1997

To investigate the influence of the Hf concentration and the annealing effect in $Co_{1-x}Hf_x$(X=0.16, 0.24 at.%) systems, ferromagnetic resonance experiments have been carried out. Spin wave resonance spectra for all samples consist of several volume modes and one (or two) surface mode. It is suggested that both surfaces of the film have a perpendicular hard axis to the film plane (negative surface anisotropy). The surface anisotropy $K_{s2}$ at substrate-film interface is varied slowly from -0.07 to -0.32 erg/$\textrm{cm}^2$ and the surface anisotropy $K_{s1}$ at film-air interface is varied from 0.18 to -0.47 erg/ $\textrm{cm}^2$ with increasing annealing temperature in the amorphous $Co_{84}Hf_{16}$ thin films. Also, the surface anisotropy $K_{s2}$ is varied slowly from -0.31 to -0.41 erg/$\textrm{cm}^2$ and the surface anisotropy $K_{s1}$is varied from -0.19 to -0.60 erg/$\textrm{cm}^2$ with increasing annealing temperature in the amporphous $Co_{84}Hf_{16}$ thin films. We conjecture that the variation of surface anisotropy $K_{s1}$ is due to the increase of Co concentration resulted from Hf oxidation for low temperature annealing(150~175 $^{\circ}C$) and the diffusion of Co atoms near the film surfaces for high temperature annealing (200~225 $^{\circ}C$).