• Title/Summary/Keyword: 스핀코팅

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ZnO/PMMA 나노복합소재와 $C_{60}$ 층과 결합하여 제작한 유기 쌍 안정성 소자의 메모리 성능 향상

  • Yu, Chan-Ho;Jeong, Jae-Hun;Kim, Tae-Hwan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.82-82
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    • 2010
  • 유기 쌍안정성 소자는 비휘발성 기억 소자 중에서 구조가 간단하고 제작비용이 저렴하며 유연성을 가지기 때문에 많은 연구가 진행되고 있다. 현재 유기물/무기물 나노복합소재를 사용하여 소자 성능 향상이 기억소자의 성능 향상을 위하여 여러 가지 유기물/무기물 나노복합소재를 사용하여 제작한 유기 쌍안정성 소자가 유연성을 가진 비휘발성 기억소자로 대두되고 있다. 본 연구에서는 ZnO 나노입자를 포함한 PMMA 복합층을 사용하여 제작한 유기 쌍안정성 기억소자를 제작하여 메모리 특성을 조사하였다. 이와 더불어 활성층에 효과적인 전하주입을 위하여 전극과 PMMA/ZnO 층 사이에 $C_{60}$ 층을 삽입한 구조를 가진 메모리 소자의 성능 향상에 대하여 연구하였다. Indium tin oxide 가 증착된 유리 기판위에 $C_{60}$ 층을 스핀코팅 방법으로 적층하였다. 1 wt% ZnO 나노입자와 1 wt% PMMA를 혼합하여 스핀코팅 방법으로 $C_{60}$ 층 위에 박막을 형성하였다. 그리고, 전극으로 Al을 열증착으로 형성하였다. $C_{60}$ 층이 있는 유기 쌍안정성 기억 소자와 $C_{60}$ 층이 없는 두 가지의 소자에 대하여 전류-전압 (I-V) 특성을 측정하여 각각의 소자에서의 전류 히스테리시스 현상이 발생하는 원인을 규명하였다. I-V 특성 결과와 전자적 구조를 사용하여 유기 쌍안정성 소자에서의 쓰기, 지우기 및 읽기 동작에 대한 과정을 설명하였다. 두 소자의 I-V 특성을 비교하므로 $C_{60}$ 층을 사용하여 유기 쌍안정성 소자의 성능이 향상됨을 알 수 있었다. 또한 $C_{60}$ 층을 사용하여 제작된 유기 쌍안정성 소자의 성능이 향상된 원인을 규명하였다.

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Effect of Types of Colloidal Silica on Properties of Hydrophilic Coating Films (콜로이드 실리카 종류가 친수성 코팅 필름의 물성에 미치는 영향)

  • Yang, Jun Ho;Song, Ki Chang
    • Korean Chemical Engineering Research
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    • v.55 no.6
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    • pp.830-836
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    • 2017
  • Hydrophilic coating solutions were prepared by reacting a silane coupling agent, GPTMS (3-glycidoxypropyl trimethoxysilane) with colloidal silica. Hydrophilic coating films were also obtained by depositing the hydrophilic coating solutions on polycarbonate substrates by spin-coating and subsequently by thermal curing at $120^{\circ}C$. During this process, the effect of average particle sizes of colloidal silica was studied on the properties of coating films. As a result, coating film, prepared from colloidal silica with average particle size of 25 nm, showed a low contact angle of $20^{\circ}$ and a good pencil hardness of H. On the other hand, coating films, prepared from colloidal silica with average particle sizes of 15 nm and 45 nm, exhibited high contact angles of $27^{\circ}$ and $36^{\circ}$ and pencil hardness of H and B, respectively.

Development of CNT Coating Process using Argon Atmospheric Plasma (아르곤 상압플라즈마를 이용한 CNT 코팅 공정 기술 개발)

  • Kim, Kyoung-Bo;Lee, Jongpil;Kim, Moojin
    • Journal of Industrial Convergence
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    • v.20 no.10
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    • pp.33-38
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    • 2022
  • In this paper, a simple method of forming a solution-based carbon nanotube (CNT) for use as a conductive material for electronic devices was studied. The CNT thin film coating was performed on the glass by applying the spin coating method and the argon atmospheric pressure plasma process. In order to observe changes in electrical and physical properties according to the number of coatings, samples formed in the same manner from times 1 to 5 were prepared, and surface shape, reflectance, transmittance, absorbance, and sheet resistance were measured for each sample. As the number of coatings increased, the transmittance decreased, and the reflectance and absorptivity increased in the entire measurement wavelength range. Also, as the wavelength decreases, the transmittance decreases, and the reflectance and absorption increase. In the case of electrical properties, it was confirmed that the conductivity was significantly improved when the second coating was applied. In conclusion, in order to replace CNT with a transparent electrode, it is necessary to consider the number of coatings in consideration of reflectivity and electrical conductivity together, and it can be seen that 2 times is optimal.

스핀코팅 방법으로 제작된 ZnO 박막의 단계적 후열처리에 따른 구조적 및 광학적 특성

  • Mun, Ji-Yun;Nam, Gi-Ung;Park, Seon-Hui;Park, Yeong-Bin;Park, Hyeong-Gil;Yun, Hyeon-Sik;Kim, Yeong-Gyu;Ji, Ik-Su;Kim, Ik-Hyeon;Kim, Dong-Wan;Kim, Jong-Su;Kim, Jin-Su;Im, Jae-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.290.1-290.1
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    • 2014
  • 스핀코팅방법으로 증착된 ZnO 박막의 단계적 후열처리에 따른 구조적, 광학적 특성에 관한 연구를 수행하였다. 일반적으로 ZnO 박막은 한 층을 증착한 후에, 유기물을 제거하기 위하여 전열처리를 수행한다. 본 연구에서는 ZnO 박막을 전열처리와 후열처리를 동시에 단계적으로 수행하였다. X-ray diffractometer, UV-visible spectrometer, photoluminescence를 이용하여 ZnO 박막의 구조적, 광학적 특성을 분석하였다. 모든 시료에서 표면은 직경이 약 20 nm인 둥근 입자들로 이루어져 있었다. X-ray diffraction 패턴은 $31^{\circ}$, $34^{\circ}$, $36^{\circ}$에서 나타났고, 이것은 각각 ZnO의 (100), (002), (101) 방향을 보여준다. 전열처리와 후열처리를 동시에 수행했을 경우, 자유엑시톤 재결합에 의해 3.2 eV에서 좁은 near-band-edge emission 피크가 나타났으며, 투과도 또한 향상되었다.

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Study in Minimum of Edge Bump using the Chamfer Angle in Blu-ray Disc Cover layer Spin Coating Process (블루레이 디스크의 커버 레이어 스핀코팅 시 챔퍼각을 이용한 끝단 범프 최소화 연구)

  • Lee, H.G.;Son, S.K.;Cho, K.C.;Shin, H.G.;Kim, B.H.
    • Transactions of the Society of Information Storage Systems
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    • v.2 no.3
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    • pp.178-183
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    • 2006
  • A Blu-ray disc, which has a more than 25GB optical capacity, has been known as a promising next-generation optical disc format. It commonly has a 1.1 mm thick substrate and a 0.1 mm thick cover layer for beam transmitting and the protection of the reflecting surface. The cover layer is generally formed by the spin coating process. However, in conventional spin coating, small bumps are formed along the rim of the disc, which results in the fatal reading error. Numerical simulation of the thin film flow behaviors during spin coating with the commercial solver and optimal spinning conditions was obtained. Thickness distribution of the cover layer according to the variation of substrate's edge shape could be calculated as well. By modifying the shape of the substrate edge shape, the bumps along the disc rim could be minimized, and it was proved that the chamfered edge, around $5{\sim}10$ degree, is the simplest and most effective way to minimize the bumps.

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Effects of Thickness on Structural and Optical Properties of ZnO Thin Films Fabricated by Spin Coating Method (스핀코팅 방법으로 제작된 ZnO 박막의 두께에 따른 구조적 및 광학적 특성)

  • Yim, Kwang-Gug;Kim, Min-Su;Kim, Ghun-Sik;Choi, Hyun-Young;Jeon, Su-Min;Cho, Min-Young;Kim, Hyeoung-Geun;Lee, Dong-Yul;Kim, Jin-Soo;Kim, Jong-Su;Lee, Joo-In;Leem, Jae-Young
    • Journal of the Korean Vacuum Society
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    • v.19 no.4
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    • pp.281-286
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    • 2010
  • Thickness effects on the structural and optical properties of ZnO thin films fabricated by spin coating method have been carried out. With increase in the thickness of the ZnO thin films, the width and density of striation shape are increased. The ZnO thin film with thickness of 450 nm has a smooth surface morphology. For the ZnO thin film with a smooth surface, orientation factor ${\alpha}_{(002)}$ is sharply increased and FWHM of (002) diffraction peak is decreased compared to the ZnO thin films with a striation shape surface. Thickness and surface morphology of the ZnO thin films hardly affect the NBE peak position. However, the DLE peak position is blue-shifted as the surface morphology is changed from striation to smooth surface. The PL intensity ratio of the NBE to DLE is increased and the FWHM of NBE peak is decreased as the thickness of the ZnO thin films is increased.

Effects of Precursor Concentration on Surface and Optical Properties of ZnO Nano-Fibrous Thin Films Fabricated by Spin-Coating Method (스핀코팅 방법으로 제작된 ZnO 나노 섬유질 박막의 전구체 농도에 따른 표면 및 광학적 특성)

  • Kim, Min-Su;Kim, Ghun-Sik;Yim, Kwang-Gug;Cho, Min-Young;Jeon, Su-Min;Choi, Hyun-Young;Lee, Dong-Yul;Kim, Jin-Soo;Kim, Jong-Su;Lee, Joo-In;Leem, Jae-Young
    • Journal of the Korean Vacuum Society
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    • v.19 no.6
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    • pp.483-488
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    • 2010
  • ZnO nano-fibrous thin films with various precursor concentrations ranging from 0.2 to 1.0 mol (M) were grown by spin-coating method and effects of the precursor concentration on surface and optical properties of the ZnO nano-ribrous thin films were investigated by using scanning electron microscopy (SEM) and photoluminescence (PL). ZnO nuclei were formed at the precursor concentration below 0.4 M and the ZnO nano-fibrous thin films were grown at the precursor concentration above 0.6 M. Further increase in the precursor concentration, the thickness of the ZnO nano-fibrous thin films is gradually increased. The intensity and the full-width at half-maximum (FWHM) of the near-band-edge emission (NBE) is increased as the precursor concentration is increased. The deep-level emission (DLE) is red-shifted as the precursor concentration is increased.

flexible electric device를 위한 flexible insulator

  • Kim, Dong-Won;Kim, Min-Gyu;Lee, Jeong-Hun;Yu, Ji-Beom
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.408.1-408.1
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    • 2016
  • 현대 반도체 산업에서 소자의 집적도가 증가함에 따라 층간 절연막의 두께가 줄어들어 RC delay현상이 발생한다. 또한 유연성에 대한 요구도 증가하고 있다. 그 대안으로 저유전 SiO2 무기물, 유무기 복합체, 유기물 등이 크게 각광받고 있다. 본 연구는 SiO2 hollow sphere와 폴리이미드를 이용해 유무기복합체를 합성하고 유전율 측정 및 유연성 테스트를 진행한 내용을 담고있다. 먼저 폴리스티렌에 SiO2를 코팅한 후 폴리이미드 용액과 기계적으로 혼합시킨다. 이후 스핀코팅 및 열처리를 이용해 한단계로 복합체를 합성할수 있다. 합성된 복합체의 유전율은 최소 1.6에 가까운 수치를 나타낸다.

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The Flow of a Liquid Film on Spin Coating (스핀 코팅에서의 액막의 흐름)

  • Kim, Tae-sung
    • Journal of ILASS-Korea
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    • v.18 no.3
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    • pp.146-154
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    • 2013
  • The flow of a liquid film on spin coating is investigated in the case that the fixed volume of a liquid is placed on the center of a stationary disk. Thin film equations that are well approximated when the characteristic length in the vertical direction is much smaller than that in the radial direction (${\varepsilon}{\ll}1$) and have already been proposed in the work of T.-S. Kim & M.-U. Kim (2009), are used. The differential equation that governs the free surface of a liquid when ${\varepsilon}{\ll}1$ and ${\varepsilon}Re{\ll}1$ is also derived. The basic flow is analyzed using the thin film equations and their results are compared to the results of Navier-Stokes equations.