• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2000년도 추계학술대회 논문집
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• pp.169-172
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• 2000

In this paper, an OMM (On-the-Machine Measuring) system has been developed, which can perform measuring and inspection of sculptured surfaces of die and mold, by use of a scanning-type touch probe mounted into the spindle of a NC machine. The calibration procedures of a scanning prove (SP2-1, Renishaw) and an algorithm for measuring surface points by a ball-nosed stylus have been studied. The system has been developed based on commercial CAM software (Z-Master 2000), and tested through measuring a plastic injection molding-die. Also some experimental results of the calibration and measuring for given surface positions are analyzed to verify its accuracy and reliability.

• 한국정밀공학회지
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• 제13권10호
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• pp.71-77
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• 1996

This paper describes the development of on the machine measuring(OMM) system which can directlry measure the three dimensional machined dimensilnal accuracy using scanning probe in milling machine. Two algolithms, continuous path(CP) measurement using UC program and CAD data assisted point to point(PTP) measurement, were developed regarding specification of scanning probe. The OMM system was contructed to verify the developed system suing the proposed algorithm, and actually measured three kinds of machined TV shadow mask molds. The developed system was evaluated it's repeatability and compared with the current measurement system of CMM(Coording Measuring Machine) in terms of relative accuracy and time reduction and productivity increase.

• 대한기계학회논문집A
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• 제34권11호
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• pp.1631-1636
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• 2010

본 연구는 AFM 을 이용하여 nano scale 의 Lithography 를 구현하는 것이다. 외부의 pulse generator 를 통하여 전류를 통전 시키는 방법을 수정함으로써, 일정 습도를 유지한 상태의 AFM 내부에서 Si-wafer 의 표면과 Tip의 사이에 전원을 인가하고 pulse generator 에서 임의로 pulse 폭의 변화를 준다. Si-wafer 표면에서 물 분자가 Tip과 wafer 사이의 직접적인 전류의 이동조절로 인해 전기 화학적 반응을 적절히 제한하여 산화물을 생성시키는 방법이다. 이렇게 생성된 산화물은 불산 처리를 통하여 산화물을 식각시켜 미세 그루브를 구현 할 수 있다. 본 연구를 통한 나노 패턴 생성 기법은 나노 머시닝 기술의 진보에 잠재적 가능성을 제시한다.