• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.273-273
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• 2012

최근 스마트 윈도우, 자가세정(Self-Cleaning), 김서림방지(Anti-Fogging), 디스플레이 표시장치, 대전방지 코팅 등 다각적으로 활용이 가능한 PTFE (Ploytetrafluoroethylene)를 Sol-gel, Sputtering, Spin-Coating, CVD (Chemical vapor deposition)방법을 이용하여 낮은 표면에너지와 나노사이즈의 표면 거칠기를 가지는 $150^{\circ}$ 이상의 초-발수성 표면에 대한 많은 연구가 진행되고 있다. 본 실험에서는 영구자석을 이용한 고밀도 플라즈마로 높은 점착성과, 균일한 박막 및 대 면적 공정이 가능한 RF-magnetron sputtering방법을 이용하여 Plasma etching으로 표면적의 거칠기와 낮은 표면에너지를 만든 뒤, 발수특성을 가진 PTFE를 증착하여 접촉각 변화와 구조적 및 광학적 특성을 측정하였다. AFM (Atomic Force Microscope)측정결과 100 w에서 가장 높은 1.7 nm의 RMS(Root mean square)값이 측정되었고, 접촉각 측정결과 Plasma etched glass는 25 w에서 125 w로 증가함에 따라 친수성을 나타내었으며, 100 w에서 가장 낮은 $15^{\circ}$의 접촉각을 나타내었다. PTFE박막을 증착하였을 때는 100 w에서 $150^{\circ}$의 초발수 특성을 나타내었고, 투과율 측정 결과 85%이상의 높은 투과율을 나타내었다. Plasma etching을 이용한 PTFE 발수 특성은 비가 오면 자동으로 이물질이 씻겨 내리는 자동차 유리등의 개발이 가능하고, 높은 투과율이 요구되는 액정표시장치(LCD)같은 차세대 대형 디스플레이의 표면 코팅에 사용이 가능 할 것이라 사료된다. 본 연구는 중소기업청에서 지원하는 2011년도 산학연 공동기술개발 지원사업의 연구수행으로 인한 결과물임을 밝힙니다.

• 연구논문집
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• s.33
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• pp.99-109
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• 2003

Recently the utilization of the ozone dissolved de-ionized water(DIW-$O_3$) in semiconductor wet cleaning process and photoresist stripping process to replace the conventional sulfuric acid and hydro peroxide mixture(SPM) method has been studied. In this paper, we propose the water-electrode type ozone generator which has the characteristics of the high concentration and purity to produce the high concentration DIW-$O_3$ for the photoresist strip process in the semiconductor fabrication. The proposed ozone generator has the dual dielectric tube structure of silent discharge type and the water is both used to electrode and cooling water. Through this study, we obtained the results of the 10.3 wt% of ozone gas concentration at the oxygen gas of 0.5 [liter/min.] and the DIW-$O_3$ concentration of 79.5 ppm.. Through the photoresist stripping test using the produced DIW-$O_3$, we confirmed that the photoresist coated on the silicon wafer was removed effectively in the 12 minutes.

• Membrane Journal
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• v.14 no.1
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• pp.66-74
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• 2004

Total resistance of membrane in a micro-filtration system using a metal membrane was mainly attributed to the permeate resistance of cake layer($R_c$), which was formed by deposited particles from the physico-chemical interactions of solids on membrane surface. Intermittent back ozonation was highly effective than the air backwashing for fouling reduction. As far the operational effect, under same ozone injection, the increase of gas flow-rate was more favorable than the increase of injection time far the recovery of permeation flux. As the filtration time was longer, the effect of flux recovery by intermittent back-ozonation decreased. Therefore, it is preferable to operate membrane cleaning before the foulant is consolidated on membrane surface.

• Journal of the Semiconductor & Display Technology
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• v.16 no.3
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• pp.41-46
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• 2017

This study aims to select suitable co-solvents and to obtain optimal process conditions in order to improve process efficiency and productivity through experimental results obtained under various experimental conditions for the etching and rinsing process using liquid carbon dioxide and supercritical carbon dioxide. Acetone was confirmed to be effective through basic experiments and used as the etching solution for MEMS-wafer etching in this study. In the case of using liquid carbon dioxide as the solvent and acetone as the etching solution, these two components were not mixed well and showed a phase separation. Liquid carbon dioxide in the lower layer interfered with contact between acetone and Mems-wafer during etching, and the results after rinsing and drying were not good. Based on the results obtained under various experimental conditions, the optimum process for treating MEMS-wafer using supercritical CO2 as the solvent, acetone as the etching solution, and methanol as the rinsing solution was set up, and MEMS-wafer without stiction can be obtained by continuous etching, rinsing and drying process. In addition, the amount of the etching solution (acetone) and the cleaning liquid (methanol) compared to the initial experimental values can be greatly reduced through optimization of process conditions.

• Korean Chemical Engineering Research
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• v.46 no.2
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• pp.414-422
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• 2008

Adsorption experiments for $H_2$, $CH_4$, CO, $CO_2$ on activated carbon and zeolite 5A were performed by static volumetric method. A 4-bed pressure swing adsorption (PSA) process was to study separation of hydrogen from multi-component mixture gases ($H_2$ 72.2%, $CH_4$ 4.06%, CO 2.03%, $CO_2$ 21.6%). Dual-site langmuir (DSL) isotherm showed good or fair agreement with the experimental results. The optimum height of activated carbon layer was 55 cm with breakthrough results on the packing ratio of activated carbon to zeolite 5A. In PSA process, the effects of the process parameters such as total cycle time ($T_c$), ${\Delta}P$ at the provide purge step and adsorption pressure on the PSA performance were studied experimentally and theoretically.

• Applied Chemistry for Engineering
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• v.29 no.1
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• pp.10-17
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• 2018

POU (point of use) scrubbers were applied for the treatment of waste gases including PFCs (perfluorocompounds) exhausted from the CVD (chemical vapor deposition), etching, and cleaning processes of semiconductor and display manufacturing plant. The GWP (global warming potential) and atmosphere lifetime of PFCs are known to be a few thousands higher than that of $CO_2$, and extremely high temperature more than 3,000 K is required to thermally decompose PFCs. Therefore, POU gas scrubbers based on the thermal plasma technology were developed for the effective control of PFCs and industrial application of the technology. The thermal plasma technology encompasses the generation of powerful plasma via the optimization of the plasma torch, a highly stable power supply, and the matching technique between two components. In addition, the effective mixture of the high temperature plasma and waste gases was also necessary for the highly efficient abatement of PFCs. The purpose of this paper was to provide not only a useful technical information of the post-treatment process for the waste gas scrubbing but also a short perspective on R&D of POU plasma gas scrubbers.

• Resources Recycling
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• v.14 no.6 s.68
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• pp.28-36
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• 2005

A hydrometallurgical process to leach cobalt from the waste cathodic active material, $LiCoO_{2}$, and subsequently to separate it by solvent extraction was developed. The optimum leaching conditions for high recovery of colbalt and lithium were obtained: 2.0 M sulfuric acid, 5 $vol.\%$ hydrogen peroxide, $75^{\circ}C$ leaching temperature, 30 minutes leaching time and an initial pulp density of 100 g/L. The respective leaching efficiencies for Co and Li were $93\%$ and $94.5\%$. About $85\%$ Co was extracted from the sulfuric acid leach liquor containing 44.72 g/L Co and 5.43 g/L Li, using 1.5 M Cyanex272 as an extractant at the initial pH 5.0 and in organic to aqueous phase ratio of 1.6:1 under the single stage extraction conditions. The Co in the raraffinate was completely extracted by 0.5 M Na-Cyanex272 at the inital pH 5.0, and an organic to aqueous phase ratio of 1;1. The cobalt sulfate solution of higher than $99.99\%$ purity could be recovered from waste $LiCoO_{2}$, using a series of hydrometallurgical processes: sulfuric acid leaching of waste $LiCoO_{2}$- solvent extraction of Co by Na-Cyanex 271 - scrubbing of Li by sodium carbonate solution - stripping of Co by sulfuric acid solution.

• Resources Recycling
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• v.32 no.1
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• pp.33-41
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• 2023

Herein, we selectively recovered Zn and produced ZnSO₄ from electric arc furnace dust using a hydrometallurgical process. The analysis of the properties of the electric arc furnace dust revealed that the Fe content (9.9%) was relatively low while the Mn content (19%) was high as compared to the composition of general dust. Therefore, an appropriate hydrometallurgical process was designed based on the properties of the raw materials. In the leaching process involving the use of 1.6 M sulfuric acid and 20% solid-liquid ratio at 60℃ for 1 h, 85% of the Zn and Mn got dissolved while the Fe was not leached. To selectively recover Zn, a solvent extraction process using D2EHPA as the extractant was chosen, and 99% of the Zn was extracted using 0.8 M D2EHPA with 32% saponification and an O/A ratio of 2 using counter-current 3-stage extraction. Mn was entirely scrubbed with an aqueous sulfuric acid solution of pH 1.5. Finally, Zn was concentrated and stripped using 1.5 M sulfuric acid at an O/A ratio of 4 using counter-current 4-stage stripping. The stripping solution contained 40 g/L of Zn, and 99.9% of ZnSO₄∙H₂O was obtained by vacuum distillation.

• Journal of Korean Society of Environmental Engineers
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• v.35 no.1
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• pp.70-73
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• 2013

Solubility of oil contaminants in surfactant solutions plays an important role in selecting a suitable surfactant type for soil remediation. Solubility measurement procedures consist of making an equilibrium between surfactant solution and oil, solvent extraction using dichloromethane, and condensation for gas chromatography analysis. Solubility measurement requires time consumption and lots of materials. Interfacial tension is the contracting force between two immiscible liquids, surfactant solution and oil, and also closely related to solubility of oil. This study established a relationship between the interfacial tension and solubility of diesel fuel in surfactant solution and suggested a quick method to estimate solubility of oil in a surfactant solution by measuring its interfacial tension. The results of this study showed that the solubility of diesel fuel in surfactant solution was exponentially increased by decreasing the interfacial tension between two immiscible liquids. The solubility of diesel fuel was significantly increased under the interfacial tension conditions below 1 dyne/cm, while the solubility change was not apparent under the interfacial tension conditions beyond 5 dyne/cm. Interfacial tension measurements may allow us to quickly select an efficient surfactant and its concentration for soil remediation.

• Journal of Korean Society of Water and Wastewater
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• v.21 no.5
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• pp.559-569
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• 2007

The purposes of this study were to find the main foulant of membrane and the optimal chemical cleaning method for MF(microfiltration) drinking water treatment system using D dam water as water source. The MF pilot plant which can treat maximum $500m^3/d$ consisted of 3 racks and was operated for 10 months under various operation conditions. After 10 months operation, $1^{st}$ and $2^{nd}$ rack of membrane pilot plant system were cleaned chemically and the degree of the restoration of the fouled membrane in terms of the pure water flux was detemnined. Inorganic compounds which contained in chemical cleaning waste was analyzed by Inductively Coupled Plasma (ICP). One membrane module for 3rd rack was disjointed and membrane fouling materials, especially inorganic compounds were investigated by Electron Probe Microanlysis (EPMA) to elucidate the reason of TMP increase. And also, the various chemical reagents (1N HCl or $H_2SO_4$, oxalic acid as acid and 0.3% NaOCl as alkali) were tested by combination of acid and alkali to determine the optimal chemical cleaning method for the MF system using micro-modules manufactured using the disjointed module. It was verified that the inside and outside of membrane module was colorized with black. As a result of the quantitative and semi-qualitative analysis of membrane foulant by ICP, most of inorganic foulant was manganese which is hard to remove by inorganic acid such as HCI. Especially, it was observed by EPMA that Mn was attached more seriously in inside surface of membrane than in outside surface of that. It was supposed that Mn fouling in inside surface of membrane might be caused by the oxidation of soluble manganese (Mn(II)) to insoluble manganese ($MnO_2$) by chlorine containing in backwashing water. The optimal cleaning method for the removal of manganese fouling was consecutive cleaning with the mixture of 1N HCl and 1% of oxalic acid, 0.3% NaOCl, and 1N HCl showing 91% of the restoration of the fouled membrane.