• Journal of Sensor Science and Technology
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• v.1 no.1
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• pp.67-75
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• 1992

PTC thermistor has been fabricated with as-received $BaTiO_{3}$ powder and its electrical properties were investigated. The resistivity of the PTC thermistor was measured at $20^{\circ}C$ intervals from $20^{\circ}C$ to $200^{\circ}C$. The electrical characteristics of the PTC thermistor are determined by the ac complex impedance analysis. The average grain size measured with a scanning electron microscope increased from $3.8{\mu}m$ to $8.8{\mu}m$ with increasing sintering temperature between $1280^{\circ}C$ and $1400^{\circ}C$. The maximum resistivity jump was $4{\times}10^{5}$. The bulk resistivity of the thermistor sintered above $1340^{\circ}C$ decreased with increasing temperature of the measurement. The grain boundary resistance increased exponentially, the grain boundary capacitance decreased, and the built-in potential at the grain boundary increased with increasing temperature of the measurement. The charge densiy at the grain boundary increased with increasing temperature up to $110^{\circ}C$, which leveled off with further increase in measuring temperature.

• Journal of the Korean Ceramic Society
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• v.37 no.10
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• pp.968-974
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• 2000

Nb$_2$O$_{5}$와 MnO 첨가에 따른 Pb$_{0.6}$Sr$_{0.4}$TiO$_3$반도체 세라믹의 미세구조와 전기적 특성은 유전특성, I(current)-V(voltage) 측정, 그리고 복소 임피던스 측정 등을 이용하여 고찰하였다. Nb 도핑량이 0.4 mol% 이하인 경우 Nb 도핑량에 따라 전도성과 입성장은 증가되었으나 그 이상의 도핑량에서는 Sr이나 Pb 공공의 생성으로 인하여 전도성이 감소되고 입성장도 억제되는 것을 관찰할 수 있었다. 0.4 mol% Nb-doped Pb$_{0.6}$Sr$_{0.4}$TiO$_3$에 0.01 mol% MnO를 첨가한 경우 비저항비($ ho$$_{max}$/$\rho$/min/)가 $10^2$에서 $10^4$으로 크게 향상되었다. 그리고 전이 온도 주변에서 여러 개의 변곡점을 지니는 비옴성 거동이 발견되었다. 이와 같은 현상은 입계에 존재하는 Mn 이온이 부분적으로 편석되어 표면 전하의 보상 효과에 영향을 미치는 것이라고 사료된다.

• Korean Journal of Optics and Photonics
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• v.11 no.5
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• pp.323-329
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• 2000

In this study we have calculated an ideal complex refractive index of a TiN trim used in a layer of anl1reilecnon (I\R) coatmg, [air$ISiO_2ITiNIglass$] in the visible. Also we simulated the rellectance of lwo-layer AR coating by varying the thicknesses of TiN and $SiO_2$ layers, respecl1vely. The simolation results show that we can controllhe lowest reflectance and AR band of tile AR coating. The TIN fihns were fabricated by a RF magnetron sputtering apparalus. The chemical, structural and electrical properties of TiN fih11S were inveshgated by the Rutherford backscattering spech'oscopy (RBS), atomic force microscope (AFM) and 4-point probe. The optical properlies were inve,tigated by the spectrophotometer and vanable angle spectroscopic ellipsometer (VASE). The smface roughness of TiN flhns \vas $9~10\AA$. TIle resistivity of TiN films was TEX>$360~730\mu$\Omega $ cm. The ,toichlOllletry of TiN film was 1'1: O:N = I: 0.65 :0.95 and ilic oxygen wa~ found on ilie smface. With these experimental and simu]al1on resulLs, we deposited duo: two-layer AR coating, [air$ISiO_2ITiNIglass$] and the refleClance was under 0.5% ill the regIOn of 440-650 run. 0 run.