• Journal of the Korean Institute of Telematics and Electronics
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• v.24 no.3
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• pp.400-407
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• 1987

Thin film filter type 4-channel wavelength division multiplexing(WDM) device was designed and fabricated for the application in optical subscriber loop system. It has multi-mode fiber pigtails and four wavelength division consisting of 0.81, 0.89, 1.2 and 1.3 um. The evaluated performances are 1-2d B of insertion loss(connector loss excluded)and 30-35d B of crosstalk attenuation for all channels. The performance of the fabricated device was tested in the wideband optical transmission experiment, where the SNR degradation due to the crosstalk of the device was found to be within a measurement error.

• Journal of the Korean Vacuum Society
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• v.10 no.4
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• pp.431-439
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• 2001

In this paper, the a-Diamond films were synthesized using filtered vacuum arc source (FVAS), FVAS was composed of a torus structure with bending angle of 60 degree. The radius of torus was 266 mm, the radius of plasma duct was 80 mm and the total length was 600 mm. The magnet parts were composed of one permanent magnet and five solenoid magnets. The plasma duct was electrically isolated from the ground so that a bias voltage could be applied. The baffles inside plasma duct were installed in order to prevent the recoil effect of macro-particles. Cathode was made of graphite with 80 mm in diameter. The effects of solenoid magnet on plasma extraction were investigated by computer simulation and experiment using Taguchi's methode. The source and extraction magnet affected the arc stabilization. The extraction beam current was maximized with low value of the source magnet current and high value of the filtering magnet current. The beam current density was 3.2 mA/$\textrm{cm}^2$ and average deposition rate was 5 $\AA$/sec when the currents of arc discharge, source, extraction, bending, deflection and outlet magnet were 30 A, 1 A, 3 A, 5 A, 5 A, and 5 A, respectively. The beam current density and the efficiency of beam transportation were increased with the positive bias voltage of the plasma duct.