• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2007.05a
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• pp.55-59
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• 2007

Technologies of super-precision micro pattern mold machining and high-performance optical films manufacturing using thereof forms the basis of recent display industries which have developed remarkably. Especially, it is the light guide plates and high luminous intensity prism sheets at BLU or FLU in LCD and lenses at virtual keyboard's display to be manufactured by micro machining technology. One way the industry requires to do that is by developing high-performance light guide plates or films which are existing light guide plates, diffusion films and luminance enhancement prism films all in one. In this research effort, basic processing of the micro pyramid structure by shaping method is proposed. Experiments of mold machining of pitch $20{\mu}m$ tetrahedral pyramid and pitch $100{\mu}m$ trihedral pyramid using a $90^{\circ}$ diamond tool were conducted to identify a variety of machining features, such as cutting forces, conditions of the surface, shapes of chips, and influence of materials.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.533-534
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• 2006

Micro pyramid pattern and its array are designed to enhance the brightness and its uniformity of LGP which is one of key parts in LCD. The designed micro pyramid patterns are fabricated on a Si-wafer first through MEMS process and then a Ni-stamper is electro-plated from the Si pattern master. Adopting the fabricated Ni-stamper, LGPs are injection molded at different mold temperatures and the fidelity of the pattern replication is estimated for each molding conditions and pattern locations. The replicated patterns are found to have some defect such as local short shot or micro weld line which are believed to have negative effect on the performance of the LGP.

• Journal of the Korean Society for Precision Engineering
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• v.25 no.11
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• pp.45-51
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• 2008

Successive micro-scale V-grooves and a grid of pyramids were machined by elliptical vibration tufting (EVC) to investigate feasibility of using EVC as an alternative method of creating micro-molds to photo-lithography and electroforming, which have been commonly employed. An elliptical vibration grooving machine was developed which consists of two orthogonally-arranged piezoelectric actuators, a diamond cutting tool, and a motorized xyz stage. The micro-scale features were machined on materials of copper, duralumin, nickel, and hastelloy and it was found that EVC significantly reduces cutting resistance and prohibits generation of side burrs and rollover burrs, thus resulting in improving machining qualify of micro-molds in ail experimented workpiece materials.

• Korean Journal of Optics and Photonics
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• v.16 no.2
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• pp.113-120
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• 2005

Luminous efficiency and uniformity in a LCD-BLU are mainly determined by fine scattering patterns formed on the light guide panel. We propose a novel fabrication method of 3-dimensional scattered patterns based on anisotropic etching of silicon wafers. Micro-pyramid patterns with 70.5 degree apex-angle and micro-prism patterns with 109.4 degree apex-angle can be self-constructed by the wet, anisotropic etching of (100) and (110) silicon wafers, respectively, and those patterns are easily duplicated by the PDMS replica process. Experimental results on spatial and angular distributions of irradiation from the light guide panel with the micro-pyramid patterns were very consistent with the calculation results. Surface roughness of the silicon-based micro-patterns is free from any artificial defects since the micro-patterns are inherently formed with silicon crystal surfaces. Therefore, we expect that the silicon based micro-patterning process makes it possible to fabricate perfect 3-dimensional micro-structures with crystal surface and apex angles, which may guarantee mass-reproduction of the light guide panels in LCD-BLU.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.283-283
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• 2010

17~18% 대역의 고효율 결정질실리콘 태양전지를 양산하기 위하여 국내외에서 다양한 연구개발이 수행되고 있으며 국내 다결정실리콘 태양전지 양산에서도 새로운 구조와 개념에 입각한 공정기술과 관련 장비의 국산화에 집중적인 투자를 진행하고 있다. 주지하는 바와 같이, 태양전지의 광전효율은 표면에 입사되는 태양광의 반사를 제외하면 흡수된 광자에 의해 생성되는 전자-정공쌍의 상대적인 비율인 내부양자효율에 의존하게 된다. 실제 생성된 전자-정공쌍은 기판재료의 결정상태와 전기광학적 물성 등에 의해 일부가 재결합되어 2차적인 광자의 생성이나 열로서 작용하고 최종적으로 전자와 정공이 완전히 분리되고 전극에 포집되어 실질적인 유효전류로 작용한다. 16% 이상의 고효율 결정질 실리콘 태양전지 양산이 요구되고 있는 현실에서 광전효율 개선 위해 가장 우선적으로 고려되어야 할 변수는 입력 태양광스펙트럼에 대한 결정질 실리콘 표면반사율을 최소화하여 광흡수를 극대화하는 것이라 할 수 있다. 현재까지 다결정 실리콘 표면을 화학적으로 혹은 플라즈마이온으로 50-100nm 직경의 바늘형 피라미드형상으로 texturing 함으로 단파장대역에서 광반사율의 감소를 기대할 수 있기 때문에 결정질실리콘 태양전지효율 개선에 긍정적인 영향을 미치는 것으로 알려져 있다. 고효율 다결정실리콘 태양전지 양산공정에 적용하기 위해 마스크를 사용하지 않는, RIE기반 건식 저반사율 결정질실리콘 표면 texturing 패턴연구를 수행하였다. 마스크없이 표면 texturing이 완료된 시료들에 대하여 A1.5G 표준태양광스펙트럼의 300-1100nm 파장대역에서 반사율과 minority carrier들의 life time 분포를 측정하고 검토하여 공정조건을 최적화 하였다. 저반사율의 건식 결정질실리콘 표면 texturing에 가장 적합한 플라즈마파워는 100W 내외로 낮았고 $SF_6/O_2$ 혼합비율은 0.8~0.9 범위엿다. 본 연구에서 확인된 최적의 texturing을 위한 플라즈마공정 조건은 이온에 의한 Si표면원자들의 스퍼터링과 화학반응에 의한 증착이 교차하는 상태로서 확인된 최저 평균반사율은 ~14% 내외였고 p-형 결정질실리콘 표면 texturing 패턴과 minority carrier의 life time 상관는 단결정이 16uS대역에서 14uS대역으로 감소하는 반면에서 다결정은 1.6uS대역에서 1.7uS대역으로 오히려 미세한 증가를 보여 다결정 웨이퍼생산과정에서 발생하는 saw-damage 제거의 긍정적 효과와 texturing공정의 표면 결함발생에 의한 부정적 효과가 상쇄되어 큰 변화를 보이지 않는 것으로 해석된다.