• Title/Summary/Keyword: 미세광조형

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Fabrication of Microstructure Array using the Projection Microstereolithography System (전사방식 마이크로광조형을 이용한 배열 형태 미세 구조물 가공)

  • Choi, Jae-Won;Ha, Young-Myoung;Lee, Seok-Hee
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.8 s.197
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    • pp.138-143
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    • 2007
  • Microstereolithography technology is similar to the conventional stereolithography process and enables to fabricate a complex 3D microstructure. This is divided into scanning and projection type according to aiming at precision and fabrication speed. The scanning MSL fabricates each layer using position control of laser spot on the resin surface, whereas the projection MSL fabricates one layer with one exposure using a mask. In the projection MSL, DMD used to generate dynamic pattern consists of $1024{\times}768$ micromirrors which have $13.68{\mu}m$ per side. The fabrication range and resolution are determined by the field of view of the DMD and the magnification of the projection lens. If using the projection lens with high power, very fine microstructures can be fabricated. In this paper, the projection MSL system adapted to a large surface for array-type fabrication is presented. This system covers the meso range, which is defined as the intermediate range between micro and macro, with a resolution of a few ${\mu}m$. The fabrication of array-type microstructures has been demonstrated to verify the performance of implemented system.

Prediction of Cured Cross-sectional Image in Projection Microstereolithography (전사방식 마이크로광조형의 경화 단면형상 예측)

  • Kim, Sung-Hyun;Park, In-Baek;Ha, Young-Myoung;Lee, Seok-Hee
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.4
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    • pp.102-108
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    • 2010
  • Projection microstereolithography is a process of fabricating a micro-structure by using dynamic mask such as digital micromirror device(DMD). DMD shapes the beam into cross-sectional image of structure. Photocurable resin is cured by the beam and stacked layer on top of layer. It is difficult to deliver the beam from the DMD to the photocurable resin without any distortions. We assume that the beam exposed to the resin by 1 pixel of DMD has Gaussian distribution, so the shaped beam reflected by the DMD affects its neighboring area. Curing pattern corresponding to a cross-sectional images is predicted by superposition of pixels of Gaussian distribution and it is similar to cured shape.

Shape accuracy and curing characteristics of photopolymer during fabrication of three-dimensional microstructures using microstereolithography (마이크로광조형법을 이용한 미세삼차원구조물의 제조공정 중 형상정밀도 및 경화특성에 관한 연구)

  • Jung, Dae-Jun;Kim, Sung-Hoon;Jeong, Sung-Ho
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.1
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    • pp.46-50
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    • 2004
  • The curing characteristics of a liquid photopolymer during microstereolithography and the shape accuracy of thereby fabricated microstructures were investigated experimentally. A He-Cd laser with a wavelength of 442nm and a photopolymer consisted of a commercial resin from SK chemical and a photoinitiat or were used for the experiment. By varying the laser beam power and scanning speed of the focused laser beam, minimum curing thickness of 50 ${\mu}ㅡ$ was obtained. The distortion of solidified structure due to adhesion force was measured and the optimum fabrication conditions were determined. Also, the feasibility of direct fabrication of three-dimensional microstructures by Super IH process was examined.

Fabrication of Micro-channels for Wave-Micropump Using Stereolithography and UV Photolithography (광조형법과 UV 포토리소그래피를 이용한 웨이브 마이크로펌프 미세 채널 제작)

  • Loh, Byoung-Gook;Kim, Woo-Sik;Shim, Kwang-Bo
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.12
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    • pp.128-135
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    • 2007
  • Micro-channels for a wave micropump have been fabricated using the Stereolithography and UV Photolithography. The micro-channel with a channel height of $500\;{\mu}m$ was fabricated with stereolithography. UV photolithography was used for producing micro-channels with a channel length less than $100\;{\mu}m$. The fabrication process data including spinning rpm, pre-bake and post-bake time, and develop time for single layer and multiple layer 3D micro-structures using SU-8 photo resist are experimentally found. A film mask printed with a 40,000 dpi laser printer was used for UV lithography and micro-structures in the order of tens of micrometers in dimension were successfully fabricated.