• Title/Summary/Keyword: 마이크로구조 표면

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Experimental study of spreading phenomena on hydrophilic micro-textured surfaces depending on surface geometrical features (친수성 마이크로 기둥 구조 표면에서의 표면 지형적 특성에 따른 퍼짐성 현상에 대한 실험적 연구)

  • Jang, Munyoung;Park, Sehyeon;Yu, Dong In
    • Journal of the Korean Society of Visualization
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    • v.16 no.3
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    • pp.35-39
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    • 2018
  • In multiphase systems, surface wettability is one of dominant design parameters to enhance system performance. Since surface wettability can be maximized and minimized with micro-textured surfaces, therefore micro-textured surfaces are widely countered in various research and engineering fields. In this study, for better understanding of micrometer scaled surface wettability, spreading phenomena is experimentally investigated on the hydrophilic micro-textured surfaces. By photolithography and conventional dry etching method, there are prepared the surfaces with uniformly arrayed micro-pillars. The interfacial motions of a water droplet on the test sections are visualized by high speed camera in top view. On the basis of visualization data, it is analyzed the relation between dynamic coefficient and geometrical features on micro-textured surfaces.

A Study on the Surface and Manufacturing Method of Nanostructure for Amplification of Plasmonic Phenomena of Nanoparticles (나노 입자의 플라즈모닉 현상 증폭을 위한 나노구조 표면과 제작방법에 관한 연구)

  • Yi, Jae Won;Jeong, Myungyung
    • Journal of the Microelectronics and Packaging Society
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    • v.29 no.1
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    • pp.55-59
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    • 2022
  • In this paper, we compared the electric field and absorptance of nano particles in nanostructures by amplifying the electric field around the nanoparticles through plasmon resonance and comparing the structure that can increase the absorptance with the nanostructure by using the Finite Different Time Domain (FDTD) simulation. In addition, the width of the nanostructure was adjusted to 240 nm ~ 300 nm, and the light absorptance rate was higher as the gap between the particles was short. In addition, a study was conducted on the formation of nanoparticles and nanostructures on the surface through UV imprint. In order to form particles in the structure, the nano particles were first arranged in the mold used for the fabrication of the structure using spray coating, and then fabricated through UV imprinting. The nanostructure and particles were formed together by scanning electron microscopy.

Three-Dimensional Microstructures Fabricated by Multi-Step Electrochemical Aluminum-Foil Etching (알루미늄 박판의 다단 전해식각 공정을 이용한 3 차원 마이크로 구조물의 제작)

  • Kim, Yoon-Ji;Youn, Se-Chan;Han, Won;Cho, Young-Ho;Park, Ho-Joon;Chang, Byeung-Gyu;Oh, Yong-Soo
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.34 no.12
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    • pp.1805-1810
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    • 2010
  • We present a simple, cost-effective, and fast fabrication process for three-dimensional (3D) microstructures; this process is based on multi-step electrochemical etching of metal foils which facilitates the mass production of 3D microstructures. Compared to electroplating, this process maintains uniform and well-controlled material properties of the microstructure. In the experimental study, we perform single-step electrochemical etching of aluminum foils for the fabrication of 2D cantilever arrays. In the single-step etching, the depth etch rate and bias etch rate are measured as $1.50{\pm}0.10 {\mu}m/min$ and $0.77{\pm}0.03 {\mu}m/min$, respectively. Using the results of single-step etching, we perform two-step electrochemical etching for 3D microstructures with probe tips on cantilevers. The errors in height and lateral fabrication in the case of the fabricated structures are $15.5{\pm}5.8% $ and $3.3{\pm}0.9%$, respectively; the surface roughness is $37.4{\pm}9.6nm$.

A Study on Optical Characteristic of Plasmonic Nanostructure Depending on Height of Deposited Silver (플라즈모닉 구조를 위한 은 증착 두께에 따른 광 특성 해석 연구)

  • Kim, J.H.;Jeong, M.Y.
    • Journal of the Microelectronics and Packaging Society
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    • v.26 no.2
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    • pp.55-58
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    • 2019
  • Surface plasmon effect was considered importantly because of the enhancement of optical signals. It is important to detect weak optical signal in neuroscience and bio technology due to detect weaker image or signal. The height of silver can change the optical characteristic of plasmonic nano structure including transmittance and reflectance. In this paper, the optical characteristic of plasmonic nano structure were confirmed by the FDTD analysis method depending on the silver height and it was confirmed that energy was concentrated at the center of nano structure, and high far-field gain and current density in particular wavelength coule be obtained.

Synthesis of Three-Dimensional Graphene Using Porous Nickel Nanostructure (다공성 니켈 나노 구조체를 이용한 3차원 그래핀의 합성)

  • Song, Wooseok;Myung, Sung;Lee, Sun Sook;Lim, Jongsun;An, Ki-Seok
    • Composites Research
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    • v.29 no.4
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    • pp.151-155
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    • 2016
  • Graphene has been a valuable candidate for use as electrodes for supercapacitors. In order to improve the surface area of graphene, three-dimensional graphene was synthesized on porous Ni nanostructure using thermal chemical vapor deposition and microwave plasma chemical vapor deposition. The structural and chemical characterization of synthesized graphene was performed by scanning electron microscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy. It was confirmed that three-dimensional and high-crystalline multilayer graphene onto various substrates was synthesized successfully.

Textured Surface Epitaxial Base Silicon Solar Cell (Textured 표면을 갖는 에피텍셜 베이스 실리콘 태양전지)

  • 장지근;임용규;정진철
    • Journal of the Microelectronics and Packaging Society
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    • v.10 no.2
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    • pp.33-37
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    • 2003
  • The new textured surface epitaxial base(TSEB) cell as a high efficiency Si solar cell was fabricated and its eletro-optical characteristics were investigated. The fabricated device showed the open circuit voltage of 0.62 V, the short circuit current of 40 mA, the fill factor of 0.7, and the efficiency of 16% under the incident light of AM-1 100 mW/$cm^2$. The TSEB cell proposed in this paper has the structural superiority in the fabrication of high efficiency solar cell due to the carrier drift transport in the optical absorption region and the formation of back surface field by $P^-/P^+$ epitaxial base, and the low emitter series resistance by insertion of $n^+$ buried contact.

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Coplanar Waveguides with Air-Bridge Fabricated on Oxidzed Porous Silicon (OPS) Substrate using Surface Micromachining (표면 마이크로머시닝을 이용한 산화된 다공질 실리콘 기판 위에 제조된 에어브리지를 가진 Coplanar Waveguides)

  • Sim, Jun-Hwan;Park, Dong-Kook;Kang, In-Ho;Kwon, Jae-Woo;Lee, Jong-Hyun;Ye, Byeong-Duck
    • Proceedings of the KIEE Conference
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    • 2002.07c
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    • pp.2026-2028
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    • 2002
  • 본 논문에서는 실리콘 기판상의 전송선로 특성을 개선하기 위하여 표면 마이크로머시닝 기술을 이용하여 $10{\mu}m$ 두께의 다공질 실리콘 산화막으로 제조된 기판 위에 에어브리지를 가진 CPW 전송선로와 phase shifter를 제작하였다. 간격이 $30{\mu}m$, 신호선이 $80{\mu}m$인 CPW 에어브리지 전송선의 삽입손실은 4 GHz에서 -0.25 dB이며, 반사손실은 -28.9 dB를 나타내었다. CPW phase shifter의 크기는 S-W-$S_g$ = 100-30-400 ${\mu}m$로 설계되었다. "ㄷ" 모양을 가진 에어브리지의 폭은 $100{\mu}m$. 길이는 400-460-400 ${\mu}m$이다. 낮은 손실을 얻기 위한 Step된 에어브리지를 가진 phase shifter 구조가 step이 없는 에어브리지를 가진 구조보다 삽입손실이 보다 더 향상되었다. 제작된 CPW phase shifter의 위상특성은 28 GHz의 넓은 주파수 범위에서 $180^{\circ}E 의 천이를 타나내었다. 이상과 같은 결과로부터 두꺼운 다공질 실리콘은 고 저항 실리콘 집적회로 공정에서 고성능 저가의 마이크로파 및 밀리미터파 회로 응용에 충분히 활용 될 수 있으리라 기대된다.

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실리콘 나노와이어의 산소 흡착 표면 처리를 통한 초소수성 구현

  • Seo, Jeong-Mok;Lee, Tae-Yun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.05a
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    • pp.36.2-36.2
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    • 2011
  • 최근 나노기술의 비약적인 발전을 바탕으로 그 동안 구현이 쉽지 않았던 마이크로-나노 단위의 생체모사(biomimetics) 기술이 큰 각광을 받고 있다. 그 중에서도 특히 연잎 효과(lotus-effect)로 대표되는 접촉각 $150^{\circ}$ 이상의 초소수성(superhydrophobicity) 표면 구현은 생물, 화학, 물질 등의 다양한 분야에 있어 큰 사용가치를 가지기 때문에 연구가 전세계적으로 활발히 진행되고 있다. 초소수성을 가지는 표면을 구현하기 위해서는 표면의 화학적인 조성을 변화시켜 표면의 거칠기를 증대시키는 방법과 표면에너지를 낮추는 방법으로 구분될 수 있으며, 이를 위해 표면에 나노구조체를 형성시켜 표면 거칠기를 증대시키는 방법과 silane 계열의 자가-형성 단일막(Self-assembled monolayer)을 코팅하여 표면에너지를 낮추는 방법이 사용되어 왔다. 그러나 표면에 나노구조체를 형성시키는 과정에서 비싼 공정 비용이 발생하며, 대면적 구현이 쉽지 않다는 단점이 있으며, silane 계열의 자가-형성 단일막의 경우에는 제거가 쉽지 않아 추후 다양한 소자에의 적용이 어렵다는 단점을 가지고 있다. 본 연구에서는 무전해 식각법(Aqueous Electroless Etching)을 이용하여 대면적으로 합성시킨 실리콘 나노와이어의 표면 산소 흡착 처리를 통해 $156^{\circ}$ 이상의 초소수성 표면을 구현하였다. 액상 기반으로 형성된 실리콘 나노와이어의 표면은 열처리 공정을 통해 OH-기에서 O-기로 치환되어 낮은 표면에너지를 가지게 되며, 낮아진 표면에너지와 산화과정에서 증대된 표면 거칠기를 통해 Wenzel-state의 초소수성 표면 성질을 보였다. 변화된 나노와이어의 표면 거칠기는 주사전자현미경 (FE-SEM)과 주사투과현미경 (HR-TEM)을 통해 관찰되었다. 또한, 나노와이어의 길이와 열처리 공정 조건에 따라 나노와이어의 표면을 접촉각 $0^{\circ}$의 초친수성(superhydrophilicity) 특성부터 접촉각 $150^{\circ}$ 이상의 초소수성 특성까지 변화시킬 수 있었으며, 나노와이어의 길이에 따라 표면 난반사율을 조절하여 90% 이상의 매우 높은 흡수율을 가지는 나노와이어 표면을 구현할 수 있었다. 이러한 산소 흡착법을 이용한 초소수성 표면 구현은 기존 자가-형성 단일막 코팅을 이용한 방법에 비해 소자 제작 및 활용에 있어 매우 유리하며, 바이오칩, 수광소자 등의 다양한 응용 분야에 적용 가능할 것으로 예상된다.

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Fabrication of SOI Structures with Buried Cavities for Microsystems SDB and Electrochemical Etch-stop (SDB와 전기화학적 식각정지에 의한 마이크로 시스템용 매몰 공동을 갖는 SOI 구조의 제조)

  • Chung, Gwiy-Sang;Kang, Kyung-Doo;Choi, Sung-Kyu
    • Journal of Sensor Science and Technology
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    • v.11 no.1
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    • pp.54-59
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    • 2002
  • This paper describes a new process technique for batch process of SOI(Si-on-Insulator) structures with buried cavities for MEMS(Micro Electro Mechanical System) applications by SDB(Si-wafer Direct Bonding) technology and electrochemical etch-stop. A low-cost electrochemical etch-stop method is used to control accurately the thickness of SOI. The cavities were made on the upper handling wafer by Si anisotropic etching. Two wafers are bonded with an intermediate insulating oxide layer. After high-temperature annealing($1000^{\circ}C$, 60 min), the SDB SOI structure with buried cavities was thinned by electrochemical etch-stop. The surface of the fabricated SDB SOI structure have more roughness that of lapping and polishing by mechanical method. This SDB SOI structure with buried cavities will provide a powerful and versatile substrate for novel microsensors arid microactuators.