• Journal of the Korean Society of Manufacturing Process Engineers
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• v.12 no.5
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• pp.16-22
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• 2013

A two-dimensional photonic crystal structure was investigated using a roll-to-roll nanoreplication and physical vapor deposition processes for the inexpensive enhanced fluorescence substrate which is not sensitive to the polarization directions of excitation light source. An 8 inch silicon master having nano dot array with a diameter of 200 nm, a height of 100 nm and a pitch of 400 nm was prepared by KrF laser scanning lithography and reactive ion etching processes. A flexible polymer mold was fabricated by flat type UV replication process and a deposition of 10 nm nickel layer as an anti-adhesion layer. A roll mold was prepared by warping the flexible polymer mold on an aluminum roll base and a roll-to-roll UV replication process was carried out using the roll mold. After the deposition of ~ 100 nm $TiO_2$ layer on the replicated nano dot array, a 2 dimensional photonic crystal structure was realized with a resonance wavelength of 635 nm for both p- and s-polarized light sources.

• Proceedings of the KAIS Fall Conference
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• 2011.12b
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• pp.646-648
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• 2011

본 논문에서는 쌍롤 박판주조(Twin Roll Casting, TRC)법을 이용하여 AA4343 합금을 제작하였다. 주조시 롤 간격을 조절하여 냉각속도를 달리하였으며 인고트 주조(Ingot Casting, IC)법을 이용하여 제조된 합금과의 미세조직학적 차이와 이에 따른 물성 변화를 고찰하였다. TRC 및 IC로 제조된 합금을 냉간압연하였으며 압연 건전성을 평가하였다. 한편, 냉각속도별로 상이한 미세조직을 구현할 수 있는 스텝몰드(Step Mold Casting, SMC)법을 이용하여 제조된 합금의 냉각속도에 따른 미세조직 및 경도 차이를 조사하여 상대 비교하였다. 냉각속도가 빠를수록 주조 셀조직의 크기 및 공정 Si 입자의 크기가 감소하였으며 이로 인하여 경도가 증가되는 효과를 나타내었다. 주조시 생성된 공정 Si 입자의 크기는 압연에 의하여 그 크기의 변화가 거의 없었으며 열분석 결과 액상선 온도의 변화가 일부 발생하나 큰 차이가 없었다.

• Journal of the Microelectronics and Packaging Society
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• v.22 no.4
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• pp.25-29
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• 2015

Demand for a low-cost, high-throughput, and high-resolution patterning method for fabricating devices continues to increase. The roll-to-roll (R2R) imprint lithography technique has received a great deal of attention as a means of fabricating next-generation devices. In this paper, we propose a fabrication method for polymeric planar lightwave circuit (PLC) devices that uses R2R imprint lithography. The proposed technique uses an elastomeric polydimethylsiloxane (PDMS) mold. A Si wafer with micro patterns is used as the Si master. The PDMS mold is then replicated from the Si master. By applying a precise web tension and at a given web speed, we fabricated a micro-patterned PLC device. The insertion losses were 4.0 dB for a $1{\times}2$ optical splitter. As such, the proposed method of fabricating a PLC device by the R2R process was shown to be an effective solution.