• Journal of the Korea Society for Simulation
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• v.16 no.2
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• pp.37-44
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• 2007

EWMA is one of the most popular controller method used in Run-to-Run control system for semiconductor manufacturing. The value of the control parameter in EWMA has major effect on the result. Therefore, it is important to use control parameter value fitting for the process state. When the process is unstable, it is more efficient to change EWMA control parameter dynamically to compensate for the changing process state than using fixed control parameter. In this paper, we review previous studies using dynamic EWMA control parameter and propose a new algorithm complementing the weaknesses of the previous studies. The performance of the proposed algorithm is validated using simulation.