• Title/Summary/Keyword: 나노선

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GaAs/AlGaAs 양자점구조에서 표면전기장에 관한연구

  • Kim, Jong-Su;Jo, Hyeon-Jun;Kim, Jeong-Hwa;Bae, In-Ho;Kim, Jin-Su;Kim, Jun-O;No, Sam-Gyu;Lee, Sang-Jun;Im, Jae-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.158-158
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    • 2010
  • 본 연구에서는 분자선 박막성장 장비를 (MBE) 이용하여 droplet epitaxy 방법으로 성장시킨 GaAs/AlGaAs 양자점구조의 표면전기장변화에 관하여 photoreflectance spectroscopy (PR)를 이용하였다. 본 실험에 사용된 GaAs/AlGaAs 양자점 구조는 undoped-GaAs (001) 기판을 위에 성장온도 $580^{\circ}C$에서 GaAs buffer layer를 100 nm 성장 후 장벽층으로 AlGaAs을 100 nm 성장하였다. AlGaAs 장벽층을 성장한 후 기판온도를 $300^{\circ}C$로 설정하여 Ga을 3.75 원자층를 (ML) 조사하여 Ga drop을 형성하였다. Ga drop을 GaAs 나노구조로 결정화시키기 위하여 $As_4$를 beam equivalent pressure (BEP) 기준으로 $1{\times}10^{-4}$ Torr로 기판온도 $150^{\circ}C$에서 조사하였다. 결정화 직후 RHEED로 육각구조의 회절 페턴을 관측하여 결정화를 확인하였다. GaAs 나노 구조를 성장한 후 AlGaAs 장벽층을 성장하기위해 10 nm AlGaAs layer는 MEE 방법을 이용하여 $150^{\circ}C$에서 저온 성장 하였으며, 저온성장 후 기판온도를 $580^{\circ}C$로 설정하여 80 nm의 AlGaAs 층을 성장하고 최종적으로 GaAs 10 nm를 capping layer로 성장하였다. 저온성장 과정에서의 결정성의 저하를 보상하기위하여 MBE 챔버내에서 $650^{\circ}C$에서 열처리를 수행하였다. GaAs/AlGaAs 양자점의 광학적 특성은 photoluminescence를 이용하여 평가 하였으며 780 nm 근처에서 발광을 보여 주었다. 특히 PR 실험으로부터 시료의 전기장에 의한 Franz-Keldysh oscillation (FKO)의 변화를 관측하여 GaAs/AlGaAs 양자점의 존재에 의한 시료의 표면에 형성되는 표면전기장을 측정하였다. 또한 시료에 형성된 전기장의 세기를 계산하기위해 PR 신호로부터 fast Fourier transformation (FFT)을 이용하였다. 특히 온도의 존성실험을 통하여 표면전기장의 변화를 관측 하였으며 양자구속효과와 관련성에 대하여 고찰 하였다.

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ZnO Nanowires and P3HT Polymer Composite TFT Device (ZnO 나노선과 P3HT 폴리머를 이용한 유/무기 복합체 TFT 소자)

  • Moon, Kyeong-Ju;Choi, Ji-Hyuk;Kar, Jyoti Prakash;Myoung, Jae-Min
    • Korean Journal of Materials Research
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    • v.19 no.1
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    • pp.33-36
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    • 2009
  • Inorganic-organic composite thin-film-transistors (TFTs) of ZnO nanowire/Poly(3-hexylthiophene) (P3HT) were investigated by changing the nanowire densities inside the composites. Crystalline ZnO nanowires were synthesized via an aqueous solution method at a low temperature, and the nanowire densities inside the composites were controlled by changing the ultrasonifiaction time. The channel layers were prepared with composites by spin-coating at 2000 rpm, which was followed by annealing in a vacuum at $100^{\circ}C$ for 10 hours. Au/inorganic-organic composite layer/$SiO_2$ structures were fabricated and the mobility, $I_{on}/I_{off}$ ratio, and threshold voltage were then measured to analyze the electrical characteristics of the channel layer. Compared with a P3HT TFT, the electrical properties of TFT were found to be improved after increasing the nanowire density inside the composites. The mobility of the P3HT TFT was approximately $10^{-4}cm^2/V{\cdot}s$. However, the mobility of the ZnO nanowire/P3HT composite TFT was increased by two orders compared to that of the P3HT TFT. In terms of the $I_{on}/I_{off}$ ratio, the composite device showed a two-fold increase compared to that of the P3HT TFT.

Shubnikov-de Haas Oscillations in an Individual Single-Crystalline Semimetal Bismuth Nanowire (단결정 반금속 비스무스 단일 나노선의 Shubnikov-de Haas 진동)

  • Kim, Jeong-Min;Ham, Jin-Hee;Shim, Woo-Young;Lee, Kyoung-Il;Jeon, Kye-Jin;Jeung, Won-Young;Lee, Woo Young
    • Korean Journal of Materials Research
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    • v.18 no.2
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    • pp.103-106
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    • 2008
  • The magneto-transport properties of an individual single crystalline Bi nanowire grown by a spontaneous growth method are reported. A four-terminal device based on an individual 400-nm-diameter nanowire was successfully fabricated using a plasma etching technique that removed an oxide layer that had formed on the surface of the nanowire. Large transverse ordinary magnetoresistance (1401%) and negative longitudinal ordinary magnetoresistance (-38%) were measured at 2 K. It was observed that the period of Shubnikov-de Haas oscillations in transverse geometry was $0.074^{T-1}$, $0.16^{T-1}$ and $0.77^{T-1}$, which is in good agreement with those of bulk Bi. However, it was found that the period of SdH oscillation in longitudinal geometry is $0.24^{T-1}$, which is larger than the value of $0.16^{T-1}$ reported for bulk Bi. The deviation is attributable to the spatial confinement arising from scattering at the nanowire surface boundary.

Investigation of Rheological Properties of Lecithin/D-sorbitol/Water Mixtures (레시틴/디솔비톨/물 혼합물의 유변학적 성질 연구)

  • Eun-Ae Chu;Na-Hyeon Kim;Min-Seok Kang;Yeong-Min Lee;Hee-Young Lee
    • Applied Chemistry for Engineering
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    • v.34 no.3
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    • pp.247-251
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    • 2023
  • Lecithin can self-assemble into reverse spherical micelles in organic solvents due to its amphiphilic properties. With additives such as D-sorbitol and water, the reverse spherical micelles are transformed into reverse cylindrical micelles by the morphology change of lecithin molecules. In this study, the rheological properties of lecithin/D-sorbitol/water mixtures were investigated. In addition, the small angle X-ray scattering (SAXS) technique was used to examine the shape and size of the formed nanostructures related to their rheological properties. Such mixtures are expected to be used in drug delivery and oleogels because of their high viscosity and viscoelastic behavior.

Research Trend of High Aspect Ratio Contact Etching used in Semiconductor Memory Device Manufacturing (반도체 메모리 소자 제조에서 High Aspect Ratio Contact 식각 연구 동향)

  • Hyun-Woo Tak;Myeong-Ho Park;Jun-Soo Lee;Chan-Hyuk Choi;Bong-Sun Kim;Jun-Ki Jang;Eun-Koo Kim;Dong-Woo Kim;Geun-Young Yeom
    • Journal of the Korean institute of surface engineering
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    • v.57 no.3
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    • pp.165-178
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    • 2024
  • In semiconductor memory device manufacturing, the capability for high aspect ratio contact (HARC) etching determines the density of memory device. Given that there is no standardized definition of "high" in high aspect ratio, it is crucial to continuously monitor recent technology trends to address technological gaps. Not only semiconductor memory manufacturing companies such as Samsung Electronics, SK Hynix, and Micron but also semiconductor manufacturing equipment companies such as Lam Research, Applied Materials, Tokyo Electron, and SEMES release annual reports on HARC etching technology. Although there is a gap in technological focus between semiconductor mass production environments and various research institutes, the results from these institutes significantly contribute by demonstrating fundamental mechanisms with empirical evidence, often in collaboration with industry researchers. This paper reviews recent studies on HARC etching and the study of dielectric etching in various technologies.

Synthesis, Characterization and Antibacterial Activity of Silver Nanoparticles in Poly(vinyl alcohol) Prepared by Gamma-Ray Irradiation (감마선에 의해 제조된 Poly(vinyl alcohol) 하이드로젤에서 Silver Nanoparticle의 제조 및 항균 특성)

  • Kim, Hyun-A;Park, Jong-Seok;Choi, Jong-Bae;Lim, Youn-Mook;Nho, Young-Chang
    • Polymer(Korea)
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    • v.36 no.1
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    • pp.71-75
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    • 2012
  • In this study, silver nanoparticles (AgNPs) have been prepared by using aqueous $AgNO_3$ solution in the poly(vinyl alcohol) (PVA) hydrogels. PVA powders were dissolved in deionized water, and then irradiated by gamma-ray with a radiation dose of 50 kGy to make hydrogels. PVA hydrogels were dipped into 0.01 and 0.05 M $AgNO_3$ solution for 1 h respectively. After that, the swollen hydrogels were irradiated by gamma-ray at various doses to form AgNPs. UV-vis analysis indicated that the concentration of Ag NPs was enhanced by increasing absorbed dose and the concentration of $AgNO_3$. FE-SEM measurements provided further evidence for the successful formation of Ag NPs in PVA hydrogels. Also, the antibacterial effect of PVA hydrogels stabilized AgNPs against Gram-negative bacteria (S.aureus and E.coli) in liquid as well as on solid growth media has been investigated. The AgNPs consolidated in PVA hydrogel networks have an excellent antibacterial effect.

Conversion of DME to Light Olefins over Mesoporous SAPO-34 Catalyst Prepared by Carbon Nanotube Template (탄소 나노튜브 주형물질에 의해 제조된 메조 세공 SAPO-34 촉매상에서 경질 올레핀으로의 DME 전환 반응)

  • Kang, Eun-Jee;Lee, Dong-Hee;Kim, Hyo-Sub;Choi, Ki-Hwan;Park, Chu-Sik;Kim, Young-Ho
    • Applied Chemistry for Engineering
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    • v.25 no.1
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    • pp.34-40
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    • 2014
  • Mesoporous SAPO-34 catalyst was successfully synthesized by the hydrothermal method using carbon nanotube (CNT) as a secondary template. The effects of CNT contents (0.5, 1.5, 2.5, and 4.5 mol%) on catalytic performances were investigated. The synthesized catalysts were characterized with XRD, SEM, nitrogen physisorption isotherm and $NH_3$-TPD. Among the synthesized catalysts, SAPO-34 catalyst prepared by the addition of 1.5 mol% CNT (1.5C-SAPO-34) observed not only the largest amounts of mesopore volume but also acid sites. However, the mesopore volume was relatively decreased by further increasing of CNT contents due to the formation of small crystalline. The catalytic lifetime and the selectivity of light olefins ($C_2{\sim}C_4$) were examined for the dimethyl ether to olefins reaction. As a result, the 1.5C-SAPO-34 catalyst showed an improvement of ca. 36% in a catalytic lifetime and a better selectivity to light olefins as compared with the general SAPO-34 catalyst.

Study of Organic-inorganic Hybrid Dielectric for the use of Redistribution Layers in Fan-out Wafer Level Packaging (팬 아웃 웨이퍼 레벨 패키징 재배선 적용을 위한 유무기 하이브리드 유전체 연구)

  • Song, Changmin;Kim, Sarah Eunkyung
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.4
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    • pp.53-58
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    • 2018
  • Since the scaling-down of IC devices has been reached to their physical limitations, several innovative packaging technologies such as 3D packaging, embedded packaging, and fan-out wafer level packaging (FOWLP) are actively studied. In this study the fabrication of organic-inorganic dielectric material was evaluated for the use of multi-structured redistribution layers (RDL) in FOWLP. Compared to current organic dielectrics such as PI or PBO an organic-inorganic hybrid dielectric called polysilsesquioxane (PSSQ) can improve mechanical, thermal, and electrical stabilities. polysilsesquioxane has also an excellent advantage of simultaneous curing and patterning through UV exposure. The polysilsesquioxane samples were fabricated by spin-coating on 6-inch Si wafer followed by pre-baking and UV exposure. With the 10 minutes of UV exposure polysilsesquioxane was fully cured and showed $2{\mu}m$ line-pattern formation. And the dielectric constant of cured polysilsesquioxane dielectrics was ranged from 2.0 to 2.4. It has been demonstrated that polysilsesquioxane dielectric can be patterned and cured by UV exposure alone without a high temperature curing process.

COMPARISON OF POLYMERIZATION SHRINKAGE AND STRAIN STRESS OF SEVERAL COMPOSITE RESINS USING STRAIN GUAGE (스트레인 게이지를 이용한 수종의 복합레진의 중합수축 및 수축응력의 비교)

  • Kim, Young-Kwang;Yoo, Seung-Hoon;Kim, Jong-Soo
    • Journal of the korean academy of Pediatric Dentistry
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    • v.31 no.3
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    • pp.516-526
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    • 2004
  • Polymerization shrinkage of photoinitiation type composite resin cause several clinical problems. The purpose of this study was to evaluate the shrinkage strain stress, linear polymerization shrinkage, compressive strength and microhardness of recently developed composite resins. The composite resins were divided into four groups according to the contents of matrix and filler type. Group I : $Denfil^{TM}$(Vericom, Korea) with conventional matrix, Group II : $Charmfil^{(R)}$(Dentkist, Korea) with microfiller and nanofller mixture, Group III : $Filtek^{TM}$ Z250(3M-ESPE, USA) TEGDMA replaced by UDMA and Bis-EMA(6) in the matrix, and Group IV : $Filtek^{TM}$ Supreme(3M-ESPE, USA) using pure nanofiller. Preparation of acrylic molds were followed by filling and curing with light gun. Strain gauges were attached to each sample and the leads were connected to a strainmeter. With strainmeter shrinkage strain stress and linear polymerization shrinkage was measured for 10 minutes. The data detected at 1 minute and 10 minutes were analysed statistically with ONE-way ANOVA test. To evaluate the mechanical properties of tested materials, compressive hardness test and microhardness test were also rendered. The results can be summarized as follows : 1. Filling materials in acrylic molds showed initial temporary expansion in the early phase of polymerization. This was followed by contraction with the rapid increase in strain stress during the first 1 minute and gradually decreased during post-gel shrinkage phase. After 1 minute, there's no statistical differences of strain stress between groups. The highest strain stress was found in group IV and followed by group III, I, II at 10 minutes-measurement(p>.05). In regression analysis of strain stress, group III showed minimal inclination and followed by group II, I, IV during 1 minute. 2. In linear polymerization shrinkage test, the composite resins in every group showed initial increase of shrinkage velocity during the first 1 minute, followed by gradually decrease of shrinkage velocity. After 1 minute, group IV and group III showed statistical difference(p<.05). After 10 minutes, there were statistical differences between group IV and group I, III(p<.05) and between group II and group III(p<.05). In regression analysis of linear polymerization shrinkage, group II showed minimal inclination and followed by group IV, III, I during 1 minute. 3. In compressive strength test, group III showed the highest strength and followed by group II, IV, I. There were statistical differences between group III and group IV, I(p<.05). 4. In microhardness test, upper surfaces showed higher value than lower surfaces in every group(p<.05).

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Reconstruction Change of Si(5 5 12) Induced by Selective Bi Adsorption (Bi의 선택적 흡착으로 유도된 Si(5 5 12) 표면의 재구조변화)

  • Cho Sang-Hee;Seo Jae-M.
    • Journal of the Korean Vacuum Society
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    • v.15 no.2
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    • pp.152-161
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    • 2006
  • In order to test the capacity of Si(5 5 12) as a potential template for nanowire fabrication, Bi/Si(5 5 12) system has been studied by STM. With Bi deposition, Si(5 5 12) has been transformed to Si(3 3 7) terrace. Initially Bi atoms selectively replace Si-dimers and Si-adatoms with Bi-dimers and Bi-adatoms, respectively. With extended Bi adsorption, Bi-dimers adsorb on the pre-adsorbed Bi-dimers and Bi-atoms. These dimers in the second layer form Bi-dimer pairs having relatively stable $p^3$ bonding, Finally, the Bi-dimer adsorbs on the Bi-dimers in the second layer and saturates. It can be deduced that both surface transformation to (3 3 7) and site-selective Bi adsorption are possible due to substrate-strain relaxation through inserting Bi atoms into subsurface of Si substrate.