• Title/Summary/Keyword: 극저주파자기장

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Study on Standardization of the Environmental Impact Evaluation Method of Extremely Low Frequency Magnetic Fields near High Voltage Overhead Transmission Lines (고압 가공송전선로의 극저주파자기장 환경영향평가 방법 표준화에 관한 연구)

  • Park, Sung-Ae;Jung, Joonsig;Choi, Taebong;Jeong, Minjoo;Kim, Bu-Kyung;Lee, Jongchun
    • Journal of Environmental Impact Assessment
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    • v.27 no.6
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    • pp.658-673
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    • 2018
  • Social conflicts with extremely low frequency magnetic field(ELF-MF) exposures are expected to exacerbate due to continued increase in electric power demand and construction of high voltage transmission lines(HVTL). However, in current environmental impact assessment(EIA) act, specific guidelines have not been included concretely about EIA of ELF-MF. Therefore, this study conducted a standardization study on EIA method through case analysis, field measurement, and expert consultation of the EIA for the ELF-MF near HVTL which is the main cause of exposures. The status of the EIA of the ELF-MF and the problem to be improved are derived and the EIA method which can solve it is suggested. The main contents of the study is that the physical characteristics of the ELF-MF affected by distance and powerload should be considered at all stages of EIA(survey of the current situation - Prediction of the impacts - preparation of mitigation plan ? post EIA planning). Based on this study, we also suggested the 'Measurement method for extremely low frequency magnetic field on transmission line' and 'Table for extremely low frequency magnetic field measurement record on transmission line'. The results of this study can be applied to the EIA that minimizes the damage and conflict to the construction of transmission line and derives rational measures at the present time when the human hazard to long term exposure of the ELF-MF is unclear.

A Study on the Extremely Low Frequency Magnetic Fields Exposure Characteristics of Workers in LCD Manufacturing Process (LCD 제조공정 종사근로자의 극저주파자기장 노출특성 연구)

  • Kim, JoonBeom;Kang, Joon Hyuk;Chung, Eun-Kyo;Jung, Kihyo
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.32 no.1
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    • pp.10-20
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    • 2022
  • Objectives: The aim of this study is to evaluate exposure levels of the extremely low frequency magnetic fields(ELF-MF) radiated from various electric facilities in Liquid Crystal Display(LCD) manufacturing processes. Methods: This study measured the exposure levels of personal and local ELF-MF for the electronic facilities installed in two LCD manufacturing companies. Samplers were installed around workers' waist during working hours to identify personal exposure levels, and direct reading equipment were located at 3 cm, 10 cm, and 30 cm away from the surface of the electronic facilities to measure local exposure levels. Average and maximum(ceiling) values were calculated for personal and local exposure levels. Results: Average and maximum of personal exposure levels for each worker were 0.56(mean) ± 0.02(SE) µT and 6.31 ± 0.75 µT, respectively. Statistical analyses of the study found that maximum of the personal exposure levels for engineers was significantly higher than that for operators since engineers spend more time near the electronic facilities for repairing. The range of maximum personal exposure levels was 0.50 ~ 43.50 µT and its highest level was equivalent to 4.35 % of ACGIH(American Conference of Governmental Industrial Hygienists) exposure limit value(1 mT). Maximum of local exposure levels was 8.18 ± 0.52 µT and the electronic facilities with higher exposure levels were roof rail and electric panel, which were not related to direct manufacturing. The range of maximum local exposure levels was 0.60 ~ 287.20 µT and its highest level was equivalent to 28.7 % of the ACGIH exposure limit value. Lastly, the local exposure levels significantly decreased as the measurement distance from the electronic facilities increased. Conclusions: Maximum of personal and local exposure levels did not exceed the exposure limit value of ACGIH. However, it is recommended to keep the workers as far as possible from the sources of ELF-MF.