• Journal of the Korean Magnetics Society
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• v.12 no.6
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• pp.201-205
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• 2002

The tunneling magnetoresistance (TMR) of a ramp-edge type junction has been studied. The samples with a structure of NiO(60)/Co(10)/NiO(60)/Si$_3$N$_4$(2-6)/NiFe(10) (nm) were prepared by the sputtering and etched by the electron cyclotron (ECR) argon ion milling. Nonlinear I-V characteristics was obtained from a ramp-type tunneling junctions having the dominant difference between zero and ＋90 Oe perpendicular to the junction edge line. The voltage dependence of TMR was stable up to a bias volt of $\pm$10 V with a TMR ratio of about -10%, which may be very peculiar magnetic tunneling properties with asymmetric tunneling process between wedge Co pinned layer and NiFe free layer.

• Proceedings of the Korean Magnestics Society Conference
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• 2001.10a
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• pp.72-73
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• 2001

• Proceedings of the Korean Magnestics Society Conference
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• 2002.04a
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• pp.42-43
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• 2002

• Proceedings of the Korean Magnestics Society Conference
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• 2002.12a
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• pp.174-175
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• 2002

A ramp-type tunneling magnetoresistance (TMR) junction having structure NiO(60 nm)/pinned Co(10 nm)MiO(60 nm)/barrier SrTiO$_3$(2-10 nm)/free NiFe(10 nm) with the 15 degree slope was investigated. We obtained nonlinear I(V) characteristics for ramp-type tunneling junctions that have distinctive difference with and without applied magnetic field. In the barrier SrTiO$_3$ thickness of 4 nm, the TMR was about 52% at a bias voltage of 50 mV. (omitted)

• Progress in Superconductivity
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• v.3 no.1
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• pp.83-86
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• 2001

We have fabricated a single flux quantum 4-stage shift register with interface-controlled $Y_1$$Ba_2$$Cu_3$$O_{7-x}$(YBCO) Josephson junction. The YBCO Josephson junctions showed RSJ-like current-voltage(I-V) curves at temperatures 45~80K. We tested load and shift operation of shift register with binary data sequences “1000”, “1010”, “1011”, and “1111” at 58K. For all the binary data sequences, the shift register operated successfully. By operating the circuit with proper current pulses, we observed no errors during at least 12 hours operation for all the data sequences.s.

• 한국초전도학회:학술대회논문집
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• v.9
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• pp.63-66
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• 1999

We fabricated ramp-edge Josephson junctions with barriers formed by interface treatments instead of epitaxially grown barrier layers. Low-dielectric Sr$_2AITaO_6$(SAT) layer was used as an ion-milling mask as well as an insulating layer for the ramp-edge junctions. An ion-milled YBa$_2Cu_3O_{7-x}$ (YBCO)-edge surface was not exposed to solvent through all fabrication procedures. The barriers were produced by structural modification at the bottom YBCO edge using plasma treatment prior to deposition of the top YBCO electrode. We investigated the effects of pre-annealing and post-annealing on the characteristics of the interface-treated Josephson junctions. The junction parameters were improved by using in-situ RF plasma cleaning treatment.