• Proceedings of the KIPE Conference
• /
• 2001.07a
• /
• pp.576-579
• /
• 2001

In this paper, the development of the LF power supply for dry scrubber is discussed. 1500kW, 100kHz LF power supply is designed and tested. The main power stage is used for the FB PWM inverter with an LC filter in the secondary circuit. The operation characteristics of LF power supply are verified by simulation and experimental results.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2012.05a
• /
• pp.193-194
• /
• 2012

레이저클리닝이란 레이저빔을 표면에 조사하여 오염 물질을 제거하는 공정 기술로서 건식 세정방식이다. 본 연구에서는 레이저클리닝을 금속문화재에 코팅된 아크릴수지에 적용하여 제거 가능성 및 표면 특성을 조사하였다. 실험 결과 소지금속에 손상을 주지 않으면서 아크릴수지를 제거하는 레이저 조건을 확인하였으나 청동유물에 적용한 결과 아크릴수지와 파티나 층이 함께 제거되는 레이저클리닝의 문제점도 확인할 수 있었다. 앞으로 다양한 레이저 시스템 및 파장별 실험을 진행하여 청동 파티나층의 제거 가능성을 검토하면 레이저 클리닝을 청동 문화재에 적용하는데 도움이 될 것으로 본다.

• Journal of the Institute of Electronics Engineers of Korea SD
• /
• v.44 no.11
• /
• pp.15-19
• /
• 2007

This paper reports the effects of Ar ion beam surface treatment on a $SiO_2$ dielectric layer in organic thin film transistors. We compared the electrical properties of pentacene-based OTFTs, treated by $O_2$ plasma or Ar ion beam treatments and characterized the states of the surface of the dielectric by using atomic force microscopy and X-ray photoelectron spectroscopy. For the sample which received $O_2$ plasma treatment, the mobility increased significantly but the on/off current ratio was found very low. The Ar ion beam-treated sample showed a very high on/off current ratio as well as a moderately improved mobility. XPS data taken from the dielectric surfaces after each of treatments exhibit that the ratio of between Si-O bonds and O-Si-O bonds was much higher in the $O_2$ plasma treated surface than in the Ar ion beam treated surface. We believe that our surface treatment using an inert gas, Ar, carried out an effective surface cleaning while keeping surface damage very low, and also the improved device performances was achieved as a consequence of improved surface condition.

• Journal of Conservation Science
• /
• v.18 s.18
• /
• pp.63-74
• /
• 2006

All rock materials of the three storied stone pagoda in Seoakri were composed of light gray alkali granite with medium grained and developed with small mialolitic cavities. This stone pagoda is preserving almost archetype except the head part because there was repair work already. But, foundation, basement and roof rocks are serious state by microbial invasion such as lichens. Because there are tree and grass that cause direct effect to stone pagoda surrounding. Therefore, conservation treatment executed the primary dry cleaning and secondary wet cleaning treatment. Stone surface is partly not removed well such as lichens which part removed using cleansing device that use high temperature steam. Some treated part concrete and epoxy resin remove and retreatment with mixing talc and alkali granite powder to epoxy resin. Did color matching at mixing process of epoxy resin and fillers to properties with set the feel of a material. Also, drainage ditched to minimize inflow of rainwater fall from slope that is on the east of stone pagoda, tree and grass in stone pagoda surrounding wished to do remove and control occurrence of lichens hereafter minimizing moisture conteats.

• Transactions of the Korean Society of Mechanical Engineers B
• /
• v.22 no.8
• /
• pp.1111-1120
• /
• 1998

Spray Drying Absorber(SDA) system, where the combustion product gas is mixed with atomized limestone-slurry droplets and then the chemical reaction of $SO_2$ with alkaline components of the liquid droplets forms sulfates, has been widely used to eliminate $SO_2$ gas from coal fired power plants and waste incinerators. Liquid atomization is necessary because it can maximize the reaction efficiency by increasing the total surface area and dispersion angle of the alkaline components. First, numerical calculations using FLUENT are carried out to investigate $SO_2$ concentration distribution and thus to calculate $SO_2$ removal efficiency. So to attain the optimized spray conditions, then an electrostatic spraying system is set up and spray visualization is performed to show the effect of an electric field on overall droplet size. Next, the effect of an electric field on the concentrations of $SO_2$ is experimentally examined. Field strength is varied from -10 kV to 10 kV and configurations of conduction charging and induction charging are utilized. Consequently, the electrostatic removal efficiency of 501 increases about 30% with the applied voltage of ${\pm}10kV$ but is independent of polarity of the applied voltage. It Is also found that the conduction charging configuration results in higher efficiency of $SO_2$ removal that the induction charging configuration. Finally, the effect of slurry temperature on $SO_2$ removal is studied. The temperature influences on the electrostatic removal efficiency of $SO_2$.

• Journal of Conservation Science
• /
• v.29 no.1
• /
• pp.1-14
• /
• 2013

The Hongjimun Ogansumun (Five-arched floodgates) is composed mainly of biotite granite, pink feldspar granite and granodiorite that are very similar with granitic rocks around the Seoul. Main damage in the floodgates was gray, yellow and predominantly white discoloration on the surface of stone blocks. All floodgates showed more discoloration in the wall than ceiling, and there were growing stalactite on the ceiling. Scientific analyses determined that the white discoloring substrates were mainly calcite. Therefore, conservation treatment was carried out to remove the substrates by using dry cleaning, high pressure cleaning and chemicals. The floodgates have been restored to good state, but it is still significantly necessary to install drainage on the top of the gates.

• Journal of the Semiconductor & Display Technology
• /
• v.19 no.2
• /
• pp.45-50
• /
• 2020

We investigated the Si_1-xGe_x surface properties when dry cleaning the films using NF₃ / H₂O remote plasma. After the dry cleaning process, it was found that about 80-250 nm wide bumps were formed on the SiGe surface regardless of Ge concentration in the rage of x = 0.1 ~ 0.3. In addition, effects of the dry cleaning processing parameters such as pressure, substrate temperature, and H₂O flow rates were examined. It was found that the surface bump is significantly dependent on the flow rate of H₂O. Based on these observations, we would like to provide additional guidelines for implementing the dry cleaning process to SiGe materials.

• Journal of the Semiconductor & Display Technology
• /
• v.22 no.4
• /
• pp.26-31
• /
• 2023

We investigated the impact of NF₃ / H₂O remote plasma dry cleaning conditions on the SiO₂ etching rate at different preparation states during the fabrication of ultra-large-scale integration (ULSI) devices. This included consideration of factors like Si crystal orientation prior to oxidation and three-dimensional structures. The dry cleaning process were carried out varying the parameters of pressure, NF₃ flow rate, and H₂O flow rate. We found that the pressure had an effective role in controlling anisotropic etching when a thin SiO₂ layer was situated between Si₃N₄ and Si layers in a multilayer trench structure. Based on these observations, we would like to provide further guidelines for implementing the dry cleaning process in the fabrication of semiconductor devices having 3D structures.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2015.08a
• /
• pp.177.1-177.1
• /
• 2015

플라즈마 건식 식각공정은 반도체 공정에 있어 증착 및 세정 공정과 함께 중요한 공정중 하나이다. 기존 연구에서는 높은 식각 속도, 종횡비, 대면적에 대한 균일도 증가를 위하여 플라즈마 이온 밀도의 증가와 전자 온도를 감소시키기 위한 노력을 하고 있으며 플라즈마 식각분석 연구에서는 분광학 분석 기법을 활용하여 플라즈마에 의하여 활성화된 식각 가스와 박막 표면의 반응 메커니즘 연구가 진행 중에 있다. 그러나 지금까지의 플라즈마 식각연구에서는 플라즈마 식각 공정에서 발생되는 박막의 damage에 대한 연구는 전무하다. 본 연구에서는 플라즈마 식각과정에서 발생되는 박막 표면의 damage 연구를 위하여 Nano-indenter에 의한 분석 기법을 제시하였다. Nano-indentation 기법은 박막 표면을 indenter tip으로 직접 인가하여 박막 표면의 기계적 특성을 분석하고 이를 통하여 플라즈마에 의한 박막 표면의 물성 변화를 정량적으로 측정한다. 실험에서 플라즈마 소스는 Adaptively Coupled Plasma (ACP)를 사용하였고 식각 가스로는 HBr 가스를 주로 사용하였으며, 플라즈마 소스 파워는 1000 W로 고정 하였다. 연구 결과에 의하면 식각공정 챔버 내 압력이 5, 10, 15 및 20 mTorr로 증가함에 따라 TEOS SiO2 박막의 강도가 7.76, 8.55, 8.88 및 6.29 GPa로 변화되는 것을 측정하였고 bias power에 따라서도 다르게 측정됨을 확인하였다. 이 결과를 통하여 Nano-indentation 분석 기법을 활용하여 TEOS SiO2 박막의 식각공정의 변화에 따른 강도변화를 측정함으로써 플라즈마에 의한 박막 표면의 damage를 정량적으로 측정 가능함을 확인하였다.

• Journal of the Korean Society for Precision Engineering
• /
• v.26 no.5
• /
• pp.150-156
• /
• 2009

The removal of tiny particles adhered to surfaces is one of the crucial prerequisite for a further increase in IC fabrication, large area displays and for the process in nanotechnology. Various cleaning techniques (wet chemical cleaning, scrubbing, pressurized jets and ultrasonic processes) currently used to clean critical surfaces are limited to removal of micrometer-sized particles. Therefore the removal of sub-micron sized particles from silicon wafers is of great interest. For this purpose various cleaning methods are currently under investigation. In this paper, we report on experiments on the cleaning effect of 100nm sized fluorescence particles on silicon wafer using the plasma shockwave occurred by femtosecond laser. The plasma shockwave is main effect of femtosecond laser cleaning to remove particles. The removal efficiency was dependent on the gap distance between laser focus and surface but in some case surface was damaged by excessive laser intensity. These experiments demonstrate the feasibility of femtosecond laser cleaning using 100nm size fluorescence particles on wafer.