• Electrical & Electronic Materials
• /
• v.7 no.5
• /
• pp.409-416
• /
• 1994

A double layered photoreceptor using phthalocyanine dye was made by dip-coating method. The under cutting layer(UCL) was coated with A1$\_$2/O$\_$3/ or polyamide, and the charge generation layer(CGL) was formed by .tau.-type metal-free phthalocyanine. The oxadiazole was used as a charge transport layer(CTL) and polycarbonate and poly(vinyl butyral) was employed as a host polymer. The .tau.-H$\_$2/Pc had an absorption peak around 780nm, which coincided with the emitting wavelengths of GaAlAs diode lasers. Maximum charge acceptance of CTL that gives thickness of 12.mu.m was -900V by corona charge of -6.0kV. In photo-induced discharge measurements, residual potential was less than -20V and sufficient for ordinary use, and sample films using of poly(vinyl butyral) was showed good charge retention. In printing test, drum that was employed polycarbonate as a host polymer showed the good print quality.

• Journal of the Korean Graphic Arts Communication Society
• /
• v.11 no.1
• /
• pp.103-122
• /
• 1993

A cause and counterplan of the increase in dark decay rate of$\varepsilon$-CuPc/PVCz photoreceptor which is consist of the carrier generation layer (CGL) of$\varepsilon$type copper phthalocyanine ($\varepsilon$-CuPc) thin film by an aqueous coating method and the carrier transport layer (CTL) of polyvinylcarbazol (PVCz) by spin coating, are studied in this paper. Electrochemical deposition of CGL was accompanied by an increase in work function of the aluminium substrate during the processes and the enhanced work function 5.3 eV rose above the ionization potential 5.16 eV of $\varepsilon$-CuPc. This resulted in the increased injection of holes from substrate into CGL and a fast dark decay rate. Improved photoreceptor, an electron-transport $\varepsilon$-CuPc/TNF photoreceptor, led to lowing of dark decay rate and increasing of photosensitivity. The carrier generation efficiency (ηg), carrier injection efficiency (ηi) and xerographic gain (G) of the $\varepsilon$-CuPc/TNF photoreceptor were obtained by XTOF method and PIDC.

• Journal of the Korean Chemical Society
• /
• v.38 no.9
• /
• pp.632-639
• /
• 1994

For dye sensitization of zinc oxide in the visible region, copper phthalocyanine(CuPc) and sunfast yellow(SY) were adsorbed in two layers on zinc oxide powder. The adsorption structures of $\alpha-and\beta-CuPc$ on zinc oxide were investigated by photoacoustic, IR and Raman spectra. The ${\alpha}-and\;{\beta}$-polymorphs exhibited dimeric structure or molecular aggregates. The surface photovoltaic effect of ZnO/CuPc/SY showed higher than that of ZnO/SY/CuPc and $ZnO/\beta-CuPc/SY$ indicated better photosensitive than $ZnO/\alpha-CuPc/SY.$ Electrophotographic sensitivity of $ZnO/\beta-CuPc/SY$ was $$S_{1/2}=2.99{\times}10^{-2}(erg/cm^2)^{-1}$ at 630 nm.

• Applied Chemistry for Engineering
• /
• v.9 no.1
• /
• pp.6-12
• /
• 1998

A FET(Field Effect Transistor) type dissolved $CO_2$ sensor based on Severinghaus type $CO_2$ sensor was fabricated by the photolithographic process. The sensor consists of Ag/AgCl reference electrode and membranes (hydrogel membrane and $CO_2$ gas permeable membrane) on the pH-ISFET base chip. Ag/AgCl reference electrode was fabricated as follows. Ag layer was thermally evaporated and then its upper surface was chemically chloridized into the AgCl. The hydrogel used as an internal electrolyte solution was fabricated by a photolithographic method using 2-hydroxyethyl methacrylate(HEMA) and acrylamide. $CO_2$ permeable membrane on the top of the hydrogel layer was formed by photolithographic process with UV-oligomer. The FET type $pCO_2$ sensor fabricated by photolithographic method showed good linearity within the concentration range of $10^{-3}{\sim}10^0mole/{\ell}$ of dissolved $CO_2$ in aqueous solution with high sensitivity.

• Applied Chemistry for Engineering
• /
• v.10 no.8
• /
• pp.1114-1118
• /
• 1999

Barrier rib for the plasma display panel(PDP) was made by photolithographic process utilizing photosensitive barrier rib paste. The barrier rib paste was prepared by first dissolving ethylcellulose(binder polymer) in butyl carbitol(BC)/butyl carbitol acetate(BCA) =30/70 wt % mixture solvent at 15 wt % concentration. To this solution a mixture of functional monomers consisted of tripropyleneglycol diacrylate/ pentaerythritol triacrylate = 50/50 wt %, Irgacur 651 photoinitiator, and barrier rib powder were added and then the whole mixture was mixed in the three roll mill for 2 hr. The effect of component and concentration of photosensitive barrier paste on the photolithographic process was studied. After optimization of the paste formulation and photolithographic process, barrier rib could be obtained with good resolution up to $100{\mu}m$ height.

• Journal of the Korean Society for Aeronautical & Space Sciences
• /
• v.30 no.6
• /
• pp.1-6
• /
• 2002

Micro engine that includes Micro scale combustor is fabricated. Design target was focused on the observation of combustion driven actuation in MEMS scale. Combustor design parameters are somewhat less than the size recommended by feasibility test. The engine structure is fabricated by isotropic etching of the photosensitive glass wafers. Electrode is formed by electroplating of the Nickel. Photosensitive glass can be etched isotropically with almost vertical angle. Bonding and assembly of structured photosensitive glass wafer from the engine. Combustor size was determined to be 1mn scale. Piston in cylinder moves by fuel injection and reaction. In firing test, adequate engine operation including ignition, flame propagation and piston motion was observed. Present study warrants further application research on MEMS scale internal combustion power units.

• Journal of the Korean Vacuum Society
• /
• v.6 no.4
• /
• pp.321-325
• /
• 1997

Recently, photosensitive color filters have received much attention for their use in the liquid crystal display (LCD) industry. It is well known that chemical and physical properties of polymer surfaces can be modified by special surface treatments. In this work, we have studied the polymer surfaces of LCD blue color filters which were exposed to the UV light during photolithography. A better understanding of the irradiated polymer surfaces is required for the subsequent processes such as plasma etching, ITO electrode deposition, etc. The surface analysis has been undertaken using secondary ion mass spectrometry (SIMS), x-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). A significant enrichment of the pigment component and roughening of surface with bubble-like feature have been observed at the modified polymer surface.

• Journal of IKEEE
• /
• v.19 no.1
• /
• pp.41-44
• /
• 2015

Silicon trench process for bulk fin field effect transistor (finFET) is suggested without using chemical mechanical polishing (CMP) that cause contamination problems with chemical stuff. This process uses thickness difference of photo resistor spin coating and silicon nitride sacrificial layer. Planarization of silicon oxide and silicon trench formation can be performed with etching processes. In this work 50 nm silicon trench is fabricated with AZ 1512 photo resistor and process results are introduced.

• Proceedings of the Korean Institute of Surface Engineering Conference
• /
• 2018.06a
• /
• pp.85.2-85.2
• /
• 2018

금속 나노구조체에서의 localized surface plasmon resonance와 surface-enhanced Raman scattering 현상은 센서를 비롯한 다양한 응용분야를 가지고 있다. 나노구조체 array 형성을 위한 대표적인 top-down 방식인 e-beam lithography 공정은 제조비용이 매우 높고 대량생산 및 대면적화에도 한계가 있기에 polystyrene(PS) bead의 self-assembly를 이용한 nanosphere lithography와 같은 bottom-up 방식이 폭넓게 연구되고 있다. Closed-packing된 PS bead의 monolayer를 얻기 위해서는 기판의 친수성 처리가 필요한데, 기존의 많은 연구에서는 기판의 표면개질에 화학적 공정을 이용하고 있다. 하지만 이는 기판 선택의 자유도를 떨어뜨리는 원인이 된다. 금속이나 실리콘 기판에서는 산성 용액을 이용한 화학적 처리방법을 적용할 수 있지만 SU-8과 같은 감광액 및 폴리머 기판에서는 산에 대한 내구성이 떨어져 화학적 공정의 도입이 불가능 하기 때문이다. 본 연구에서는 이러한 한계점을 극복하기 위해 $UV-O_3$ 공정으로 친수성 처리된 다양한 기판에서 spin coating을 통한 PS monolayer를 제조하였는데, UV 램프의 에너지 조절을 통해 기판에 붙어있는 유기물들을 효과적으로 제거할 수 있었고 $O_3$ 생성 및 분해 과정에서 기판 표면에 친수성 화학 작용기를 생성시킬 수 있었다. 제조된 PS layer를 mask로 사용하여 Ag, Al, Au 등 다양한 나노구조체 array를 형성하여 array 주기에 따른 플라즈몬 공명 특성을 분석하였다. 레이저 조사로 나노구조체의 형상을 변화시킴으로써 동일한 물질과 주기를 가진 array에서도 플라즈몬 특성의 변조가 가능함을 확인하였는데, 이는 금속 나노구조체의 응용측면에서 매우 고무적인 발견이다.

• Applied Chemistry for Engineering
• /
• v.10 no.8
• /
• pp.1169-1174
• /
• 1999

2-Diazo-1-naphthoquinone-5-sulfonyl chloride(NQD-Cl) was synthesized from sodium 2-diazo-naphthoquinone-5-sulfonate by chlorination. NQD-Cl was esterified with hydroxybenzophenones to give several 1,2-naphthoquinone-(2)-diazide-5-sulfonic acid ester derivatives(NQD-esters). We have compared benzophenone derivatives with methoxy group to benzophenone derivatives with hydroxy group. Solubility of each NQD-ester was studied. Each of NQD-esters was formulated with novolac base resin and PS plates were manufactured. Photosensitivity, bleachability, compatible exposed time and relative sensitivity were determined by UV spectrophotometry, imaged by UV lithographic techniques, and the gray scale method. According to the number of substituted NQD group, it showed that relative sensitivity was different from gray scale method. NQD-esters with methoxy group showed a good solubility and higher sensitivity than commercial PS ones.