• Korean Journal of Environmental Agriculture
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• v.19 no.4
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• pp.284-293
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• 2000

For the artificial removal of air pollutants such as pesticides, environmental toxicants, and pathogenic microorganisms in the greenhouse or the living environment, the accelerated photodegradation and the biocidal effects of some photosensitizers (PS)/photocatalysts (PC) were tested under the sunlight and/or artificial light. The selected photosensitizers/photocatalysts included the semiconductors (PC-1 and PC-2), the oxidizers (PC-3, PC-4, PC-5 and PC-6), the aromatic ketone (PS-7) and the aromatic amine (PS-8). In the case of dichlorvos, all the photocatalysts selected showed more accelerated photodegradation than the control without photocatalysts under both the sunlight and artificial light. Whereas, only the photocatalyst PC-1 accelerated the degradation of methyl tert-butyl ether about 17 times more than the control under both the sunlight and artificial light. Procymidone was much more degraded by the photosensitizer PS-8 and the two photocatalysts (PC-1, PC-6) than by PS-7. In the preliminary experiments to diminish the population of the microorganisms in the air, the photocatalyst PC-1 added to the suspensions of Pseudomonas putida, Phytophthora capsici, and Salmonella typhimurium obviously inhibited the microbial growth under the artificial light. The photocatalyst PC-1 showed a bactericidal activity against Salmonella typhimurium spread on the nutrient broth agar medium. These results suggest that the photosensitizers/photocatalysis under the light can remove some air pollutants and hence they can be used to reduce the exposure of the workers in the horticultural facilities and/or the public in the environment to the harmful pollutants.

• Journal of the Korean Vacuum Society
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• v.6 no.4
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• pp.321-325
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• 1997

Recently, photosensitive color filters have received much attention for their use in the liquid crystal display (LCD) industry. It is well known that chemical and physical properties of polymer surfaces can be modified by special surface treatments. In this work, we have studied the polymer surfaces of LCD blue color filters which were exposed to the UV light during photolithography. A better understanding of the irradiated polymer surfaces is required for the subsequent processes such as plasma etching, ITO electrode deposition, etc. The surface analysis has been undertaken using secondary ion mass spectrometry (SIMS), x-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). A significant enrichment of the pigment component and roughening of surface with bubble-like feature have been observed at the modified polymer surface.

• Journal of IKEEE
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• v.19 no.1
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• pp.41-44
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• 2015

Silicon trench process for bulk fin field effect transistor (finFET) is suggested without using chemical mechanical polishing (CMP) that cause contamination problems with chemical stuff. This process uses thickness difference of photo resistor spin coating and silicon nitride sacrificial layer. Planarization of silicon oxide and silicon trench formation can be performed with etching processes. In this work 50 nm silicon trench is fabricated with AZ 1512 photo resistor and process results are introduced.

• Journal of the Korean Ceramic Society
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• v.41 no.4
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• pp.313-322
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• 2004

Thick film photolithography is a new technology in that the lithography process such as exposure and development is applied to the conventional thick film process including screen-printing. In this research, low-temperature cofireable silver paste, which enabled the formation of thick film fine-line using photolithographic technology, was developed. The optimum composition for fine-line forming was studied by adjusting the amounts of silver powder, polymer and monomer, and the additional amount of photoinitiator, and then the effect of processing parameter such as exposing dose on the formation of fine-line was also tested. As the result, it was found that the ratio of polymer to monomer, silver powder loading, and the amount of photoinitiator were the main factors affecting the resolution of fine-line. The developed photosensitive silver paste was printed on low-temperature cofireable green sheet, then dried, exposed, developed in aqueous process, laminated, and fired. Results showed that the thick film fine-line under 20$\mu\textrm{m}$ width could be obtained after cofiring.

• 기계와재료
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• v.22 no.3
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• pp.14-21
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• 2010

디스플레이의 기술 발달에 따라 전자소재용 기능성 필름이 각광받고 있다. 용도에 따라 제작 방법도 다양하고 생산 방식에도 차이가 있지만, 제조 기간이나 비용이 많이 소모되어 절감하려는 노력이 필요하다. 보안필름은 기능성 필름의 한 종류로서, 제조 방법에는 여러 가지가 있을 수 있으나 저가의 대량생산을 위해 최근에는 인쇄기법을 이용해 보안필름의 원리에 부합하는 필름을 제조하려는 시도가 이루어지고 있다. 따라서 본 원고에서는 인쇄기법 기반으로 안료 및 감광필름을 이용해 보안필름을 제조한 경우를 통하여 새로운 보안필름 제조방법에 대해 접근 하고자 한다.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 1995.04b
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• pp.440-444
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• 1995

StereoLithography는 3차원 CAD로 작성된 모델데이타를 이용하여입체조형 실물을 빠르게 제작 하는 Rapid Prototype 기술의 한 방식으로서, 감광성 수지를 자외선 Laser 광에 의해 선택적으 로 경회시켜 원하는 한 단면형상을 이룬후 적층하는 반복작업에 의해 입체 형상을 조형하는 기법 이다. Rapid Prototype 시스템은 제품개발기간 단축과 설계완성도를 높이는 목적으로 최근 산업계에서 그 활용도가 점차 증가하는 추세에 있으며, 3차원 CAD 시스템과 함께 제품개발 체제를 통합화하고 Concurrent Engineering의 실현을 위한 주요한 Tool로써 자리를 잡아가고 있다.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.12 no.4
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• pp.1993-1998
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• 2011

Semiconductor industry needs to have fine patterns in order to fabricate the high density integrated circuit. For nano-scale patterns, hard-mask is used to multi-layer structure which is formed by CVD (chemical vaporized deposition) process. In this work, we prepared single-layer hard-mask by using organic-inorganic hybrid polymer for spin-on process. The inorganic part of hard-mask was much easier etching than photo resist layer. Beside, the organic part of hard-mask was much harder etching than substrate layer. We characterized the optical and morphological properties to the hard mask films using organic-inorganic hybrid polymer, and then etch rate of photo resist layer and hard-mask film were compared. The hybrid polymer prepared from organic and inorganic materials was found to be useful hard-mask film to form the nano-patterns.

• Proceedings of the Korean Fiber Society Conference
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• 2003.04a
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• pp.44-47
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• 2003

21C 고도정보화 시대를 맞이하여 평판표시소자에 대한 요구가 급증하여 현재는 액정표시소자 (Liquid Crystal Display, LCD)가 가장 널리 사용되고 있는데, 특히 해상도가 우수한 TFT(Thin Film Transistor)-LCD에 대한 수요가 급증하고 있다. Full color TFT-LCD를 구성하는 재료 중 가장 높은 비중을 차지하고 있는 것이 color filter이며, 이것을 제조하는 데 있어 가장 중요한 기술은 화소 형성기술이다. 특히 가격은 고가이지만 해상성이 뛰어난 TFT-LCD에 주로 사용되는 안료분산법은 신뢰성, 특히 내열성 및 공정의 복잡성 등 문제점을 가지고 있다[1]. (중략)

• Journal of the Korea Academia-Industrial cooperation Society
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• v.11 no.10
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• pp.3923-3927
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• 2010

Primary charging roller rotated with contacting surface of OPC drum and take charge OPC drum. Owing to this reason, primary charging roller is made by elasticity substance with electric conduction. Properties of charging and image is changed by class of coating, method of coating and environment. This study developed coating material and coating method to make Image Forming of High- quality.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.11 no.10
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• pp.3893-3897
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• 2010

Developer roller of LBP(laser beam printer) cartridge made with magnetic substance and density of magnetic flux was decreased with the elapse of a year. Owing to this reason, quality of printing was decreased with decreasing of magnetic flux. This study investigated about the elapse of a year of magnetic substance and possible about usage of recycling production.