Etching characteristics of $Ba_2Ti_9O_{20}$ films in inductively coupled $Cl_2$ /Ar plasma
($Cl_2$ /Ar 혼합가스를 이용한 $Ba_2Ti_9O_{20}$ 유전박막의 유도결합 플라즈마 식각)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2009.04b
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- pp.65-65
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- 2009