• Journal of the Korean Applied Science and Technology
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• v.33 no.1
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• pp.100-109
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• 2016

In this study, the NO oxidation using dry oxidant produced by catalytic $H_2O_2$ conversion was conducted. It was shown that Mn-based $Fe_2O_3$ support catalyst has the best performance in the catalytic $H_2O_2$ conversion and its combined-NO oxidation. The reaction characteristics of NO oxidation was investigated by the various operation conditions such as $H_2O_2$ amount, oxidation temperature and space velocity. As a results, the oxidation efficiency of NO greatly depends on the oxidation reaction temperature, $H_2O_2$ amount and space velocity. The performance of NO oxidation was increased with increasing the oxidation temperature and $H_2O_2$ amount. Also, the performance of NO oxidation was decreased with increasing the space velocity.

• Journal of the Korean Ceramic Society
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• v.38 no.11
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• pp.1037-1041
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• 2001

Silicon diosixde thick film using silica optical waveguide cladding was fabricated by Plasma Enhanced Chemical Vapor Deposition (PECVD) method, at a low temperature (32$0^{\circ}C$) and from (SiH$_4$+$N_2$O) gas mixtures. The effects of deposition parameters on properties of SiO$_2$thick films were investigated by variation of $N_2$O/SiH$_4$flow ratio and RF power. As the $N_2$O/SiH$_4$flow ratio decreased, deposition rate increased from 2.9${\mu}{\textrm}{m}$/h to maximum 10.1${\mu}{\textrm}{m}$/h. As the RF power increased from 60 W to 120 W, deposition rate increased (5.2~6.7 ${\mu}{\textrm}{m}$/h) and refractive index approached at thermally grown silicon dioxide (n=1.46).

• Applied Chemistry for Engineering
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• v.10 no.6
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• pp.885-888
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• 1999

This study was carried out to determine the reaction kinetic constant of the dehydration - thermal decomposition of $Na_2B_4O_7{\cdot}10H_2O/Na_2B_4O_7{\cdot}5H_2O$ and to investigate the durability during the repeated use of a chemical heat-storage material and the reproducibility of reaction system. The order of the dehydration reaction was 1st-order. The reaction rate was directly proportional to a partial pressure difference of water steam. The kinetic constant was 0.27 and the reproducibility of dehydration reaction for a kinetic constant and a reaction order was excellent. The activity variation in the durability test of a chemical heat-storage material was within range of ${\pm}5%$ during the repeatedly use in several times.

• Applied Chemistry for Engineering
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• v.8 no.6
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• pp.1029-1033
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• 1997

Fundamental research of non-isothermic analysis of reaction rate has been carried out for the heat storage system using the thermal decomposition of $Na_2B_4O_7{\cdot}10H_2O$. It was found that the equilibrium temperature of the thermal decomposition reaction was lowered less than 373K in $Na_2B_4O_7{\cdot}10H_2O/Na_2B_4O_7{\cdot}5H_2O$ system, but the heat efficiency was unchanged. The initiation temperature of the reaction was varied from low to high temperature region with heating rate. The reaction order of the dehydration reaction by the thermal decomposition was appeared to be 0.67 by non-isothermic analysis, thereby $Na_2B_4O_7{\cdot}10H_2O$ may be used as a hemical heatstorage material.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.04b
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• pp.38-41
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• 2004

The oxidizer plays an important role in the metal chemical mechanical polishing(CMP) slurry. Currently, the oxidizer used in CMP slurry is nearly divided into several kinds such as $Fe(NO_3)_3$, $H_2O_2$, $KIO_3$, and $H_5IO_6$. It is generally known that oxidizer character of $H_2O_2$ is more effective than other oxidizers. In this work, we have been studied the characteristics for the $H_2O_2$ concentration of copper slurry, which can applicable in the recent semiconductor manufacturing process. Also, it plays an important role in the planarization of copper films using copper slurries during micro-electronic device fabrication. In this work, we confirmed that removal rate of Cu/TaN changed by $H_2O_2$ concentration on copper slurry. And we used $KMnO_4$ in the measurement method of $H_2O_2$. In analysis results, we confirmed that the difference of results is large. We thought that the difference was due to organic component existence. So in titration method of $H_2O_2$ concentration, we used $Na_2S_2O_3$ instead of $KMnO_4$ as solution. Consequently, using the titration method, we could calculate correct data reduced error. And $H_2O_2$ concentration has been adjusted to the target concentration of 0.1 wt%.

• Journal of Environmental Science International
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• v.12 no.7
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• pp.775-782
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• 2003

The photodegradations of pyrene, chrysene and benzo[a]pyrene that were similar in structure among polycyclic aromatic hydrocarbons (PAHs) were investigated with a low-pressure mercury lamp(the wavelength of 253.7 nm and UV output of 1.35${\times}$10$\^$-3/J/s). The optimum concentrations of TiO$_2$ and H$_2$O$_2$ on the photodegradation of pyrene, chrysene and benzo[a]pyrene were 1 g/L and 1.5${\times}$10$\^$-3/ M, respectively. By these optimum concentrations, their rates increased with increasing the concentration of TiO$_2$ and H$_2$O$_2$ because the amounts of OH radical formed increased, but for the higher concentrations than the optimum, their rates decreased with increasing those concentrations because the white turbidity phenomena occurs in case of TiO$_2$ and H$_2$O$_2$ acts as an OH radical inhibitor. The photodegradation rates among the photodegradation processes such as UV, UV/TiO$_2$, UV/H$_2$O$_2$, and UV/H$_2$O$_2$/TiO$_2$ decreased in the following sequences.: UV/H$_2$O$_2$/TiO$_2$> UV/H$_2$O$_2$> UV/TiO$_2$> UV.

• The Bulletin of The Korean Astronomical Society
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• v.40 no.2
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• pp.40.3-41
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• 2015

We performed simultaneous observations of H2O and SiO masers toward VX Sgr using the Korean VLBI Network (KVN) and Source Frequency Phase Referencing (SFPR) method. The observations were carried out at 5 epochs from 2014 February to 2015 June. The relative locations of the SiO with respect to the H2O maser emission were determined at two epochs by SFPR for the first time. The H2O masers show well developed asymmetric outflow features which are spread up to ~300 mas in diameter. On the other hand, the SiO masers show a ring-like structure close to the central star with ~ 30 mas diameter. The SFPR observational results at two epochs (${\varphi}=0.83$ and 0.99) provide similar relative locations of H2O and SiO maser features. These superposed maps of H2O and SiO masers lead us to investigate the development of outflow motions from relatively spherical SiO maser regions close to central star to aspherical H2O maser regions according to optical phase of stellar pulsation together with the prediction of the position of central star.

• The Bulletin of The Korean Astronomical Society
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• v.37 no.2
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• pp.237.1-237.1
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• 2012

We report extensive statistical analyses based on the simultaneous observational results of SiO and $H_2O$ masers toward 166 known both SiO and $H_2O$ maser sources (Kim et al. 2010), 83 known SiO maser sources (Cho & Kim 2012 submitted), and 152 known $H_2O$ maser sources (Kim et al. 2012 in preparation). We investigate mutual relations between SiO and $H_2O$ maser properties (peak and total flux density ratios, full line width ratios, and velocity structures etc.) according to stellar pulsation phases and type of evolved stars. These statistical results are compared with monitoring observational results of some individual stars. In addition, a relation between the full line width of SiO/$H_2O$ masers and stellar mass loss rates is examined. For 401 observed stars, we also investigate characteristics of SiO and $H_2O$ maser properties related with evolutionary stages in the IRAS two-color diagram.

• Applied Chemistry for Engineering
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• v.21 no.2
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• pp.183-187
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• 2010

Activated carbons (ACs) have been prepared from pitch by the combination of a chemical oxidation with different $H_2O_2$ concentrations i.e., 5, 15, and 25 wt% and a chemical activation with KOH at a constant KOH/pitch ratio of 3/1. The influence of $H_2O_2$ solution on the microporous properties of the pitch and the final activated carbons were invested using XRD, FT-IR, XPS, $N_2$-adsorption, and SEM. XRD indicated that the value of interplanar distance $d_{002}$ increased by chemical oxidation. FT-IR and XPS results showed that the chemical oxidation promoted the formation of surface oxygen functionalities. Also, the specific surface area of the resulting ACs was increased with increasing the concentration of $H_2O_2$ chemical oxidation and showed a maximum value of $2111m^2/g$ at 25 wt% $H_2O_2$ concentration.

• Analytical Science and Technology
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• v.18 no.2
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• pp.112-119
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• 2005

This study reports on the efficiency of cleaning enameled magnet wire using a sulfuric acid $H_2SO_4$ and removal of dissolved organic material using hydrogen peroxide $H_2O_2$ and nitric acid $HNO_3$ at $80^{\circ}C$. The method involves the addition of pure $H_2SO_4$ and $H_2O_2$ or $HNO_3$. Layers of enameled organic material were dissolved by 90% $H_2SO_4$ and the solution was maintained as 35% $H_2O_2$ or 60% $HNO_3$. $H_2O_2$ content in aqueous $H_2O_2$ was maintained as 8.8 : 1.0. An initial concentration of $H_2SO_4$ in dissolution conditions was accomplished within 15 min, with a stripping time of about 2 h. The concentrations of $H_2O_2$ and $HNO_3$ in the processing bath were relatively low, but sufficient enough to produce an effective amount of power in the bath for the removal of the enamel material. The cleaning effect of enameled organic material involves the dehydration by $H_2SO_4$ and the oxidation by $H_2O_2$ or $HNO_3$.