• 제목/요약/키워드: (Ti, Cr, Zr)N-$MoS_2$ films

검색결과 1건 처리시간 0.017초

Deposition of (Ti, Cr, Zr)N-$MoS_{2}$ Thin Films by D.C. Magnetron Sputtering

  • Kim, Sun-Kyu;Vinh, Pham-Van
    • 한국표면공학회지
    • /
    • 제39권6호
    • /
    • pp.263-267
    • /
    • 2006
  • As technology advances, there is a demand for development of hard solid lubricant coating. (Ti, Cr, Zr)N-$MoS_2$ films were deposited on AISI H13 tool steel substrate by co-deposition of $MoS_2$ with (Ti, Cr, Zr)N using a D.C. magnetron sputtering process. The influence of the $N_2Ar$ gas ratio, the amount of $MoS_2$ in the films and the bias voltage on the mechanical and structural properties of the films were investigated. The highest hardness level was observed at the $N_2/Ar$ gas ratio of 0.3. Hardness of the films did not change much with the increase of the $MoS_2$ content in the films. As the substrate bias potential was increased, hardness level of the film reached maximum at -150 V. Surface morphology of these films indicated that high hardness was attributed to the fine dome structure.