• 제목/요약/키워드: $UV/H_2O_2$ Process

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$TiO_2$ 광촉매 막반응기를 이용한 유기물의 산화 (Oxidation of Organic Compounds Using $TiO_2$ Photocatalytic Membrane Reactors)

  • 현상훈;심세진;정연규
    • 멤브레인
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    • 제4권3호
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    • pp.152-162
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    • 1994
  • 광촉매 $TiO_2$ 막에 의한 formic acid의 광분해 효율이 연구되었다. 막반응기는 용액의 정밀여과(micro-filtration)는 물론 유기물의 광분해를 동시에 수행할 수 있도록 다공성 $TiO_2$ 튜브 (평균기공: $0.2{\mu}m$)를 이용한 새로운 타입으로 개발되었으며 광원으로는 365 nm 파장을 갖는 UV를 사용하였다. 또한 반응기의 광분해 효율을 증진시키기 위하여 슬립케스팅법으로 제조한 $TiO_2$ 튜브표면을 $TiO_2$ 졸로 코팅하였다. $TiO_2$ 막 반응기의 분해효율은 용액의 투과량(flux), 막의 미세구조(졸의 pH), 공급산소량, $H_2O_2$와 같은 1차 산화제(primary oxidants)의 첨가 그리고 $Nb_2O_5$와 같은 물질의 도핑(doping)에 매우 민감함을 알 수 있었다. 최적의 광분해 반응조건에서 formic acid의 산화효율은 pH가 1.45인 $TiO_2$ 졸로 코팅한 막 반응기를 사용했을때 80% 이상이었다. Formic acid 용액에 1차 산화제 $H_2O_2$를 첨가하거나 막을 $Fe_2O_3$로 도핑함으로써 산화효율은 최고 20%까지 증가시킬 수 있었다.

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순환식 반응기에서 $TiO_{2}$ 광촉매를 이용한 Chromium(VI)의 제거에 미치는 영향인자에 대한 연구 (A Study on the Factors Affecting Removal of Chromium(VI) Using $TiO_{2}$ Photocatalyst in a Circular Type Reactor)

  • 김현용;조일형;이소진;기원주;이홍근
    • 한국환경보건학회지
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    • 제25권3호
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    • pp.64-69
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    • 1999
  • This study was carried out the removal of Cr(VI) which was known to the toxic pollutant in industry using the process of UV and TiO$_2$ photocatalyst in a circular type reactor. In this experiment, the series of photocatalytic process for the removal of Cr(VI) has been selected as a model reaction in a circular type reactor in order to obtain the basic data on the influence of various experimental parameters such as circulation flow rate, pH of solution, initial Cr(VI) light illumination and TiO$_2$ dosage, and salicylic acid concentration. The results of this study were as follows; 1. With both UV light illumination and TiO$_2$ present, Cr(VI) was more effectively eliminated than with either UV or TiO$_2$ alone. 2. As the circulation flow rate of solution increased, the removal efficiency of Cr(VI) was increased. However, over 2.4 l/min of circulation flow rate, the efficiency wa limited. 3. A increase in the photocatalytic removal of Cr(VI) was noticed with decreasing pH. 4. An increase in the photocatalytic removal of Cr(VI) was noticed with decreasing Initial Cr(VI) concentration and first order kinetics was observed from the result at different initial concentration of Cr(VI). 5. Photocatalytic removal efficiency of Cr(VI) increased with increasing TiO$_2$ dosage. However, over 1.0 g/l of TiO$_2$ dosage, the efficiency reached a plateau. 6. As low concentration of saliculic acid were added, there was an increase in the removal efficiency of Cr(VI). However, over 300 mg/l of salicylic acid, the efficiecy was decreased. It eas found that application of photocatalysis to water treatment that contains both Cr(VI) and salicylic acid was possible.

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Synthesis and Characterization of MoS2/Graphene-TiO2 Ternary Photocatalysts for High-Efficiency Hydrogen Production under Visible Light

  • Zhang, Feng-Jun;Kong, Cui;Li, Xuan;Sun, Xian-Yang;Xie, Wen-Jie;Oh, Won-Chun
    • 한국세라믹학회지
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    • 제56권3호
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    • pp.284-290
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    • 2019
  • Ternary MoS2/graphene (G)-TiO2 photocatalysts were prepared by a simple hydrothermal method. The morphology, phase structure, band gap, and catalytic properties of the prepared samples were investigated by X-ray diffraction, Raman spectroscopy, scanning electron microscopy, UV-vis spectrophotometry, and Brunauer-Emmett-Teller surface area measurement. The H2 production efficiency of the prepared catalysts was tested in methanol-water mixture under visible light. MoS2/G-TiO2 exhibited the highest activity for photocatalytic H2 production. For 5 wt.% and 1 wt.% MoS2 and graphene (5MT-1G), the production rate of H2 was as high as 1989 µmol-1h-1. The catalyst 5MT-1G showed H2 production activity that was ~ 11.3, 5.6, and 4.1 times higher than those of pure TiO2, 1GT, and 5MT, respectively. The unique structure and morphology of the MoS2/G-TiO2 photocatalyst contributed to its improved hydrogen production efficiency under visible light.

다양한 SiO2 코팅 제어를 통한 화장품용 루타일형 TiO2의 색상 및 물성 연구 (A Study of Various SiO2 Coating Control on White TiO2 Pigment for Cosmetic Applications)

  • 박민솔;심우영;김유진
    • 한국분말재료학회지
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    • 제29권3호
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    • pp.207-212
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    • 2022
  • Nanosized rutile titanium dioxide (TiO2) is used in inorganic pigments and cosmetics because of its high whiteness and duality. The high quality of the white pigments depends on their surface coating technique via the solgel process. SiO2 coatings are required to improve the dispersibility, UV-blocking, and whiteness of TiO2. Tetraethyl orthosilicate (TEOS) is an important coating precursor owing to its ability to control various thicknesses and densities. In addition, we use Na2SiO3 (sodium silicate) as a precursor because of its low cost. Compared to TEOS, which controls the pH using a basic catalyst, Na2SiO3 controls the pH using an acid catalyst, giving a uniform coating. The coating thickness of TiO2 is controlled using a surface modifier, cetrimonium bromide, which is used in various applications. The shape and thickness of the nanosized coating layer on TiO2 are analyzed using transmission electron microscopy, and the SiO2 nanoparticle behavior in terms of the before-and-after size distribution is measured using a particle size analyzer. The color measurements of the SiO2 pigment are performed using UV-visible spectroscopy.

고도산화기술 공정을 이용한 페놀 제거 특성 연구 (The Study on the Phenol Removal Characteristics by using AOP Processes)

  • 김성준;곽규동;원찬희
    • 한국물환경학회지
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    • 제26권2호
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    • pp.303-310
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    • 2010
  • Recently distinguished AOP means technology resolving organic compounds in water to harmless compounds such as $CO_2$ and $H_2O$ by creating OH radical ($OH{\cdot}$) with more powerful oxidation than general oxidants. It has merits which the 2nd pollution is not caused since it uses solar energy, sludge doesn't take place, it can be applied to high-density waste water and it oxidizes non-biodegradable organic compounds more easily. The purpose of the study was to examine about removable characteristics of phenol which was a non-biodegradable organic matter with UV/$O_3$/Catalyst processes which is one out of AOP and to present applicability of photocatalyst and the optimum conditions of treatment. The study regarded initial phenol concentration, initial pH, photocatalyst amount and flow as its conditions. As the results, the test had the highest removable efficiency (92%) when initial phenol concentration was 100 mg/L, initial pH 7, photocatalyst amount 6L and flow 1.5 mg/min. The removable efficiency was increased as much as initial phenol concentration was increased, when initial pH was 7 (neutrality), photocatalyst amount was increased and flow was increased. It was checked that the optimum HRT was 12 hours. Therefore, phenol is enough removable with UV/$O_3$/Catalyst process and its prospect in the future is expected.

광펜톤반응과 펜톤반응에 의한 수중 클로로페놀 분해비교연구 (Degradation Of 4-chlorophenol By Photo-Fenton Process and Fenton Process in Aqueous Solutions)

  • 김현승;김일규
    • 상하수도학회지
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    • 제25권4호
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    • pp.463-469
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    • 2011
  • The degradation of 4-chlorophenol by various AOPs(Advanced Oxidation Processes) including the Fenton and the photo-Fenton process has been examined. In sole Fe, UV or $H_2O_2$ process without combination, low removal efficiencies have been achieved. But the photo-Fenton process showed higher removal efficiency for degradation of 4-chlorophenol than those of other AOPs including the Fenton process. Generally more hydrogen peroxide was required to achieve higher removal efficiencies of 4-CP at constant dosage of $FeSO_4$ in both of the Fenton and the photo-Fenton processes. Based on the results, The photo-Fenton process is proposed to be the most efficient alternative for degradation of 4-chlorophenol among the processes studied in this research.

광분해반응을 통한 MTBE 분해 시 음이온 영향의 통계적 분석 (Statistical Analysis of The Influence of Inorganic Anions on MTBE Decomposition by Photolysis(UV/H2O2))

  • 천석영;장순웅
    • 한국지반환경공학회 논문집
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    • 제12권10호
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    • pp.57-62
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    • 2011
  • 이 연구는 Methyl tert Btyl Ether(MTBE)의 광촉매반응을 통한 제거시에 다양한 음이온($Cl^-$, $NO_3{^-}$, $HCO_3{^-}$)들의 영향을 통계적 방법을 사용하여 조사하였다. 이 공정은 일반적으로 UV의 존재 하에 수용액상에 생성되는 Hydroxyl radicals(OH라디칼)의 생성에 기초하며, 이러한 라디칼들의 생성은 수용액 상의 무기 음이온들이 OH라디칼과의 반응에 의해 광분해를 방해한다. 이런 무기음이온들의 영향은 반응표면법(RSM)의 한 종류인 혼합물분석(Mixture analysis)를 통해 $Cl^-$, $NO_3{^-}$$HCO_3{^-}$의 독립변수들을 수학적으로 표현하였다. 분산분석(Analysis of variance; ANOVA)의 회귀분석항은 유의한 p값(p<0.0001)과 높은 결정계수($R^2$=99.28%, ${R^2}_{adj}$=98.91%)를 나타냈다. 그리고 등고선도(Contour plot)와 반응표면도(Response surface plot)는 $UV/H_2O_2$ 공정에 기초한 MTBE 광분해에 대한 무기 이온들의 영향을 나타내었다. 이 연구의 결과는 MTBE의 광분해에 대해 $Cl^-$$HCO_3{^-}$ 이온이 OH라디칼의 생성을 방해하는 것으로 나타났고 이 두 인자에 의한 상호작용이 관찰되었다.

Fundamental Study on the Photocatalytic Degradation of Organics in Industrial Waste Water with the Presence of Titanium Dioxide

  • Kusaka, Eishi;Izawa, Mihiro;Fukunaka, Yasuhiro;Ishii, Ryuji
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2001년도 The 6th International Symposium of East Asian Resources Recycling Technology
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    • pp.286-291
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    • 2001
  • As part of fundamental studies on the degradation of the organic compounds in industrial waste water, the photocatalytic degradation properties of the organic compound by means of the UV/TiO$_2$degradation process have been investigated. The test organic compound of acetic acid was chosen in this study. The testing of photo catalytic degradation were performed under various operation conditions such as TiO$_2$dosages, initial concentration of the organic, the aqueous pH's, etc. The effects of various parameters on the short time activity of the present acetic acid-UV/TiO$_2$system could be demonstrated from this investigation.

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Functional graphene sheets-TiO2 nanocomposites and their photocatalytic performance for wastewater treatment

  • R. Aitbelale;A. Timesli;A. Sahibed-dine
    • Advances in nano research
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    • 제15권4호
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    • pp.295-304
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    • 2023
  • In this paper, a powerful photocatalyst based on carbon nanocomposite is developed in order to obtain a new material applicable in water treatment and especially for the discoloration of effluents used in the textile industry. For that, TiO2-graphene nanocomposites have been successfully synthesized by a mixture of Functionalized Graphene Sheet (FGS) and tetrachlorotitanium complexes to form FGS-TiO2 nanocomposite. In the presence of an anionic surfactant, we used a new chemical process to functionalize graphene sheets in order to make them an excellent medium for blocking and preventing the aggregation of TiO2 nanoparticles. The components of these nanocomposites are characterized by means of X-ray diffraction (XRD), Fourier Transform Infrared Spectroscopy (FT-IR), Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM), which confirms the successful formation of the FGS-TiO2 nanocomposite. It was found that the TiO2 nanoparticles were dispersed uniformly on the graphene plane which possesses better charge separation capability than pure TiO2. The FGS-TiO2 nanocomposites exhibited higher photocatalytic activity compared to pure TiO2 for the removal of three dyes: such as Methylene Blue (MB), Bromophenol Blue (BB) and Alizarin Red-S (AR) in water. The removal process was fast and more efficient with FGS-TiO2 nanocomposite in daylight (in the absence of UV irradiation) compared to pure TiO2 nanoparticles without and under UV in all pH range.

Self-Patterning을 이용한 강유전체 $Sr_{0.9}Bi_{2.1}Ta_2O_9$와 산화물 전극 $La_{0.5}Sr_{0.5}CoO_3$의 박막 제조에 관한 연구 (A Study on Fabrication of $Sr_{0.9}Bi_{2.1}Ta_2O_9$ and $La_{0.5}Sr_{0.5}CoO_3$ Thin Films by Self-Patterning Technique)

  • 임종천;조태진;강동균;임태영;김병호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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    • pp.116-119
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    • 2003
  • Self-patterning of thin films using photosensitive sol solution has advantages such as simple manufacturing process compared to photoresist/dry etching process. In this study, ferroelectric $Sr_{0.9}Bi_{2.1}Ta_2O_9$(SBT) and $La_{0.5}Sr_{0.5}CoO_3$(LSCO)thin films have been prepared by spin coating method using photosensitive sol solution. $Sr(OC_2H5)_2$, $Bi(TMHD)_3$ and $Ta(OC_2H)_5)_5$ were used as starting materials for SBT solution and $La(OCH_2CH_2OCH_3)_3$, $Sr(OC_2H_5)_2$, $CO(OCH_2CH_2OCH_3)_2$ were used for LSCO solution. Solubility difference by UV irradiation on LSCO thin film allows to obtain a fine patterning due to M-O-M bond formation. The lowest resistivity($4{\times}10^{-3}{\Omega}cm$) of LSCO thin films was obtained by annealing at $740^{\circ}C$.

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