• Title/Summary/Keyword: $TiO_2$ sol

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A study on the Frequency Dependence of Dynamic Pyroelectric Properties for $Pb_{1-x}La_{x}Ti_{1-x/4}O_{3}$ (x=0.1) (PLT(10)) Ferroelectric Thin Film ($Pb_{1-x}La_{x}Ti_{1-x/4}O_{3}$ (x=0.1) (PLT(10)) 강유전체 박막에서 동적 초전특성의 주파수 의존성에 관한 연구)

  • Cha, Dae-Eun;Chang, Dong-Hoon;Kang, Seong-Jun;Yoon, Yung-Sup
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.104-107
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    • 2001
  • The fabricated La-modified lead titanate (PLT) thin flim without paling treatment was investigated for modulation frequency dependence of pyroelectric properties by the dynamic method. $Pb_{1-x}La_{x}Ti_{1-x/4}O_{3}$ PLT (x=0.1) thin film having 10 mol% La content was deposited on a $Pt/TiO_{x}/SiO_{2}/Si$ substrate by sol-gel method. The PLT(10) thin film exhibits a relatively excellent dielectric property. The pyroelectric coefficient (p) of the PLT(10) thin film is $6.6{\times}10^{-9}C/cm_{2}\cdot K$ without frequency dependence. The figure of merits for the voltage responsivity and specific detectivity are $1.03{\times}10^{-11}C\cdot cm/J$ and $1.46\times 10^{-9}C\cdot cm/J$, respectively. The PLT(10) thin film has voltage responsivity (Rv) of 5.15 V/W at 8 Hz. Noise equivalent power (NEP) and specific detectivity (D*) of the PLT(10) thin film are$9.93{\times}10^{-8}W/Hz^{1/2}$ and $1.81\times 10^{6}cmHz^{1/2}/W$ at the same frequency of 100 Hz, respectively. The results means that PLT thin film having 10 mol % La content is suitable for the sensing materials of pyroelectric IR sensors.

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A study on the Frequency Dependence of Dynamic Pyroelectric Properties for $Pb_{1-x}La_{x}Ti_{1-x/4}O_3$(x=0.1)(PLT(10)) Ferroelectric Thin Film ($Pb_{1-x}La_{x}Ti_{1-x/4}O_3$(x=0.1)(PLT(10)) 강유전체 박막에서 동적 초전특성의 주파수 의존성에 관한 연구)

  • 차대은;장동훈;강성준;윤영섭
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.104-107
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    • 2001
  • The fabricated La-modified lead titanate (PLT) thin flirt without poling treatment was investigated for modulation frequency dependence of pyroelectric properties by the dynamic method. $Pb_{1-x}La_{x}Ti_{1-x/4}O_3$PLT (x=0.1) thin film having 10 mol% La content was deposited on a Pt/$TiO_{x}$/$SiO_2$/Si substrate by sol-gel method. The PLT(10) thin film exhibits a relatively excellent dielectric property. The pyroelectric coefficient (p) of the PLT(10) thin film is 6.6 x $10^{-9}$C/$\textrm{cm}^2$.K without frequency dependence. The figure of merits for the voltage responsivity and specific detectivity are 1.03${\times}$$10^{-11}$/C.cm/J and 1.46 x $10^{-9}$C.cm/J, respectively. The PLT(10) thin film has voltage responsivity ($R_{V}$) of 5.15 V/W at 8 Hz. Noise equivalent power (NEP) and specific detectivity (D*) of the PLT(10) thin film are 9.93 x $10^{-8}$W/Hz$^{1/2}$ and 1.81 x $10^{6}$ cmHz$^{1/2}$/W at the same frequency of 100 Hz, respectively. The results means that PLT thin film having 10 mol % La content is suitable for the sensing materials of pyroelectric IR sensors.

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Ferroelectric properties of BLT films deposited on $ZrO_2$Si substrates

  • Park, Jun-Seo;Lee, Gwang-Geun;Park, Kwang-Hun;Jeon, Ho-Seung;Im, Jong-Hyun;Park, Byung-Eun;Kim, Chul-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.11a
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    • pp.172-173
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    • 2006
  • Metal-ferroelectric-insulator-semiconductor (MFIS) structures with $Bi_{3.35}La_{0.75}Ti_3O_{12}$ (BLT) ferroelectric film and Zirconium oxide ($ZrO_2$) layer were fabricated on p-type Si(100). $ZrO_2$ and BLT films were prepared by sol-gel technique. Surface morphologies of $ZrO_2$ and BLT film were measured by atomic force microscope (AFM). The electrical characteristics of Au/$ZrO_2$/Si and Au/BLT/$ZrO_2$/Si film were investigated by C-V and I-V measurements. No hysteretic characteristics was observed in the C-V curve of the Au/$ZrO_2$/Si structure. The memory window width m C-V curve of the Au/BLT/$ZrO_2$/Si diode was about 1.3 V for a voltage sweep of ${\pm}5$ V. The leakage current of Au/$ZrO_2$/Si and Au/BLT/$ZrO_2$/Si structures were about $3{\times}10^{-8}$ A at 30 MV/cm and $3{\times}10^{-8}$ A at 3 MV/cm, respectively.

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Preparation of SiO2/TiO2 Core-Shell Particles Using Large-Size Silica Particles (대구경 실리카 입자를 이용한 실리카/티타니아 코어-쉘 입자의 제조)

  • Park, Young-Hun;Lee, Jae-Won;Gong, Sungmin;Kim, Woo-Sik;Kim, Jinsoo
    • Applied Chemistry for Engineering
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    • v.18 no.2
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    • pp.183-187
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    • 2007
  • $SiO_2/TiO_2$ core-shell particles with controlled shell thickness were prepared using large silica particles. The thickness of titania coating layer was varied from 8 nm to 38 nm depending on the number of coating steps from 1 to 3 times. After titania coating, the core-shell particles showed textured surface due to the titania coating layer, resulting in 3~25 times increase of specific surface areas. The properties of titania coated silica particles were characterized by FE-SEM, Zeta potential meter, BET, and XRD.

Structural and Dielectrical Properties of PZT(30/70)/PZT(70/30) Heterolayered Thin Film Prepared by Sol-Gel Method (Sol-Gel법으로 제작한 PZT(30/70)/PZT(70/30) 이종층 박막의 구조 및 유전특성)

  • Kim, Gyeong-Gyun;Jeong, Jang-Ho;Lee, Seong-Gap;Lee, Yeong-Hui
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.48 no.7
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    • pp.514-520
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    • 1999
  • Ferroelectric PZT(30/70)/PZT(70/30) heterolayered thin films were fabricated by spin-coating method on the $Pt/Ti/SiO_2Si$ substrate alternately using(30/70) and PZT(70/30) alkoxide solutions prepared by sol-coating method. The coating and heating procedure was repeated six times to form PZT heterolayered films, and thickness of the film obtained by one-times drying/sintering process was about 40-50 nm. All PZT heterolayered films, showed dense and homogeneous structure without the presence of rosette sturctrue. The relative dielectric constant, remanent polarization and leakage current density of PZT heterolayered films were superior to those of single composition PZT(30/70) and PZT(70/30) films, and those values for the PZT-6 film were 975, $21 \muC/cm^2\; and\; 8\times10^{-9}\; A/cm^2$, respectively. And the PZT-6 heterolayered film showed fairly good fatigue characteristics of remanent polarization and coercive field after application of $10^8$ switching cycles.

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Heterojunction Quantum Dot Solar Cells Based on Vertically Growth TiO2 Anatase Nanorod Arrays with Improved Charge Collection Property

  • Chung, Hyun Suk;Han, Gill Sang;Park, So Yeon;Lee, Dong Geon;Jung, Hyun Suk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.466.2-466.2
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    • 2014
  • The Quantum dot (QD) solar cells have been under active research due to their high light harvesting efficiencies and low fabrication cost. In spite of these advantages, there have been some problems on the charge collection due to the limitation of the diffusion length. The modification of advanced nanostructure is capable of solving the charge collection problem by increasing diffusion length of electron. One dimensional nanomaterials such as nanorods, nanowires, and nanotubes may enhance charge collection efficiency in QD solar cells. In this study, we synthesized $TiO_2$ anatase nanorod arrays with length of 200 nm by two-step sol-gel method. The morphology and crystal structure for the nanorod were characterized by using scanning electron microscopy (SEM), transmission electron microscopy (TEM), and X-ray diffraction (XRD). The anatase nanorods are single-crystalline and possess preferred orientation along with (001) direction. The photovoltaic properties for the heterojunction structure QD solar cells based on the anatase nanorod were also characterized. Compared with conventional $TiO_2$ nanoparticle based QD solar cells, these nanostructure solar cells exhibited better charge collection properties due to long life time measured by transient open circuit studies. Our findings demonstrate that the single crystalline anatase nanorod arrays are promising charge transport semiconductors for heterojunction QD solar cells.

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A Study on the Switching and Retention Characteristics of PLT(5) Thin Films (PLT(5) 박막의 Switching 및 Retention 특성에 관한 연구)

  • Choi Joon Young;Chang Dong Hoon;Kang Seong Jun;Yoon Yung Sup
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.42 no.1
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    • pp.1-8
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    • 2005
  • We fabricate PLT(5) thin film on Pt/TiO/sub x/SiO₂/Si substrate by using sol-gel method and investigate leakage current, switching and retention properties. The leakage current density of PLT(5) thin film is 3.56×10/sup -7/A/㎠ at 4V. In the examination of switching properties, pulse voltage and load resistance were 2V~5V and 50Ω~3.3kΩ, respectively. Switching time has a tendency to decrease from 0.52㎲ to 0.14㎲ with the increase of pulse voltage, and also the time increases from 0.14㎲ to 13.7㎲ with the increase of load resistance. The activation energy obtained from the relation of applied pulse voltage and switching time is about 135kV/cm. The error of switched charge density between hysteresis loop and experiment of polarization switching is about 10%. Also, polarization in retention decreases as much as about 8% after l0/sup 5/s.

Electrical properties of metal doped $V_2O_5$ nanowires (금속으로 도핑 된 $V_2O_5$ nanowires의 전기적 특성)

  • Ryu, Hye-Yeon;Yee, Seong-Min;Kang, Pil-Soo;Kim, Gyu-Tae;Zakharova, O.S.;Volkov, V.L.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.101-102
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    • 2006
  • 금속을 도핑 함으로써 전기전도도가 향상될 것으로 생각되는 산화바나듐 나노선에 대하여 열처리 전후의 전기적 특성을 비교하였다. sol-gel 방법으로 만들어진 산화바나듐 xerogel($V_{1.66}Mo_{0.33}O_5{\cdot}nH_2O$)을 $Si_3N_4$ 절연막이 성장된 Si기판위에 분산시키고 Ti/Au으로 전극을 증착한 후 열처리 한 것과 하지 않은 두 시료의 전류-전압특성을 비교 분석하였다.

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Performance Analysis of Double-Glazed Flat Plate Solar Collector with Cu-based Solar Thermal Absorber Surfaces

  • Lee, Jeong-Heon;Jeong, Da-Sol;Nam, Yeong-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.157.1-157.1
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    • 2016
  • In this work, we experimentally investigated the solar absorption performance of Cu-based scalable nanostructured surfaces and compared their performance with the conventional TiNOX. We fabricated Cu-based nanostructured surfaces with a controlled chemical oxidation process applicable to a large area or complex geometry. We optimized the process parameters including the chemical compounds, dipping time and process temperature. We conducted both lab-scale and outdoor experiments to characterize the conversion efficiency of each absorber surfaces with single and double glazing setup. Lab-scale experiment was conducted with $50mm{\times}50mm$ absorber sample with 1-sun condition (1kW/m2) using a solar simulator (PEC-L01) with measuring the temperature at the absorber plate, cover glass, air gap and ambient. From the lab-scale experiment, we obtained ${\sim}91^{\circ}C$ and $94^{\circ}C$ for CuO and TiNOX surfaces after 1 hr of solar illumination at single glazing, respectively. To measure the absorber performance at actual operating condition, outdoor experiment was also conducted using $110mm{\times}110mm$ absorber sample. We measured the solar flux with thermopile detector (919P-040-50). From outdoor experiment, we observed ${\sim}123^{\circ}C$ and $131^{\circ}C$ for CuO and TiNOX with 0.6 kW/m2 insolation at double glazing, respectively. We showed that the suggested nanostructured CuO solar absorber has near-equivalent collection efficiency compared with the state-of-the-art TiNOX surfaces even with much simpler manufacturing process that does not require an expensive equipment.

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Effects of the Introduction of UV Irradiation and Rapid Thermal Annealing Process to Sol-Gel Method Derived Ferroelectric Sr0.9Bi2.1Ta1.8Nb0.2O9 Thin Films on Crystallization and Dielectric/Electrical Properties (UV 노광과 RTA 공정의 도입이 Sol-Gel 법으로 제조한 강유전성 Sr0.9Bi2.1Ta1.8Nb0.2O9 박막의 결정성 및 유전/전기적 특성에 미치는 영향)

  • 김영준;강동균;김병호
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.1
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    • pp.7-15
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    • 2004
  • The ferroelectric SBT thin films as a material of capacitors for non-volatile FRAMs have some problems that its remanent polarization value is relatively low and the crystallization temperature is quite high abovc 80$0^{\circ}C$. Therefore, in this paper, SBTN solution with S $r_{0.9}$B $i_{2.1}$T $a_{1.8}$N $b_{0.2}$$O_{9}$ composition was synthesized by sol-gel method. Sr(O $C_2$ $H_{5}$)$_2$, Bi(TMHD)$_3$, Ta(O $C_2$ $H_{5}$)$_{5}$and Nb(O $C_2$ $H_{5}$)$_{5}$ were used as precursors, which were dissolved in 2-methoxyethanol. SBTN thin films with 200 nm thickness were deposited on Pt/Ti $O_2$/ $SiO_2$/Si substrates by spin-coating. UV-irradiation in a power of 200 W for 10 min and rapid thermal annealing in a 5-Torr-oxygen ambient at 76$0^{\circ}C$ for 60 sec were used to promote crystallization. The films were well crystallized and fine-grained after annealing at $650^{\circ}C$ in oxygen ambient. The electrical characteristics of 2Pr=11.94 $\mu$C/$\textrm{cm}^2$, Ps+/Pr+=0.54 at the applied voltage of 5 V were obtained for a 200-nm-thick SBTN films. This results show that 2Pr values of the UV irradiated and rapid thermal annealed SBTN thin films at the applied voltage of 5 V were about 57% higher than those of no additional processed SBTN thin films. thin films.lms.s.s.