• Title/Summary/Keyword: $SnCl_2$ solution

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Fabrication and Characteristics of SnO2 Thick Film Devices for Detection of NO2 (NO2 감지용 SnO2 후막소자의 제작 및 특성)

  • Sohn, Jong Rack;Han, Jong Soo
    • Applied Chemistry for Engineering
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    • v.8 no.2
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    • pp.332-338
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    • 1997
  • $SnO_2$ as raw material of sensor for $NO_2$ detection was prepared by precipitating $SnCl_4$ solution with aqueous ammonia followed by calcining in air. The characterization of $SnO_2$ was carried out using FT-IR and XRD, and $SnO_2$ thick film sensor was fabricated by screen-printing method. The particle size of $SnO_2$ calcined at higher temperature increased due to the growth of crystalline. $SnO_2$ sensor fabricated by using $SnO_2$ sample calcined at $1000^{\circ}C$ followed by heat treatment at $700^{\circ}C$ exhibited excellent sensing characteristics and selectivity for $NO_2$ gas at the operating temperature of $250^{\circ}C$.

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Electrical and Optical Properties of ZnO/$SnO_2$:F Thin Films under the Hydrogen Plasma Exposure (ZnO/$SnO_2$:F 박막의 수소플라즈마 처리에 따른 전기적.광학적 특성 변화)

  • Kang, Gi-Hwan;Song, Jin-Soo;Yoon, Kyung-Hoon;Yu, Gwon-Jong;Han, Deuk-Young
    • Proceedings of the KIEE Conference
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    • 1993.07b
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    • pp.1147-1149
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    • 1993
  • ZnO/$SnO_2$:F bilayer films have been prepared by pyrosol deposition method to develop optimum transparent electrode for use in amorphous silicon solar cells. The solution for $SnO_2:F$ film was composed of $SnCl_4{\cdot}5H_2O,\;NH_4F,\;CH_3OH$ and HCl, and ZnO films have been deposited on the $SnO_2:F$ films by using the solution of $ZnO(CH_3COO){_2}{\cdot}2H_2O,\;H_2O\;and\;CH_3OH$. These films have been investigated the variation of electrical and optical properties under the hydrogen plasma exposure. The sheet resistance of the $SnO_2:F$ film was sharply increased and its transmittance was decreased with the blackish effect after plasma treatment. However, the ZnO/$SnO_2:F$ bilayer film was shown hydrogen plasma durability because the electrical and optical properties was almost unchanged more then 60 seconds exposure time.

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The effect of additive on $SnO_2$ gas sensor for improving stability ($SnO_2$계 가스 센서의 안정성 향상을 위한 산화물의 첨가 효과)

  • Park, Kwang-Mook;Min, Bong-Ki;Choi, Soon-Don;Nam, Hyo-Duk
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.865-868
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    • 2002
  • $SnO_2$ powders were prepare by precipitating $Sn(OH)_4$ from an aqueous solution of $SnCl_4{\cdot}5H_2O$, pH 9.5. The effects of stability and sensitivity of $SnO_2$ thick film sensors added with various amounts, $SiO_2$, $Al_2O_3$, $ZrO_2$, $TiO_2$ have been investigated. It is shown that the 3wt% $Al_2O_3$ or $SiO_2$ can improve the stability of $SnO_2$ gas sensor at an operating temperature of $350^{\circ}C$.

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Photoelectrochemical Conversion of $SnO_2$ Films Deosited by Spray Pyrolysis (분무 열분해법에 의해 증착된 $SnO_2$ 박막의 광전기 화학 변환 특성)

  • 김태희;박경봉;윤기현
    • Journal of the Korean Ceramic Society
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    • v.28 no.3
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    • pp.197-204
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    • 1991
  • The photoelectrochemical conversion in SnO2 films deposited by spray pyrolysis using SnCl4-alcohol solution and N2 gas has been studied. The photocurrent increases with increasing deposition temperature up to 40$0^{\circ}C$ and then decreases, and the electron affinity decreases as the deposition temperature increases to 40$0^{\circ}C$. As the concentration of the spray solution increases, the photocurrent reaches a maximum value at the concentration of 0.05M, and the electron affinity is consistent. As the thickness of the film increases, the photocurrent increases with a maximum value at the thickness of 4600$\AA$, and electron affinity does not change.

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Indium-free Sn based oxide thin-film transistors using a solution process

  • Im, Yu-Seung;Kim, Dong-Rim;Jeong, Ung-Hui;Kim, Si-Jun;Kim, Hyeon-Jae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.251-251
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    • 2011
  • 본 연구에서는 Zr이 도핑 된 ZnSnO (ZZTO) 기반의 물질을 액상공정을 이용하여 합성하고, 박막트랜지스터를 제작하였다. 출발 물질로써 지르코늄 클로라이드 (ZrCl4), 아연 아세테이트 디하이드레이트 ($Zn(CH_3COO)_2{\cdot}2H_3O$), 틴 클로라이드 ($SnCl_2$)를 아연과 주석 프리커서의 비율을 4:7로 고정하고, 지르코늄 프리커서의 몰비를 변형시켜 제작하였다. 제작된 솔루션은 0.25몰의 몰 농도로 고정하였다. 솔벤트로는 2-메톡시에탄올 (2-methoxyethanol)을 사용하였으며, 준비된 솔루션은 $0.2{\mu}m$ 필터를 이용하여 필터링을 실시하였다. Heavily doped p+ Si 기판에 열적 산화법을 이용하여 120 nm 두께의 $SiO_2$를 성장시킨 것을 게이트 및 게이트 절연막으로 이용하였으며, 스핀코팅을 이용하여 ZZTO 박막을 코팅하였다. 코팅 된 기판은 $300^{\circ}C$에서 $500^{\circ}C$ 사이로 2시간 열처리를 실시하였으며, 마지막으로 소오스/드레인을 스퍼터링법으로 Al을 증착하였다. Zr 함량비, 열처리 온도, 제작된 솔루션의 온도에 따른 박막단계를 파악하기 위해 X-ray photoelectron spectroscopy (XPS), thermogravimetry differential thermal analyzer (TG-DTA), X-ray diffractometer (XRD), high-resolution transmission electron microscopy (HR-TEM), Hall-effect measurement, UV-Vis spectroscopy 분석을 실시하였으며, 제작된 소자는 semiconductor analyzer (HP4156C)를 이용하여 측정하였다.

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Characteristic of Oxidants Production and Dye Degradation with Operation Parameters of Electrochemical Process (전기화학적 공정의 운전인자에 따른 산화제 생성과 염료 분해 특성)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Environmental Science International
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    • v.18 no.11
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    • pp.1235-1245
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    • 2009
  • The purpose of this study is to investigate electro-generation of free Cl, $ClO_2$, $H_2O_2$ and $O_3$ and degradation of Rhodamine B in solution using Ru-Sn-Sb electrode. Electrolysis was performed in one-compartment reactor using a dimensionally stable anode(DSA) of Ru-Sn-Sb/Ti as the working electrode. The effect of applied current (0.5-3 A), electrolyte type (NaCl, KCl, HCl, $Na_2SO_4$ and $H_2SO_4$) and concentration (0.5-2.5 g/L), air flow rate (0-3 L/min) and solution pH (3-11) was evaluated. Experimental results showed that concentration of 4 oxidants was increased with increase of applied current, however optimum current for RhB degradation was 2 A. The generated oxidant concentration and RhB degradation of the of Cl type-electrolyte was higher than that of the sulfate type. The oxidant concentration was increased with increase of NaCl concentration and optimum NaCl dosage for RhB degradation was 1.75 g/L. Optimum air flow rate for the oxidants generation and RhB degradation was 2 L/min. $ClO_2$ and $H_2O_2$ generation was decreased with the increase of pH, whereas free Cl and $O_3$ was not affected by pH. RhB degradation was increase with the pH decrease.

Plating Solution Composition Control of Tin-Cobalt Alloy Electroplating Process (Tin-Cobalt 합금 도금공정에서 도금물성 향상을 위한 최적 용액조성 디자인)

  • Lee, Seung-Bum;Hong, In-Kwon
    • Applied Chemistry for Engineering
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    • v.17 no.2
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    • pp.150-157
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    • 2006
  • The alternate plating method was suggested by a tin-cobalt alloy plating process which has excellent mechanical characteristics and also favorable to environment. Tin-cobalt alloy plating has many advantages such as nontoxicity, variable color-tone, and no post-treatment process. In this study, the plating conditions such as temperature, pH, current density, plating time, and amount of additive (glycine) were determined in the tin-cobalt alloy plating process through Hull-cell test and surface analysis. As the result of Hull-cell analysis, brightness became superior as the amount of glycine increased. It was found that the optimum alloy ratio was 0.03 M of $SnCl_{2}{\cdot}2H_{2}O$ and 0.05 M of $CoSO_{4}{\cdot}7H_{2}O$ at $50^{\circ}C$, pH 8.5, and $0.5A/dm^2$. The optimum amount of additive was 15 g/L of glycine and 0.1 g/L of organic acid. Then, the solution including glycine was recommended as an optimum plating solution for a chromium plating process.

The Supplement of Sn/Cu, Plating Solution Affects in Plating Skim Quality of the Plating Product (Sn/Cu 도금액의 보충이 도금제품의 도금피막특성에 미치는 영향)

  • Jeon, Taeg-Jong;Ko, Jun-Bin;Lee, Dong-Ju
    • Journal of the Korean Society for Precision Engineering
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    • v.26 no.7
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    • pp.112-119
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    • 2009
  • The purpose of this study is to evaluate the evaluation of process yield performed by using Sn & Cu treatment on the surface to optimize process condition for Lead-free solder application. The materials which are used for the New Surface Treatment study are Semi-Dulling plating for high speed Sn/Cu alloy of Soft Alloy GTC-33 Pb free known as "UEMURA Method" and plating substrate is alloy 42.Especially in lead-free plating process, it is important to control plating thickness and Copper composition than Sn/Pb plating. Evaluated and controlled plating thickness $12{\pm}3um$, Copper composition $2{\pm}1%$, plating particle and visual inspection. The optimization of these parameters and condition makes it makes possible to apply Sn/Cu Lead-free solder from Sn/Pb alloy.

Transition-State Structures for Solvolysis of Methanesulfonyl Chloride

  • 양기열;강금덕;구인선;이익준
    • Bulletin of the Korean Chemical Society
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    • v.18 no.11
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    • pp.1186-1191
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    • 1997
  • Solvolyses of methanesulfonyl chloride (CH3SO2Cl) in water and methanol have been studied theoretically using ab initio self-consistent reaction field (SCRF) molecular orbital method. All stationary structures including transition state on the potential energy surface in solution have been found and compared with the gas phase structures. The overall reaction occurs via a concerted SN2 mechanism with a non-cyclic trigonal bipyramidal transition state, and the activation barrier is lowered significantly in solution. The transition state for the hydrolysis reaction is looser than that for the methanolysis reaction, and this is in accord with the experimental findings that an SN2 type mechanism, which is shifted toward an SN1 process or an SAN process in the hydrolysis and alcoholysis reaction, respectively, takes place. The catalytic role of additional solvent molecules appears to be a purely general-base catalysis based on the linear transition structures. Experimental barrier can be estimated by taking into account the desolvation energy of nucleophile in the reaction of methanesulfonyl chloride with bulk solvent cluster as a nucleophile.

Solvent Extraction of Sn(IV) from Hydrochloric Acid Solution by Tri-Butyl Phosphate(TBP) (염산용액(鹽酸溶液)에서 Tri-Butyl Phosphate(TBP)에 의한 주석(朱錫)(IV)의 용매추출(溶媒抽出))

  • Seo, Jae-Seong;Ahn, Jae-Woo;Lee, Man-Seung
    • Resources Recycling
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    • v.19 no.3
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    • pp.45-51
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    • 2010
  • Solvent extraction behavior of Sn(IV) from hydrochloric acid solution was investigated using TBP(Tri-butyl Phosphate) as an extractant. The experimental parameters, such as the concentration of HCl solution, chloride ions, extractant, and Sn were observed. Experimental results showed that the extraction percent of Sn was increased with increasing the hydrochloric acid and chloride ion concentration. More than 98% of Sn was extracted in 7.0 M HCl by 10% TBP. The optimum extraction stages of Sn for continuous extraction process was theoretically calculated by analysizing the McCabe-Thiele diagram. Stripping of Sn from the loaded organic phases can be accomplished by NaOH as a stripping reagent effectively and 99.3% of Sn was stripped by 2.0M NaOH solution.