• 한국해양공학회지
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• 제23권5호
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• pp.85-91
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• 2009

A stainless steel that contains aggressive negative ion was known to decrease the corrosion resistance. Stainless steel with super corrosion resistance was developed for improvement of corrosion resistance. Super duplex stainless steel is widely used under sever environment because of good mechanical properties and corrosion resistance. Also, Super duplex stainless steel has long life in severe environments by showing the enough strength and corrosion resistance. But duplex stainless steel is not stabilized compared to austenite stainless steel in corrosion resistance. In this study, corrosion characteristic were investigated to super duplex stainless steel with additive 0.2% nitrogen with $SiO_2$ thin films coated or no coated by sol-gel method in 3.5% NaCl. From test results, corrosion current density in the heat-treated specimen for ${\sigma}$ phase precipitation was higher than that of different heat-treated specimen. Also, $SiO_2$ colloidal-coated specimen had not occurred almost corrosion.

• Journal of Advanced Marine Engineering and Technology
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• 제29권1호
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• pp.98-106
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• 2005

The chemical conversion film formed on magnesium alloy was investigated by using the colloidal silica with some parameters such as solution pH. temperature, solution conditions, and treatment time. Moreover. the solutions consisted of colloidal silica titanium sulfate, and cobalt ions were used for the colloidal silica film to having a good corrosion resistance and adhesion properties. It was thought that the film at 298K was made with combination of Si-O. The quantity of film formed at high temperature such as 333K and 353K is smaller than dissolved quantity during chemical conversion treatment. Adding $CoSO_4$ to the colloidal silica solution enhanced the adhesion force between the silica film and magnesium substrate, The optimum conditions for the chemical conversion treatment solution were PH 2.90 s treatment, and 298K.

• 한국정밀공학회지
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• 제19권8호
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• pp.134-140
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• 2002

Chemical mechanical polishing of aluminum and photoresist using colloidal silica-based slurry was experimented. The effects of slurry pH, silica concentration, and oxidizer ($H_2O_2$) concentration on surface roughness and removal rate were studied. The optimum slurry conditions for reduction of micro-scratch were investigated. The optimum chemical mechanical polishing with the colloidal silica-based slurry was compared with conventional chemical mechanical polishing with alumina-based slurry. Chemical mechanical polishing of the aluminum with the colloidal silica-based slurry showed improved result but chemical mechanical polishing of the photoresist did not. The improved result was comparative with that of chemical mechanical polishing with filtered alumina-based slurry which one of desirable methods to reduce the micro-scratch.