• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.415-415
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• 2012

ZnO nanostructures were synthesized by a vapor phase transport process in a single-zone furnace within a horizontal quartz tube with an inner diameter of 38 mm and a length of 485 mm. The ZnO nanostructures were grown on Au-catalyzed Si(100) substrates by using a mixture of zinc oxide and graphite powders. The growth of ZnO nanostructures was conducted at $800^{\circ}C$ for 30 min. High-purity Ar and $O_2$ gases were pushed through the quartz tube during the process at a flow rate of 100 and 10 sccm, respectively. The sequence of ON/OFF cycles of the Ar gas flow was repeated, while the $O_2$ flow is kept constant during the growth time. The Ar gas flow was ON for 1 min/cycle and that was OFF for 2 min/cycle. The structure and optical properties of the ZnO nanostructures were investigated by field-emission scanning electron microscope, X-ray diffraction, temperature-dependent photoluminescence. The preferred orientation of the ZnO nanostructures was along c-axis with hexagonal wurtzite structure.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.20 no.11
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• pp.932-938
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• 2007

The structural, optical, and electrical properties of ZnO thin films grown on glass by radio-frequency (rf) magnetron sputtering were investigated. The mixture flow ratio of $O_2$ to Ar, which was operated with sputtering gas, was chosen as a parameter for growing high-qualify ZnO thin films. The structural properties and surface morphologies of the thin films were characterized by the X-ray diffraction and the atomic force microscope, respectively. As for the optical properties of the films, the optical absorbance was measured in the wavelength range of 300-1100 nm by using UV-VIS spectrophotometer. The optical transmittance, absorption coefficient, and optical bandgap energy of ZnO thin films were calculated from the measured data. The crystallinity of the films was improved and the bandgap energy was increased from 3.08 eV to 3.23 eV as the oxygen flow ratio was increased from 0 % to 50 %. Furthermore, The ultraviolet and violet luminescences were observed by using photoluminescence spectroscopy. The hall mobility was decreased with the increase of oxygen flow ratio.

• Korean Journal of Materials Research
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• v.17 no.2
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• pp.61-67
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• 2007

The magnetron reactive sputtering was adopted to deposit CuO buffer layers on the polyimide surfaces for increasing the adhesion strength between Cu thin films and polyimide, varying $O_2$ gas flow rate from 1 to 5 sccm. The CuO oxide was formed through all the $O_2$ gas flow rates of 1 to 5 sccm, showing the highest value at the 3 sccm $O_2$ gas flow rate. The XPS analysis revealed that the $Cu_2O$ oxide was also formed with a significant ratio during the reactive sputtering. The adhesion strength is mainly dependent on the amount of CuO in the buffer layers, which can react with C-O-C or C-N bonds on the polyimide surfaces. The adhesion strength of the multi-layered Cu/buffer layer/polyimide specimen decreased linearly as the heating temperature increased to $300^{\circ}C$, even though there showd no significant change in the chemical state at the polyimide interface. This result is attributed to the decrease in surface roughness of deposited copper oxide on the polyimide, when it is heated.

• Analytical Science and Technology
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• v.30 no.4
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• pp.159-166
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• 2017

Exposure to UV light, i.e., UV-A (320-400 nm) or UV-B (290-320 nm) radiation, can cause skin cancer. Titanium dioxide ($TiO_2$) effectively disperses UV light. Therefore, it is used as a physical UV filter in many UV light blockers. Usually, the $TiO_2$ content in commercialized UV blockers is 25 % at most. To block UV-B, a chemical UV blocker, octyl-methoxy cinnamate (OMC) is used. OMC is commonly used in combination with $TiO_2$. In this study, $TiO_2$ and OMC were mixed in different proportions to produce UV blockers with different compositions. Also the changes in the sun protection factor (SPF) based on the composition and $TiO_2$ particle sizes were investigated. In order to analyze the $TiO_2$ particle size, dynamic light scattering (DLS) and asymmetrical flow field-flow fractionation (AsFlFFF) were used. The results showed that the SPF was influenced by the proportion of $TiO_2$ and OMC, where the proportion of $TiO_2$ induced a more significant influence. In addition, changes in the $TiO_2$ particle size based on the proportion of OMC were observed.

• Bulletin of the Korean Chemical Society
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• v.20 no.5
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• pp.508-516
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• 1999

Polycrystalline powder of LixNi0.85Co0.15O2 was synthesized by pyrolyzing a powder precursor obtained by the PVA-precursor method. Coin cells of lithium-ion rechargeable battery were assembled, whose the cathodes were fabricated from the crystalline powders of LixNi0.85Co0.15O2 synthesized by the method. The effect of synthetic variation on the property of the cell was tested by carrying out 100 consecutive cycles of charge-dis-charge on the cells. The property of the cell was largely influenced by the pyrolysis conditions applied for the synthesis of the LixNi0.85Co0.15O2. Depending on whether the pyrolysis was carried out in standing air or in the flow of dry air, the discharge capacity and cycle-reversibility of the cell varied in large extent. When the powder precursor was pyrolyzed in standing air, a minor phase of lithium carbonate was remained in the LixNi0.85Co0.15O2. The carbon containing powder precursor had to be pyrolyzed in the flow of dry air to eliminate the minor phase. In the flow of dry air, the lithium carbonate in the precursor was eliminated over 500-700。C without any prominent heat event. By controlling the flow of air over the precursor during its pyrolysis, particle size could also be altered. The effect of flowing dry air, during first step pyrolysis or during second step heat treatment, on the property of the cell was discussed.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.30 no.5
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• pp.294-300
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• 2017

$TeO_x$ thin films were deposited at various $O_2$/Ar gas-flow ratios by a reactive RFmagneton sputtering technique from $TeO_2$ and Te targets. X-ray diffraction (XRD) results revealed that the $TeO_x$ thin films were amorphous. The structure and chemical composition of the $TeO_x$ thin films were investigated by fourier transform infrared spectroscopy (FT-IR) and X-ray photoelectron spectroscopy (XPS). The optical characteristics of the $TeO_x$ thin films were investigated by an Ellipsometer and a UV-VIS-NIR spectrophotometer. According to the $O_2$/Ar gas-flow ratios, the atomic composition ratio of $TeO_x$ thin films was divided into two regions(x=1-2, 2-3). Different optical characteristics were shown in each region. With an increasing $O_2$/Ar gas-flow ratio, the refractive index of the $TeO_x$ thin films decreased and the optical bandgap of the films increased.

• Journal of the Korean Vacuum Society
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• v.17 no.2
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• pp.130-137
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• 2008

$La_{0.7}Sr_{0.3}MnO_3$ films were deposited on $SiO_2$/Si and Si substrates annealed at $350^{\circ}C$ by rf magnetron sputtering. The oxygen gas flow rates were varied as 0, 40, and 80 sccm. Without post annealing process, $La_{0.7}Sr_{0.3}MnO_3$ thin films on $SiO_2$/Si and Si substrates were polycrystalline with (100), (110), and (200) growth planes. The grain size of $La_{0.7}Sr_{0.3}MnO_3$ thin films was increased with increasing oxygen gas flow rate. The sheet resistance of $La_{0.7}Sr_{0.3}MnO_3$ thin films was decreased with oxygen flow rate due to the increased grain size which induced a reduction of grain boundary. TCR (temperature coefficient of resistance) values of $La_{0.7}Sr_{0.3}MnO_3$ thin films were obtained from -2.0% to -2.2%.

• Corrosion Science and Technology
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• v.2 no.5
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• pp.238-242
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• 2003

The characteristics of Ru etching using $O_2/Cl_2$ plasmas were investigated by employing inductively coupled plasma (ICP) etcher. The changes of Ru etch rate, Ru to $SiO_2$ etch selectivity and Ru electrode etching slope with the gas flow ratio, bias power, total gas flow rate, and source power were scrutinized. A high etching slope (${\sim}86^{\circ}$) and a smooth surface after etching was attained using $O_2/Cl_2$ inductively coupled plasma.

• Environmental Engineering Research
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• v.24 no.1
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• pp.107-116
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• 2019

Nitrogen removal, nitrous oxide ($N_2O$) emission and microbial community in sequencing batch and continuous-flow intermittent aeration processes were investigated. Two sequencing batch reactors (SBRs) and two continuous-flow multiple anoxic and aerobic reactors (CMRs) were operated under high dissolved oxygen (DO) (SBR-H and CMR-H) and low DO (SBR-L and CMR-L) concentrations, respectively. Nitrogen removal was enhanced under CMR and low DO conditions (CMR-L). The highest total inorganic nitrogen removal efficiency of 91.5% was achieved. Higher nitrifying and denitrifying activities in SBRs were observed. CMRs possessed higher $N_2O$ emission factors during nitrification in the presence of organics, with the highest $N_2O$ emission factor of 60.7% in CMR-L. SBR and low DO conditions promoted $N_2O$ emission during denitrification. CMR systems had higher microbial diversity. Candidatus Accumulibacter, Nitrosomonadaceae and putative denitrifiers ($N_2O$ reducers and producers) were responsible for $N_2O$ emission.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.21 no.12
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• pp.1096-1100
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• 2008

This report examines the variations on structural properties of $SnO_2$ thin films deposited by using thermal chemical vapor deposition techniques with different oxygen flow gas. TEM showed some of the interface to be atomically rough. The aspects of the boundary shape and growth behavior agree well with the theory of interface growth. The electron diffraction showed that the roughness was changed as the different oxygen flow gas increased. These measurement results suggested that the number of interface facet and abnormal grain growth were related oxygen flow gas.