• Journal of the Korean Ceramic Society
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• v.37 no.8
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• pp.731-738
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• 2000

KLN(K3Li2Nb5O15) has attracted a great deal of attention for their potential usefulness in piezoelectric, electro-optic, nonlinear optic, and pyroelectirc devices. Especially, the KLN single crystal has been studied in the field of optics and electronics. However it is hard to produce good quality single crystals due to the crack propagation during crystal growing. One of the solutions of this problem is prepartion of thin film. But the intensive study has not been conducted so far. In this study, after the KLN thin film were prepared by R.F. magnetron Sputtering method on SiO2/Si substrate, the post-annealing methods of RTA(rapid thermal annealin) and IPA(insitu post annealing) were employed. The deposition condition of KLN thin film was RF power(100 W), Working pressure(100 mtorr). The commonness of both RAT and IPA was that the higher were deposition and post annealing temperature, the higher was the intensity of XRD but the less surface roughness. The difference of post-annealing methods affected XRD phase and surface condition very much. And in IPA process, the influence of O2 had much effect on the formation of KLN phase.

• Proceedings of the Optical Society of Korea Conference
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• 2002.07a
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• pp.92-93
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• 2002

선형 및 비선형 광학 특성이 뛰어난 것으로 잘 알려진 LiNbO$_3$ (LN) 및 $K_3$Li$_2$Nb$_{5}$O$_{15}$ (KLN) 단결정을 원료분말의 조성 등과 같은 결정성장 조건을 달리하여 Czochralski 방법으로 성장시켰다. LN과 KLN 단결정의 경우 성장온도가 고온이기 때문에 Li, K 이온의 휘발에 의해 성장된 결정의 조성은 원료분말의 조성과 다르다. 따라서 성장된 단결정의 조성을 분석하는 것은 응용을 위해 매우 중요한 일이다. (중략)

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.1
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• pp.34-42
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• 2001

The influences of substrate temperature were studied when fabricating KLN thin film on amorphous substrate using an rf-magnetron sputtering method. Investigating the vaporization temperature of the each element, the excess ratio of target and the optimum deposition conditions were effectively selected when thin filmizing a material which have elements with large difference fo vaporization temperature. In order to compensate K and Li which have lower vaporization temperatures than Nb, KLN target of composition excess with K of 60% and Li of 30% was used. KLN thin film fabricated on Corning 1737 glass substrate had single KLN phase above 58$0^{\circ}C$ of substrate temperature and crystallized to c-axis direction. The optimum conditions were rf power of 100W, process pressure of 150mTorr, and substrate temperature of $600^{\circ}C$.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.9 no.5
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• pp.463-469
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• 1999

The potassium lithium niobate $K_3$$Li_2$$Nb_5$$O_{15}$ single crystals were growing in $K_x$$Li_{1-x}$$NbO_3$ (x = 0.4~0.6) chemical formular by the Czorchralski method. Crystal growth is studied in two orientations with growth along a-axis and c-axis. We have subjected this crystal to x-ray diffraction studies and found that they are single-crystalline and belong to tetragonal system with the lattice parameters a = b = 12.577 $\AA$ and c = 3.997$\AA$. The temperature dependence of dielectric constant was measured in the region of the phase transition. Curie temperature and diffuseness of phase transition are influenced by composition concentration. The composition and cation distribution of ferroelectric TB-type niobate crystals has a strong influence on the ferroelectric properties. Growth condition, optical transmittance, etching pattern and dielectric properties are presented and discussed.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.08a
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• pp.39-39
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• 2003

텅스텐브론즈 세라믹스의 결정구조는 산소 팔면체를 뼈대로 각각 다른 형태의 A, C, B 양이온 자리로 이루어져 있다. A, C의 양이온 자리는 알카리 이온 또는 알카리 토금속 이온으로 채워지며, B 자리는 Nb 또는 Ta 이온으로 채워지게 된다. 이 중 A와 C 자리가 채워지는 정도로 unfilled, filled, completely filled 텅스텐브론즈로 나누어지게 된다. completely filled 텅스텐브론즈의 대표적인 물질인 $K_3Li_2Nb_5O_{15}$(KLN)는 전광특성, 비선형 광학특성으로 인하여 다양한 광소자로의 응용과 압전 특성, 초전 특성을 이용한 압전 소자로의 응용이 가능한 재료로 보고되고 있다. 하지만 이러한 꽉 찬 결정구조로 인하여 KLN의 경우 한정된 고용영역을 가지고 있어 물리적 성질의 변화가 제한되어 있는데, 이를 극복하기 위한 여러 가지 시도가 있었다. 이 중 A 자리와 C 자리를 치환하는 연구는 많이 알려져 있으나 치환시 빈 자리를 수반하는 경우가 대부분이다. 반면, B 자리를 치환하는 연구는 Nb를 Ta로 치환하는 경우가 알려져 있는데 이 경우 결정내에 빈자리가 생성되지 않는다. 이들 연구는 모두 단결정의 경우에 국한되어 있으며 단결정 제조시에는 조성을 정확히 조정하기 어렵고, 냉각시 crack이 발생하는 등의 문제를 가지고 있어 그 응용이 제한되고 있다. 따라서 본 연구에서는 KLN 다결정 세라믹스에서 Nb를 Ta으로 치환하여 치환에 따른 상변화와 치밀화 거동, 그리고 이에 따른 전기적 특성을 조사하여 이들 간의 상관관계를 조사하였다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.5
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• pp.410-416
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• 2001

KLN thin films were fabricated on Pt coated Si(100) wafer using an rf-magnetron sputtering method. The grown KLN thin film consists of 4-fold grains. In this experiment, the structure of 4-fold grained thin film was investigated using XRD and SEM measurements. Pt layer was also deposited using the rf-magnetron sputtering method,. XRD measurement showed that he Pt thin film has Gaussian distribution form with strong (111) direction orientation. The KLN thin film has preferred-orientation of (001) direction, and the peak consists of 2 separate peaks; one with broad FWHM and the other with narrow FWHM. The sharp peak is due to single crystal, and combining with Em results, the 4-fold grain consists of singel crystals with c-axis normal to substrate.

• Korean Journal of Materials Research
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• v.11 no.3
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• pp.178-184
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• 2001

Transparent and highly oriented KLN thin films have been grown by an rf- magnetron sputtering deposition method. A homogeneous and stable KLN target was prepared by calcine and sintering process. For KLN target, stoichiometry and composition excess with K of 30% and 60%, and Li of 15% and 30% respectively, was prepared. The targets were sintered at low temperature to prevent vaporization of K and Li. KLN thin films were fabricated by rf-magnetron sputtering method using those targets. In this experiment, using the target of composition excessed with K of 60% and Li of 30%, single phase KLN thin film was produced. KLN thin film has excellent crystallinity and highly c-axis oriented on Corning 1737 substrate. Transmittance of thin film in visible range was 90%, absorption edge is 333 nm and refractive index at 632.8 nm was 1.93.

• Korean Journal of Materials Research
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• v.11 no.1
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• pp.27-33
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• 2001

The growth characteristics of 4-fold grain which was appeared in KLN deposition on $Pt/Ti/SiO_2/Si(100)$ substrate was studied by varying process variables. Substrate temperature, sputtering pressure, rf power were selected as process variables, and experiment was carried out near optimum fabrication condition. When using K and Li enriched target, the optimum fabrication conditions were substrate temperature of $600^{\circ}C$, sputtering pressure of 150mTorr, rf power of 100 W and its surface morphology is sensitively varied by small deposition condition changes. KLN is composed of elements which have large difference of boiling point. And it is difficult to fabricate thin film at high temperature and high vacuum deposition condition. Furthermore the phenomenon during deposition process can not be explained by using Thorton's model which explains the relation between thin film structure and melting point of thin film materials. These phenomenon can be explained using boiling point of elements which consist of thin film material.